摘要:
Threshold voltage fluctuation in upper corner portions of a trench isolation is inhibited by rounding upper corner portions of the trench by thermal oxidation, introducing a first impurity into both upper corner portions of the trench and heat-treating the semiconductor substrate. Embodiments include increasing the threshold voltage in the upper corner portion of the trench in an n-channel transistor, previously increased by rounding oxidation, and introducing a p-type impurity, thereby canceling the threshold voltage reduction resulting from diffusion of the impurity during heat-treating the semiconductor substrate. In a p-channel transistor, the threshold voltage in the upper corner portion of the trench is increased by rounding oxidation thereby canceling the threshold voltage reduction resulting from introduction of the p-type first impurity into both upper corner portions of the trench.
摘要:
A method for manufacturing a semiconductor device including forming a buffer film on a semiconductor substrate, forming a element partitioning trench, forming a oxidized film on the surface of the element partitioning trench, and washing the semiconductor substrate with hydrofluoric acid. The washing removes part of the buffer film, and the end of the buffer film is inwardly removed from the top edge of the element partitioning trench by a predetermined distance. The distance and the thickness of the oxidized film are represented by the expression 0≦x≦(d/2 sin θ), where x represents the distance, and θ represents the angle between a plane parallel to the semiconductor substrate and a side surface of the element partitioning trench.
摘要翻译:一种制造半导体器件的方法,包括在半导体衬底上形成缓冲膜,形成元件分隔沟槽,在元件分隔沟槽的表面上形成氧化膜,并用氢氟酸洗涤半导体衬底。 洗涤物去除部分缓冲膜,缓冲膜的端部从元件分隔槽的顶部边缘向内移除预定距离。 氧化膜的距离和厚度由表达式0 <= x <=(d /2sinθ)表示,其中x表示距离,θ表示平行于半导体衬底的平面与侧面之间的角度 元件分隔沟的表面。
摘要:
A solid state imaging device includes photoelectric conversion portions for performing photoelectric conversion, and transfer portions for transferring signal charge occurring at the photoelectric conversion portions. Each transfer portion includes a transfer electrode formed of polysilicon film or the like, and an insulating coating film formed of a material such as a silicon nitride film and so forth, which has a higher relative dielectric constant than that of the silicon oxide, for coating the bottom face, the upper face, and both side faces, of the transfer electrode. The silicon nitride film is formed with a film thickness which is greater than 0 nm and smaller than 60 nm, on both sides of the transfer electrode.
摘要:
A method of fabricating a semiconductor device capable of improving reliability of a gate insulator film is obtained. This method of fabricating a semiconductor device comprises a step of forming a gate insulator film on the main surface of a semiconductor layer by heat treatment, and the step of forming the gate insulator film includes a step of performing the heat treatment in an atmosphere containing oxidizing gas at a temperature exceeding the temperature causing viscous flow of the gate insulator film thereby forming the gate insulator film on the main surface of the semiconductor layer.
摘要:
The present invention obtains a multi-shaft drive device that can protect a rack and pinion from operative load input to a selector. The multi-shaft drive device is provided with: an input-side bevel gear (52) to which motor power is transmitted; and an output-side bevel gear (34) that transmits the power transmitted from the input-side bevel gear (52) to a movable mechanism. The multi-shaft drive device is further provided with: a selector (10) that connects/disconnects the meshing of the output-side bevel gear (34) and the input-side bevel gear (52); and a rotating shaft (16) that causes the selector (10) to slide via a rack (18) and pinion (17). Furthermore, the angle of rotation of the rotating shaft (16) is regulated by the end of the pinion (17) contacting a vertical wall (1A) of a case (1).
摘要:
A power transmission member that transmits rotation of an output shaft to a movable mechanism achieves a simpler structure and increased productivity compared to when a conventional flexible cable is employed. Out of plural output portions 30 of a clutch unit 2, power transmission members that transmit rotation of an output shaft 31 to a movable mechanism are configured by a conventional torque cable in a second output portion 30B and a third output portion 30C. However in a first output portion 30A, the power transmission member is configured by a gearbox 3 including a worm 71 that is coaxially and integrally formed with an output shaft 31A.
摘要:
There is provided a traffic sign apparatus that can improve the luminance of a sign surface which emits light by ultraviolet irradiation, and the uniformity ratio of illuminance, so as to enhance the visibility thereof in the nighttime. The traffic sign apparatus 10 includes a sign body 11 having the sign surface 14 which emits light by ultraviolet irradiation, and an irradiation device 12 for irradiating ultraviolet rays onto the sign surface 14. Assuming that the maximum incident angle of the ultraviolet rays be θ1, the ultraviolet rays being irradiated from the ultraviolet emission lamps 26 of the irradiation unit 12 onto the objective sign surfaces W1 and W2 on the sign surface 14 which is the irradiation object of the ultraviolet emission lamps 26; and that the minimum incident angle be θ2, the angle θ1 is set to more than 30° and less than 70°; and the angle θ 2 is set to more than 5° and less than 30°.
摘要:
A semiconductor device capable of improving the operating speed and inhibiting the threshold voltage from fluctuation is obtained. In this semiconductor device, fluorine is introduced into at least any of regions extending over the junction interfaces between a first conductivity type semiconductor region and second conductivity type source/drain regions, at least the interface between the gate insulator film and the central region of a channel region as well as a gate insulator film, and side wall insulator films.
摘要:
The present invention provides an imaging device capable of suppressing deterioration of image quality due to shortage of the amount of light. The imaging device comprises an imaging part which performs photoelectric conversion; a mixing part which mixes electrons corresponding to at least two of pixels transferred from the imaging part; and an electron-ejection gate electrode which has a length in the transfer direction smaller than the length in the transfer direction of a gate electrode of later stage and ejects the electrons mixed by the mixing part.
摘要:
This image sensor includes a charge increasing portion for increasing the quantity of charges, a first electrode for applying a voltage regulating a region adjacent to the charge increasing portion to a prescribed potential, a second electrode provided adjacently to the first electrode for applying another voltage increasing the quantity of charges in the charge increasing portion, a first wire formed on a prescribed layer for supplying a signal to the first electrode and a second wire formed on a layer different from the prescribed layer for supplying another signal to the second electrode.