公开(公告)号：US07563042B2

公开(公告)日：2009-07-21

申请号：US11504785

申请日：2006-08-16

申请人： Masahiro Nakaharada ,  Seiki Ishida ,  Taro Yamamoto ,  Katsuhiro Morikawa

发明人： Masahiro Nakaharada ,  Seiki Ishida ,  Taro Yamamoto ,  Katsuhiro Morikawa

IPC分类号： G03D5/00 ,  G03B27/52 ,  C23C16/18

CPC分类号： G03D3/08 ,  H01L21/67126 ,  H01L21/68707 ,  Y10S414/141

摘要： A substrate carrying apparatus includes an arm body; supporting portion provided in the arm body and adapted to support a region inside the periphery of the rear face of the substrate; a one-side restricting portion and an other-side restricting portion provided at opposite positions across the periphery of the substrate to restrict the peripheral positions of the substrate; and liquid receivers provided between each supporting portion and each restricting portion. A liquid drop attached to the rear peripheral portion of the substrate flows down on the bottom face of each liquid receiver. Even though repeated substrate carrying operations are performed and thus the liquid drop is accumulated in each liquid receiver, there is no risk that the liquid drop in each liquid receiver would be scattered in the air by the action of the periphery of the substrate and hence the scattered liquid would be attached again onto the surface of the substrate.

摘要翻译： 基板承载装置包括臂体; 支撑部，其设置在所述臂主体中并且适于支撑所述基板的后表面的周边内的区域; 一侧限制部和另一侧限制部，设置在穿过基板的周边的相对位置，以限制基板的周边位置; 以及设置在每个支撑部分和每个限制部分之间的液体接收器。 附着在基板的后周缘部分的液滴在每个液体接收器的底面上向下流动。 即使进行重复的基板搬运操作，因此液滴在每个液体接收器中积聚，也不存在每个液体接收器中的液滴通过基板周边的作用在空气中散射的风险，因此 分散的液体将再次附着到基底的表面上。

公开(公告)号：US20070195297A1

公开(公告)日：2007-08-23

申请号：US11504785

申请日：2006-08-16

申请人： Masahiro Nakaharada ,  Seiki Ishida ,  Taro Yamamoto ,  Katsuhiro Morikawa

发明人： Masahiro Nakaharada ,  Seiki Ishida ,  Taro Yamamoto ,  Katsuhiro Morikawa

IPC分类号： G03B27/42

CPC分类号： G03D3/08 ,  H01L21/67126 ,  H01L21/68707 ,  Y10S414/141

摘要： A substrate carrying apparatus includes an arm body; supporting portion provided in the arm body and adapted to support a region inside the periphery of the rear face of the substrate; a one-side restricting portion and an other-side restricting portion provided at opposite positions across the periphery of the substrate to restrict the peripheral positions of the substrate; and liquid receivers provided between each supporting portion and each restricting portion. A liquid drop attached to the rear peripheral portion of the substrate flows down on the bottom face of each liquid receiver. Even though repeated substrate carrying operations are performed and thus the liquid drop is accumulated in each liquid receiver, there is no risk that the liquid drop in each liquid receiver would be scattered in the air by the action of the periphery of the substrate and hence the scattered liquid would be attached again onto the surface of the substrate.

摘要翻译： 基板承载装置包括臂体; 支撑部，其设置在所述臂主体中并且适于支撑所述基板的后表面的周边内的区域; 一侧限制部和另一侧限制部，设置在穿过基板的周边的相对位置，以限制基板的周边位置; 以及设置在每个支撑部分和每个限制部分之间的液体接收器。 附着在基板的后周缘部分的液滴在每个液体接收器的底面上向下流动。 即使进行重复的基板搬运操作，因此液滴在每个液体接收器中积聚，也不存在每个液体接收器中的液滴通过基板周边的作用在空气中散射的风险，因此 分散的液体将再次附着到基底的表面上。

