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    IMAGE DETERMINING DEVICE
    1.
    发明申请
    IMAGE DETERMINING DEVICE 有权
    图像确定装置

    公开(公告)号：US20120250944A1

    公开(公告)日：2012-10-04

    申请号：US13513704

    申请日：2010-12-28

    申请人： Tetsuya Yamamoto ,  Masahiro Nei ,  Isao Totsuka ,  Tomoyuki Matsuyama ,  Masamitsu Yanagihara ,  Satoshi Hagiwara ,  Masakazu Sekiguchi

    发明人： Tetsuya Yamamoto ,  Masahiro Nei ,  Isao Totsuka ,  Tomoyuki Matsuyama ,  Masamitsu Yanagihara ,  Satoshi Hagiwara ,  Masakazu Sekiguchi

    IPC分类号： G06K9/62

    CPC分类号： G06K9/00369 ,  G06T7/30 ,  G08B21/0476 ,  H04N7/18 ,  H04N7/181

    摘要： To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.

    摘要翻译： 为了确定具有简单结构的被摄体人的状态，图像确定装置包括：成像单元，其从第一方向捕获图像，所述图像包括被摄体人; 第一检测器，其检测来自图像的尺寸信息，所述尺寸信息是关于所述被摄体在所述第一方向上; 第二检测器，其检测位置相关信息，所述位置相关信息不同于由所述第一检测器检测的信息; 以及确定单元，其基于由第一检测器执行的检测结果和由第二检测器执行的检测结果来确定被检者的状态。

    Exposure method and apparatus
    6.
    发明授权
    Exposure method and apparatus 有权
    曝光方法和装置

    公开(公告)号：US06552775B1

    公开(公告)日：2003-04-22

    申请号：US09718373

    申请日：2000-11-24

    申请人： Masamitsu Yanagihara ,  Tomohiro Katsume

    发明人： Masamitsu Yanagihara ,  Tomohiro Katsume

    IPC分类号： G03B2752

    CPC分类号： G03F7/70225 ,  G03F7/70258 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/7003

    摘要： An exposure apparatus and a method which make it possible to enhance the fineness of pattern in spite of the trend to enlarge the size of the photosensitive substrate and device. In this apparatus, a mask and the photosensitive substrate are allowed to synchronously scan, and the optical projecting system thereof is provided with a scanning direction adjusting means which is designed to adjust the position of scanning direction of a projected image to be projected onto the substrate, wherein a non-linear component of error is determined in advance and the result thus determined is stored as a correction value for the apparatus, thereby enabling the pattern exposure to be performed while continuously controlling the image-adjusting mechanism on the basis of the correction value.

    摘要翻译： 尽管趋向于增大感光基板和装置的尺寸，但是可以提高图案细度的曝光装置和方法。 在该装置中，掩模和感光基板被允许同步扫描，并且其光学投影系统设置有扫描方向调整装置，该扫描方向调整装置被设计成调整要投影到基板上的投影图像的扫描方向的位置 其中，预先确定误差的非线性分量，并且将由此确定的结果存储为装置的校正值，从而能够在基于校正的基础上连续控制图像调整机构的同时执行图案曝光 值。

    Projection optical apparatus
    7.
    发明授权
    Projection optical apparatus 失效
    投影光学仪器

    公开(公告)号：US4687322A

    公开(公告)日：1987-08-18

    申请号：US931013

    申请日：1986-11-17

    申请人： Akikazu Tanimoto ,  Shoji Ishizaka ,  Yutaka Endo ,  Hiroyuki Suzuki ,  Masamitsu Yanagihara

    发明人： Akikazu Tanimoto ,  Shoji Ishizaka ,  Yutaka Endo ,  Hiroyuki Suzuki ,  Masamitsu Yanagihara

    IPC分类号： H01L21/30 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G03B27/52

    CPC分类号： G03F9/7026

    摘要： An apparatus for forming the optical image of a photo-pattern placed on a first plane on a second plane comprises projection means having a projection optical system disposed between the first plane and the second plane to form the optical image, focus detecting means including means for detecting the position of the second plane relative to the projection optical system, the in-focus position corresponding to the position of the second plane when the imaging plane of the projection optical system and the second plane are coincident with each other being preset, the focus detecting means putting out a detection signal when the in-focus position is detected by the detecting means, fluctuation detecting means for determining the amount of fluctuation of the imaging plane of the projection optical system caused correspondingly to a variation in the refractive index of the atmosphere, and means responsive to the fluctuation detecting means to control the focus detecting means so that the in-focus position is re-set correspondingly to the amount of fluctuation of the imaging plane determined by the fluctuation detecting means.

