公开(公告)号：US5405443A

公开(公告)日：1995-04-11

申请号：US051554

申请日：1993-04-23

申请人： Masami Akimoto ,  Kazuyuki Gotou ,  Yasushi Ito ,  Katsuya Okumura

发明人： Masami Akimoto ,  Kazuyuki Gotou ,  Yasushi Ito ,  Katsuya Okumura

IPC分类号： B05C11/08 ,  B05C11/10 ,  G03F7/16 ,  G03F7/30 ,  H01L21/00 ,  H01L21/027 ,  H01L21/30 ,  B05C5/00

CPC分类号： H01L21/6715 ,  B05C11/08 ,  B05C11/1002 ,  B05C11/101 ,  B05C11/1047 ,  G03F7/162 ,  G03F7/3021

摘要： A substrates processing device having a tank in which process solution is contained, a bottle communicated with the tank through a conduit and located above an object to be processed with the process solution supplied, a nozzle located under the bottle, a support for supporting the object to be processed, and a changeover device for making pressure in it negative through a conduit when the process solution is to be added to it and also making pressure in it normal through the conduit when the process solution is to be supplied to the nozzle.

摘要翻译： 一种基板处理装置，具有容纳有处理液的罐，通过导管与罐连通的瓶子，位于被供给的处理液的待处理对象上方，位于瓶下方的喷嘴，支撑物体的支撑体 以及当将工艺溶液加入其中时，通过导管使压力为负的切换装置，并且当将处理液提供给喷嘴时，通过导管使压力正常。

公开(公告)号：US07838801B2

公开(公告)日：2010-11-23

申请号：US11707061

申请日：2007-02-16

申请人： Osamu Hirakawa ,  Masami Akimoto ,  Shinichi Hayashi

发明人： Osamu Hirakawa ,  Masami Akimoto ,  Shinichi Hayashi

IPC分类号： H01L21/68 ,  B65G15/10 ,  B65H5/02 ,  F27B5/06 ,  F27B5/12

CPC分类号： H01L21/67109 ,  H01L21/67748 ,  Y10S198/952

摘要： A heating apparatus cooling a substrate heated by a hot plate at a cooling position adjacent to the hot plate, capable of achieving a smaller height and reducing an operation time in the apparatus, in which contamination of the substrate by particles or the like is less likely, and the like, are provided. The heating apparatus includes a hot plate for heating a wafer representing a substrate from below, in a heating chamber having a wafer load/unload port. In addition, a wire for transferring the wafer between a cooling position of the substrate adjacent to the load/unload port of the heating chamber (position above a cooling plate) and a position above the hot plate is provided and extends. The wafer is mounted on a gap forming member provided on the wire, and thereafter loaded into the heating chamber.

摘要翻译： 一种加热装置，用于在与热板相邻的冷却位置处冷却由热板加热的基板，能够实现较小的高度，并且减少了由于颗粒等引起的基板污染的装置中的操作时间。 ，等等。 加热装置包括用于在具有晶片装载/卸载端口的加热室中从下方加热表示基板的晶片的热板。 此外，提供并延伸用于将晶片在与加热室的加载/卸载端口相邻的冷却位置（位于冷却板的上方）之间传送晶片的导线和热板上方的位置。 将晶片安装在设置在线材上的间隙形成部件上，然后装入加热室。

公开(公告)号：US07245348B2

公开(公告)日：2007-07-17

申请号：US11117566

申请日：2005-04-29

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： G03B27/52

CPC分类号： H01L21/67184 ,  H01L21/6715 ,  H01L21/67178 ,  H01L21/6719

摘要： A coating and developing system includes an auxiliary block, a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with either a case where antireflection films are formed or a case where no antireflection film is formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block S2. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a carrying program.

摘要翻译： 涂覆显影系统包括辅助块，抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗蚀剂膜下面的抗反射膜，以及抗反射膜，覆盖抗蚀剂膜 空间。 涂覆和显影系统可以应对形成防反射膜的情况或不形成抗反射膜的情况。 成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块S2中层叠。 在形成防反射膜的情况下选择性地使用TCT层，COT层和BCT层以及未形成任何抗反射膜的情况。 涂层和显影系统由携带程序控制。

公开(公告)号：US20070056514A1

公开(公告)日：2007-03-15

申请号：US11342616

申请日：2006-01-31

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： C23C16/00

CPC分类号： H01L21/67184 ,  H01L21/67173 ,  H01L21/67178 ,  H01L21/67207 ,  H01L21/67745

摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

摘要翻译： 提供一种由多个单元块组成的涂层显影装置。 第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。 用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。 用于应用或涂布的单元块包括多个处理单元，包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。 用于应用的单元块被布置在第一和第二单元块堆叠中。 根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。 暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