公开(公告)号：US07284917B2

公开(公告)日：2007-10-23

申请号：US11346430

申请日：2006-02-03

申请人： Seiki Ishida ,  Masahiro Nakaharada ,  Taro Yamamoto

发明人： Seiki Ishida ,  Masahiro Nakaharada ,  Taro Yamamoto

IPC分类号： G03D5/00 ,  G03B27/32 ,  G03B27/52

CPC分类号： H01L21/67184 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S134/902

摘要： A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist film after the substrate has been processed by immersion exposure. The coating and developing system includes: a processing block including coating units for forming a resist film on a surface of a substrate and developing units for processing the resist film formed on the substrate with a developer, and an interface block connected to the processing block and an exposure system for carrying out an immersion exposure process. The interface block includes: substrate cleaning units for cleaning the substrate processed by the immersion exposure process, a first carrying mechanism and a second carrying mechanism. The first carrying mechanism carries a substrate processed by immersion exposure to the substrate cleaning unit. The second carrying mechanism carries the substrate cleaned by the substrate cleaning unit. Thus the contamination of the substrate with external particles can be prevented and hence the spread of contamination with particles over the processing units of the processing block and substrates processed by the processing units can be prevented.

摘要翻译： 涂覆和显影系统能够防止具有颗粒的基底污染，同时用抗蚀剂膜涂覆基材的表面，并且在通过浸渍曝光处理基板之后显影抗蚀剂膜。 该涂布显影系统包括：处理块，其包括用于在基板的表面上形成抗蚀剂膜的涂覆单元和用显影剂处理形成在基板上的抗蚀剂膜的显影单元，以及连接到处理块的界面块 用于进行浸没曝光处理的曝光系统。 接口块包括：用于清洗通过浸没曝光工艺处理的基板的基板清洁单元，第一承载机构和第二承载机构。 第一携带机构携带通过浸没曝光处理的基板到基板清洁单元。 第二承载机构承载由基板清洁单元清洁的基板。 因此，可以防止基板与外部颗粒的污染，因此可以防止在处理块的处理单元和由处理单元处理的基板上的颗粒污染的扩散。

公开(公告)号：US20060177586A1

公开(公告)日：2006-08-10

申请号：US11346430

申请日：2006-02-03

申请人： Seiki Ishida ,  Masahiro Nakaharada ,  Taro Yamamoto

发明人： Seiki Ishida ,  Masahiro Nakaharada ,  Taro Yamamoto

IPC分类号： B05D3/00 ,  B05C13/00 ,  B05D1/18

CPC分类号： H01L21/67184 ,  H01L21/67051 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745 ,  Y10S134/902

摘要： A coating and developing system is capable of preventing the contamination of a substrate with particles while the same coats a surface of a substrate with a resist film and develops the resist film after the substrate has been processed by immersion exposure. The coating and developing system includes: a processing block including coating units for forming a resist film on a surface of a substrate and developing units for processing the resist film formed on the substrate with a developer, and an interface block connected to the processing block and an exposure system for carrying out an immersion exposure process. The interface block includes: substrate cleaning units for cleaning the substrate processed by the immersion exposure process, a first carrying mechanism and a second carrying mechanism. The first carrying mechanism carries a substrate processed by immersion exposure to the substrate cleaning unit. The second carrying mechanism carries the substrate cleaned by the substrate cleaning unit. Thus the contamination of the substrate with external particles can be prevented and hence the spread of contamination with particles over the processing units of the processing block and substrates processed by the processing units can be prevented.

