摘要:
In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value. In the fifth step, at least one of the first and second steps is executed subsequent to the fourth step to newly detect the first or second deviation amount. In the sixth step, the first to fifth steps are repeatedly executed until one of the first and second deviation amounts detected in the fifth step falls within a predetermined allowance.
摘要:
The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.
摘要:
The present invention is directed to scanning exposure apparatus and exposure method to achieve simultaneous projection of images of plural regions on a mask onto a photosensitive substrate with correcting an orthogonality error of a pattern on the mask or photosensitive substrate. If the pattern on the mask or photosensitive substrate has an orthogonality error causing a deviation of a certain angle in a first direction perpendicular to a scanning direction as it goes in the scanning direction, the mask and the photosensitive substrate are rotated relative to each other in the plane thereof to align one coordinate axis in a coordinate system of each pattern with the first direction. Then a relative displacement is given by an amount of the orthogonality error between positions of images projected through a first optical system and positions of images projected through a second optical system, and relative positions of the mask and the photosensitive substrate are continuously changed by the amount of the orthogonality error in the first direction in accordance with the position of the mask or photosensitive substrate in the scanning direction.
摘要:
An alignment device includes an image pickup optical system for picking up an image of a first reference mark disposed on a mask and an image of a second reference mark disposed on a photosensitive substrate through an image pickup optical system, a memory for storing information associated with the imaging characteristics of the image pickup optical system, and a correction system for correcting the positions of the first and second reference marks, detected using image information from the image pickup system, on the basis of the information associated with the imaging characteristics of the image pickup optical system.
摘要:
In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification.
摘要:
In a scanning type exposure apparatus for exposing an entire surface of a pattern region on a mask to a substrate by scanning the mask and the substrate with respect to a projection optical system in a predetermined direction with a speed ratio in accordance with a magnification of the projection optical system, there are provided a plurality of illumination optical systems for illuminating respective areas of the pattern region on the mask with respective light fluxes from respective light source; a plurality of projection optical systems arranged so as to correspond to the respective illumination optical systems, the projection optical systems projecting respective images of the areas illuminated by the respective illumination optical systems onto respective projection areas on the substrate; a memory device for obtaining and storing a change of shape of the substrate; a magnification changing device for changing a magnification of at least one of the projection optical systems in accordance with the change of shape of the substrate; and an imaging position changing device for changing the position of said image projected via the at least one projection optical systems in accordance with the change in magnification. An exposure apparatus for exposing a pattern of a mask onto a substrate includes an image transfer system, an imaging characteristic adjusting mechanism and an exposure system. The image transfer system projects the pattern of the mask onto the substrate while moving the mask and the substrate synchronously during the projection of the pattern onto the substrate such that portions of the pattern overlap each other. The imaging characteristic adjusting mechanism is disposed in a space between the mask and the substrate, and adjusts imaging characteristics of a portion of the image transfer system that projects the pattern onto the substrate. The exposure system exposes the pattern during the synchronous movement of the mask and the substrate by the image transfer system.
摘要:
Positional discrepancies of images of segmental areas, which are caused by stretching of a substrate in the Y direction, are corrected by changing magnifications of respective projection optical systems and inclinations of parallel plane glass pieces with respect optical axes. After that, positional discrepancies of the images after the correction are accurately detected by using a calibration system for the projection optical systems. Thus it is possible to confirm whether or not the positional discrepancies are accurately corrected. If the correction is insufficient as a result of the confirmation, at least one of correction of the magnifications of the respective projection optical systems and shift of the images projected through the respective projection optical systems onto the substrate is executed again so that amounts of the positional discrepancies are sufficiently small. On the other hand, the positional discrepancy can be easily determined by storing positional information and a detected signal concerning an image formed by a projection optical system in synchronization with a clock, followed by signal processing.
摘要:
To appropriately guide a subject person while protecting a privacy of the subject person despite use of an captured image of the subject person, a guidance system includes: an image capturing unit capable of capturing an image containing a subject person from a first direction; a detection unit that detects a size of an image of the subject person from the image captured by the image capturing unit; and a guidance unit that provides guidance for the subject person based on a detection result of the detection unit.
摘要:
An exposure apparatus and a method which make it possible to enhance the fineness of pattern in spite of the trend to enlarge the size of the photosensitive substrate and device. In this apparatus, a mask and the photosensitive substrate are allowed to synchronously scan, and the optical projecting system thereof is provided with a scanning direction adjusting means which is designed to adjust the position of scanning direction of a projected image to be projected onto the substrate, wherein a non-linear component of error is determined in advance and the result thus determined is stored as a correction value for the apparatus, thereby enabling the pattern exposure to be performed while continuously controlling the image-adjusting mechanism on the basis of the correction value.
摘要:
An apparatus for forming the optical image of a photo-pattern placed on a first plane on a second plane comprises projection means having a projection optical system disposed between the first plane and the second plane to form the optical image, focus detecting means including means for detecting the position of the second plane relative to the projection optical system, the in-focus position corresponding to the position of the second plane when the imaging plane of the projection optical system and the second plane are coincident with each other being preset, the focus detecting means putting out a detection signal when the in-focus position is detected by the detecting means, fluctuation detecting means for determining the amount of fluctuation of the imaging plane of the projection optical system caused correspondingly to a variation in the refractive index of the atmosphere, and means responsive to the fluctuation detecting means to control the focus detecting means so that the in-focus position is re-set correspondingly to the amount of fluctuation of the imaging plane determined by the fluctuation detecting means.