公开(公告)号：US20070031145A1

公开(公告)日：2007-02-08

申请号：US11495732

申请日：2006-07-31

申请人： Takahiro Kitano ,  Masami Akimoto ,  Shuuichi Nishikido ,  Dai Kumagai

发明人： Takahiro Kitano ,  Masami Akimoto ,  Shuuichi Nishikido ,  Dai Kumagai

IPC分类号： G03D5/00

CPC分类号： G03D5/04 ,  G03F7/30 ,  G03F7/3021 ,  H01L21/6715 ,  H01L21/67748 ,  Y10S134/902

摘要： In the present invention, a substrate transfer unit into/from which a substrate is transferred from/to the outside of a treatment container and a developing treatment unit in which development of the substrate is performed are arranged side by side in the treatment container, and a carrier mechanism is provided which carries the substrate while grasping an outside surface of the substrate from both sides, between the substrate transfer unit and the developing treatment unit. A developing solution supply nozzle for supplying a developing solution onto the substrate and a gas blow nozzle for blowing a gas to the substrate, are provided between the substrate transfer unit and the developing treatment unit and above a carriage path along which the substrate is carried, and a cleaning solution supply nozzle is provided in the developing treatment unit for supplying a cleaning solution onto the substrate. According to the present invention, since the substrate is carried with its outside surface being grasped, spread of contamination can be prevented to restrain generation of particles in the treatment container.

摘要翻译： 在本发明中，在处理容器中并排设置有将基板从处理容器的外部转移到基板转移单元和进行基板的显影的显影处理单元，并且 提供了一种承载机构，其承载基板，同时从基板转印单元和显影处理单元之间的两侧抓住基板的外表面。 用于将显影液供给到基板上的显影液供给喷嘴和用于将气体吹送到基板的气体吹出喷嘴设置在基板转印单元和显影处理单元之间以及载置基板的滑架路径上方， 并且在显影处理单元中设置清洁液供给喷嘴，用于将清洗液供给到基板上。 根据本发明，由于基板的外表面被抓住，因此可以防止污染物的扩散，从而抑制处理容器中的颗粒的产生。

公开(公告)号：US07087118B2

公开(公告)日：2006-08-08

申请号：US11080756

申请日：2005-03-16

申请人： Takahiro Kitano ,  Masateru Morikawa ,  Yukihiko Esaki ,  Nobukazu Ishizaka ,  Norihisa Koga ,  Kazuhiro Takeshita ,  Hirofumi Ookuma ,  Masami Akimoto

发明人： Takahiro Kitano ,  Masateru Morikawa ,  Yukihiko Esaki ,  Nobukazu Ishizaka ,  Norihisa Koga ,  Kazuhiro Takeshita ,  Hirofumi Ookuma ,  Masami Akimoto

IPC分类号： B05C11/10 ,  B05B12/12

CPC分类号： H01L21/6715 ,  G03F7/162 ,  Y10S134/902

摘要： A coating film forming apparatus for forming a film by applying a coating solution to a substrate, which is provided with a cassette section, coating unit, developing unit, pre-treatment/post-treatment units and a main arm for transferring the substrate between the respective units. In the coating unit, provided is a coating section in which a resist is applied on the substrate in a manner of single stroke by intermittently moving the substrate in a Y-direction and by moving a nozzle in an X-direction, and provided is a reduced-pressure drying section for drying under reduced pressure the substrate after being applied, and further provided is equipment for removing the coating film adhered to a periphery of the substrate. Additionally, when the reduced-pressure drying section is arranged outside the coating unit, the main arm is covered with a cover so that the inside thereof is under a solvent atmosphere.

摘要翻译： 一种涂膜形成装置，用于通过将涂布溶液涂布到基底上来形成膜，该基材设置有盒部，涂布单元，显影单元，预处理/后处理单元和用于在基板之间转移基板的主臂 各单位。 在涂布单元中，设置了通过在Y方向间歇地移动基板并且沿X方向移动喷嘴，以单行程的方式将抗蚀剂施加在基板上的涂布部分，并且设置为 减压干燥部分，用于在施加后在减压下干燥基板，并且还提供了用于去除附着到基板周边的涂膜的设备。 此外，当将减压干燥部配置在涂布单元的外侧时，主臂被盖覆盖，使其内部处于溶剂气氛下。

公开(公告)号：US20060162858A1

公开(公告)日：2006-07-27

申请号：US11336990

申请日：2006-01-23

申请人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

发明人： Masami Akimoto ,  Shinichi Hayashi ,  Yasushi Hayashida ,  Nobuaki Matsuoka ,  Yoshio Kimura ,  Issei Ueda ,  Hikaru Ito