摘要翻译： 涂覆和显影系统能够防止具有颗粒的基底污染，同时用抗蚀剂膜涂覆基材的表面，并且在通过浸渍曝光处理基板之后显影抗蚀剂膜。 该涂覆和显影系统包括：处理块，其包括用于在基板的表面上形成抗蚀剂膜的涂覆单元和用显影剂处理形成在基板上的抗蚀剂膜的显影单元，以及连接到处理块的界面块和 用于进行浸没曝光处理的曝光系统。 接口块包括：用于清洗通过浸没曝光工艺处理的基板的基板清洁单元，第一承载机构和第二承载机构。 第一携带机构携带通过浸没曝光处理的基板到基板清洁单元。 第二承载机构承载由基板清洁单元清洁的基板。 因此，可以防止基板与外部颗粒的污染，因此可以防止在处理块的处理单元和由处理单元处理的基板上的颗粒污染的扩散。

公开(公告)号：US08441618B2

公开(公告)日：2013-05-14

申请号：US12820417

申请日：2010-06-22

申请人： Masahiro Nakaharada ,  Naruaki Iida ,  Katsuhiro Morikawa ,  Suguru Enokida

发明人： Masahiro Nakaharada ,  Naruaki Iida ,  Katsuhiro Morikawa ,  Suguru Enokida

IPC分类号： B65H1/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58

CPC分类号： H01L21/67742 ,  G03B27/52 ,  H01L21/67748 ,  H01L21/67754

摘要： A substrate transfer apparatus, for transferring a substrate from a first module to a second module, includes a moving base having a Y-motion axis for moving the moving base in Y-direction, and a substrate holding member mounted to the moving base via X-motion axis so as to move relative to the moving base to be in an advanced position and a retracted position relative to the moving base. The X-motion axis operates when the Y-motion axis is operating, if the X-motion axis must be parallel to the Y-motion axis when transferring the substrate from the substrate holding member to the second module.

摘要翻译： 一种用于将基板从第一模块传送到第二模块的基板传送装置，包括：具有用于沿Y方向移动移动基座的Y运动轴的移动基座，以及经由X安装到移动基座的基板保持构件 运动轴线相对于移动基座移动到相对于移动基座处于提前位置和缩回位置。 如果X轴运动轴在从衬底保持构件转移到第二模块时必须平行于Y运动轴，X运动轴运行。

公开(公告)号：US08985929B2

公开(公告)日：2015-03-24

申请号：US13611555

申请日：2012-09-12

申请人： Suguru Enokida ,  Masahiro Nakaharada ,  Akira Miyata ,  Hidekazu Kiyama ,  Naruaki Iida

发明人： Suguru Enokida ,  Masahiro Nakaharada ,  Akira Miyata ,  Hidekazu Kiyama ,  Naruaki Iida

IPC分类号： H01L21/677 ,  H01L21/67 ,  H01L21/687

CPC分类号： H01L21/67178 ,  H01L21/67745 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/67781 ,  H01L21/68707 ,  Y10S414/137 ,  Y10S414/139

摘要： A substrate processing apparatus includes: a carrier block including first and second carrier placement units spaced apart in a right and left direction; a processing block having a layered structure in which a plurality of layered parts are vertically arranged, the layered parts each including a substrate transport mechanism for transporting a substrate and a processing module for processing a substrate; a tower unit including plural substrate placement units located at height positions where a substrate is transferred by the substrate transport mechanism of the layered part corresponding to the substrate placement unit; a first substrate transfer mechanism configured to transfer a substrate between the carrier on the first carrier placement unit and the substrate placement unit of the tower unit; and a second substrate transfer mechanism configured to transfer a substrate between the carrier on the second substrate placement unit and the substrate placement unit of the tower unit.

摘要翻译： 基板处理装置包括：载体块，其包括沿左右方向间隔开的第一和第二载体放置单元; 具有层叠结构的处理块，其中多个层叠部分垂直布置，所述层叠部分各自包括用于输送基板的基板传送机构和用于处理基板的处理模块; 塔架单元，其包括多个基板放置单元，位于基板通过与基板放置单元对应的层叠部的基板输送机构转印的高度位置; 第一基板传送机构，被配置为在第一载体放置单元上的载体和塔单元的基板放置单元之间传送基板; 以及第二基板输送机构，被配置为将基板转移到第二基板放置单元上的载体和塔单元的基板放置单元之间。