摘要:
To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.
摘要:
To appropriately guide a subject person while protecting a privacy of the subject person despite use of an captured image of the subject person, a guidance system includes: an image capturing unit capable of capturing an image containing a subject person from a first direction; a detection unit that detects a size of an image of the subject person from the image captured by the image capturing unit; and a guidance unit that provides guidance for the subject person based on a detection result of the detection unit.
摘要:
To determine the state of a subject person with a simple structure, an image determining device includes: an imaging unit that captures an image from a first direction, the image including the subject person; a first detector that detects size information from the image, the size information being about the subject person in the first direction; a second detector that detects position-related information, the position-related information being different from the information detected by the first detector; and a determining unit that determines the state of the subject person, based on a result of the detection performed by the first detector and a result of the detection performed by the second detector.
摘要:
Provided is an electronic device capable of controlling an appropriate voice device, the electronic device including: an acquisition device that acquires an image capturing result from at least one image capturing device capable of capturing an image containing a subject person; a control device configured to control a voice device located outside an image capturing region of the image capturing device in accordance with the image capturing result of the image capturing device.
摘要:
To appropriately guide a subject person while protecting a privacy of the subject person despite use of an captured image of the subject person, a guidance system includes: an image capturing unit capable of capturing an image containing a subject person from a first direction; a detection unit that detects a size of an image of the subject person from the image captured by the image capturing unit; and a guidance unit that provides guidance for the subject person based on a detection result of the detection unit.
摘要:
An exposure apparatus and a method which make it possible to enhance the fineness of pattern in spite of the trend to enlarge the size of the photosensitive substrate and device. In this apparatus, a mask and the photosensitive substrate are allowed to synchronously scan, and the optical projecting system thereof is provided with a scanning direction adjusting means which is designed to adjust the position of scanning direction of a projected image to be projected onto the substrate, wherein a non-linear component of error is determined in advance and the result thus determined is stored as a correction value for the apparatus, thereby enabling the pattern exposure to be performed while continuously controlling the image-adjusting mechanism on the basis of the correction value.
摘要:
An apparatus for forming the optical image of a photo-pattern placed on a first plane on a second plane comprises projection means having a projection optical system disposed between the first plane and the second plane to form the optical image, focus detecting means including means for detecting the position of the second plane relative to the projection optical system, the in-focus position corresponding to the position of the second plane when the imaging plane of the projection optical system and the second plane are coincident with each other being preset, the focus detecting means putting out a detection signal when the in-focus position is detected by the detecting means, fluctuation detecting means for determining the amount of fluctuation of the imaging plane of the projection optical system caused correspondingly to a variation in the refractive index of the atmosphere, and means responsive to the fluctuation detecting means to control the focus detecting means so that the in-focus position is re-set correspondingly to the amount of fluctuation of the imaging plane determined by the fluctuation detecting means.
摘要:
An exposure apparatus has a field stop, disposed in a position conjugate to a reticle, for regulating an illumination area on the reticle. The field stop is constructed of two aperture members including light shielding portions, rectangular first and second apertures and light reducing portions formed at sides of these apertures. The exposure apparatus also has a drive system for shifting positions of light reducing portions and relatively moving the two aperture members during the projection.
摘要:
In the first step of an exposure method of the present invention, an alignment optical system is arranged to oppose one of a first mask mark on a photomask and a first substrate mark on a photosensitive substrate, thereby detecting a first deviation amount between the position of the first mask mark and that of the first substrate mark. In the second step, the alignment optical system is arranged to oppose one of a second mask mark on the photomask and a second substrate mark on the photosensitive substrate, thereby detecting a second deviation mark between the position of the second mask mark and that of the second substrate mark. In the third step, correction values for minimizing the first and second deviation amounts are calculated. In the fourth step, the relative positional relationship between the image of an original pattern on the photomask and a shot area on the photosensitive substrate is adjusted on the basis of a correction value. In the fifth step, at least one of the first and second steps is executed subsequent to the fourth step to newly detect the first or second deviation amount. In the sixth step, the first to fifth steps are repeatedly executed until one of the first and second deviation amounts detected in the fifth step falls within a predetermined allowance.
摘要:
An exposure apparatus includes a projection optical system for projecting a pattern on a mask onto a photosensitive substrate and a measuring unit for measuring distances between the mask and the projection optical system at a plurality of positions within a surface of the mask. The position of the photosensitive substrate with respect to the projection optical system is changed on the basis of a plurality of the distances measured by the measuring unit.