IPC分类号： B32B37/00

CPC分类号： H01L21/6715 ,  H01L21/00 ,  H01L21/67178 ,  H01L21/67184 ,  H01L21/6719

摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

公开(公告)号：US07011863B2

公开(公告)日：2006-03-14

申请号：US10222899

申请日：2002-08-19

申请人： Masami Akimoto

发明人： Masami Akimoto

IPC分类号： B05D3/00

CPC分类号： H01L21/67178 ,  H01L21/67109

摘要： A substrate which has been subjected to heat processing in any of hot plate units is transferred to a normal cooling unit by a transfer device and subjected to cooling processing to some extent, and then transferred to a high accuracy cooling unit and subjected to cooling processing with high accuracy, and thereafter transferred to any of coating units or a developing units. Thereby, the substrate can be subjected to the cooling processing with high accuracy and thereafter to coating processing with no increase in apparatus cost and with no decrease in throughput.

公开(公告)号：US06655891B2

公开(公告)日：2003-12-02

申请号：US10103792

申请日：2002-03-25

申请人： Issei Ueda ,  Masami Akimoto ,  Kazuhiko Ito ,  Mitiaki Matsushita ,  Masatoshi Kaneda ,  Yuji Matsuyama

发明人： Issei Ueda ,  Masami Akimoto ,  Kazuhiko Ito ,  Mitiaki Matsushita ,  Masatoshi Kaneda ,  Yuji Matsuyama

IPC分类号： B65G4907

CPC分类号： G03F7/70691 ,  H01L21/67772 ,  Y10S414/136 ,  Y10S414/139 ,  Y10S414/14

摘要： A substrate transfer system comprising a cassette table for mounting a cassette which has an opening portion for loading and unloading a substrate and a cover detachably provided to the opening portion, process portion for processing the substrate housed in a cassette on the cassette table, a transfer arm mechanism for taking out the substrate from the cassette table, transferring it to process units G1 to G5, and returning a processed substrate to the cassette on the cassette table, partition members provided between the transfer arm mechanism and the cassette table, for separating an atmosphere on the side of the transfer arm mechanism from that on the side of the cassette table, a passage formed in the partition member so as to face the opening portion of the cassette on the cassette table, for passing the substrate taken out from the cassette on the cassette table by the transfer arm mechanism and returning the substrate to the cassette on the cassette table, cassette moving mechanisms for moving the opening portion of the cassette on the cassette table closer to the passage or to be farther from the passage, and a cover removing mechanism for detaching the cover from the opening portion or attaching the cover to the opening portion of the cassette.

公开(公告)号：US06605153B2

公开(公告)日：2003-08-12

申请号：US09735657

申请日：2000-12-14

申请人： Takahiro Kitano ,  Masateru Morikawa ,  Yukihiko Esaki ,  Nobukazu Ishizaka ,  Norihisa Koga ,  Kazuhiro Takeshita ,  Hirofumi Ookuma ,  Masami Akimoto

发明人： Takahiro Kitano ,  Masateru Morikawa ,  Yukihiko Esaki ,  Nobukazu Ishizaka ,  Norihisa Koga ,  Kazuhiro Takeshita ,  Hirofumi Ookuma ,  Masami Akimoto

IPC分类号： B05C1110

CPC分类号： H01L21/6715 ,  B05B12/20 ,  B05B13/041 ,  B05C5/0212 ,  B05C5/0216 ,  B05C5/0291 ,  B05C11/1039

摘要： An apparatus includes a holding portion for holding a substrate, a nozzle, provided to face the substrate held by the holding portion, for discharging a solution to the substrate, a driver for moving the nozzle along a surface of the substrate relatively with respect to the substrate while the solution is being discharged to the surface of the substrate from the nozzle, a mask unit covering a portion other than a film formation area of the substrate and including a mask member for catching the solution from the nozzle, and a cleaner provided in the mask unit. The coating solution can be supplied to the surface of the substrate in a way similar to a picture drawn with a single stroke of a brush. A cleaning unit for cleaning the mask member does not need to be provided separately, leading to the facilitation of cleaning and a reduction in space.

摘要翻译： 一种装置，包括用于保持基板的保持部分，设置成面对由保持部分保持的基板的喷嘴，用于将溶液排出到基板;驱动器，用于相对于所述基板沿着基板的表面移动喷嘴 基板，同时溶液从喷嘴排出到基板的表面;掩模单元，覆盖除了基板的成膜区域以外的部分，并且包括用于从喷嘴捕获溶液的掩模构件，以及设置在该基板中的清洁器 面具单元。 涂布溶液可以以类似于用笔刷的单次笔画绘制的图像的方式供应到基底的表面。 用于清洁面罩构件的清洁单元不需要单独提供，从而促进清洁和减少空间。