    摘要翻译： 用于形成放置在第二平面上的第一平面上的光图案的光学图像的装置包括投影装置，其具有设置在第一平面和第二平面之间的投影光学系统以形成光学图像，焦点检测装置包括： 检测第二平面相对于投影光学系统的位置，当投影光学系统和第二平面的成像平面彼此一致时，对应于第二平面的位置的对焦位置被预设，焦点 检测装置，当由检测装置检测到对焦位置时，放出检测信号;波动检测装置，用于确定投影光学系统的成像面的波动量对应于大气折射率的变化 以及响应于所述波动检测装置来控制所述焦点检测装置的装置， n焦点位置对应于由波动检测装置确定的成像平面的波动量重新设定。

    Exposure apparatus and field stop thereof
    8.
    发明授权
    Exposure apparatus and field stop thereof 有权
    曝光装置及其现场停止

    公开(公告)号：US06213607B1

    公开(公告)日：2001-04-10

    申请号：US09293953

    申请日：1999-04-19

    申请人： Tomoyuki Watanabe ,  Masamitsu Yanagihara ,  Hideji Goto ,  Noritsugu Hanazaki

    发明人： Tomoyuki Watanabe ,  Masamitsu Yanagihara ,  Hideji Goto ,  Noritsugu Hanazaki

    IPC分类号： G02B2700

    CPC分类号： G03F7/70066 ,  G03F7/70475

    摘要： An exposure apparatus has a field stop, disposed in a position conjugate to a reticle, for regulating an illumination area on the reticle. The field stop is constructed of two aperture members including light shielding portions, rectangular first and second apertures and light reducing portions formed at sides of these apertures. The exposure apparatus also has a drive system for shifting positions of light reducing portions and relatively moving the two aperture members during the projection.

    摘要翻译： 曝光装置具有设置在与掩模版共轭的位置的场停止件，用于调节掩模版上的照明区域。 场挡由两个光圈构件构成，包括遮光部分，矩形第一和第二孔以及形成在这些孔的侧面的减光部分。 曝光装置还具有用于在投影期间移动减光部分的位置并相对移动两个光圈构件的驱动系统。

    Exposure method and apparatus
    9.
    发明授权
    Exposure method and apparatus 失效
    曝光方法和装置

    公开(公告)号：US5623343A

    公开(公告)日：1997-04-22

    申请号：US548402

    申请日：1995-10-26

    申请人： Kei Nara ,  Masamitsu Yanagihara ,  Seiji Miyazaki

    发明人： Kei Nara ,  Masamitsu Yanagihara ,  Seiji Miyazaki

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

    CPC分类号： G03F7/70225 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

    摘要： In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value. In the fifth step, at least one of the first and second steps is executed subsequent to the fourth step to newly detect the first or second deviation amount. In the sixth step, the first to fifth steps are repeatedly executed until one of the first and second deviation amounts detected in the fifth step falls within a predetermined allowance.

    摘要翻译： 在本发明的曝光方法的第一步骤中，对准光学系统被布置为与光掩模上的第一掩模标记和感光基板上的第一基板标记中的一个相对，从而检测在光敏基板的位置之间的第一偏移量 第一个掩码标记和第一个掩码标记。 在第二步骤中，对准光学系统布置成与光掩模上的第二掩码标记和感光基板上的第二基板标记之一相对，从而检测第二掩模标记的位置与第二掩模标记的位置之间的第二偏移标记 第二基板标记。 在第三步骤中，计算用于使第一和第二偏移量最小化的校正值。 在第四步骤中，基于校正值来调整光掩模上的原始图案的图像与感光基板上的照射区域之间的相对位置关系。 在第五步骤中，在第四步骤之后执行第一和第二步骤中的至少一个，以重新检测第一或第二偏差量。 在第六步骤中，重复执行第一至第五步骤，直到在第五步骤中检测到的第一和第二偏移量之一落入预定余量之内。