Method of manufacturing NAND type EEPROM
    1.
    发明授权
    Method of manufacturing NAND type EEPROM 失效
    制造NAND型EEPROM的方法

    公开(公告)号:US5597748A

    公开(公告)日:1997-01-28

    申请号:US247589

    申请日:1994-05-23

    摘要: The present invention relates to a non-volatile semiconductor memory having non-volatile memory cells capable of electrically erasing and writing data. Each memory cell has a floating gate formed on the surface of the semiconductor substrate above the channel region, and a control gate. The floating gate partially covers the channel region. Each memory cell is thereby constructed of a parallel connection of a floating gate transistor and an enhancement type transistor. The floating gate transistor is displaced in one of the widthwise directions of the channel region, or partially covers only the central portion of the channel region in the widthwise direction thereof. A plurality of memory cells are connected in series to constitute a basic block. Adjacent basic blocks are separated by an enhancement type MOS transistor. In this memory, a memory cell (floating gate) and an enhancement type MOS transistor (gate) are formed in self alignment with each other using the same mask. In addition, in this memory, a control gate and a floating gate are formed in self alignment with each other using the same mask.

    摘要翻译: 本发明涉及具有能够电擦除和写入数据的非易失性存储单元的非易失性半导体存储器。 每个存储单元具有形成在沟道区域上方的半导体衬底的表面上的浮置栅极和控制栅极。 浮动栅极部分地覆盖沟道区域。 因此,每个存储单元由浮栅晶体管和增强型晶体管的并联连接构成。 浮栅晶体管在沟道区域的宽度方向中的一个方向上位移,或部分仅覆盖沟道区域的宽度方向的中心部分。 多个存储单元串联连接以构成基本块。 相邻的基本块由增强型MOS晶体管分开。 在该存储器中,使用相同的掩模,以彼此对准的方式形成存储单元(浮置栅极)和增强型MOS晶体管(栅极)。 此外,在该存储器中,使用相同的掩模,以彼此对准的方式形成控制栅极和浮动栅极。

    Non-volatile semiconductor memory and method of manufacturing the same
    2.
    发明授权
    Non-volatile semiconductor memory and method of manufacturing the same 失效
    非易失性半导体存储器及其制造方法

    公开(公告)号:US5824583A

    公开(公告)日:1998-10-20

    申请号:US949819

    申请日:1997-10-14

    摘要: The present invention relates to a non-volatile semiconductor memory having non-volatile memory cells capable of electrically erasing and writing data. Each memory cell has a floating gate formed on the surface of the semiconductor substrate above the channel region, and a control gate. The floating gate partially covers the channel region. Each memory cell is thereby constructed of a parallel connection of a floating gate transistor and an enhancement type transistor. The floating gate transistor is displaced in one of the widthwise directions of the channel region, or partially covers only the central portion of the channel region in the widthwise direction thereof. A plurality of memory cells are connected in series to constitute a basic block. Adjacent basic blocks are separated by an enhancement type MOS transistor. In this memory, a memory cell (floating gate) and an enhancement type MOS transistor (gate) are formed in self alignment with each other using the same mask. In addition, in this memory, a control gate and a floating gate are formed in self alignment with each other using the same mask.

    摘要翻译: 本发明涉及具有能够电擦除和写入数据的非易失性存储单元的非易失性半导体存储器。 每个存储单元具有形成在沟道区域上方的半导体衬底的表面上的浮置栅极和控制栅极。 浮动栅极部分地覆盖沟道区域。 因此,每个存储单元由浮栅晶体管和增强型晶体管的并联连接构成。 浮栅晶体管在沟道区域的宽度方向中的一个方向上位移,或部分仅覆盖沟道区域的宽度方向的中心部分。 多个存储单元串联连接以构成基本块。 相邻的基本块由增强型MOS晶体管分开。 在该存储器中,使用相同的掩模,以彼此对准的方式形成存储单元(浮置栅极)和增强型MOS晶体管(栅极)。 此外,在该存储器中,使用相同的掩模,以彼此对准的方式形成控制栅极和浮动栅极。

    Non-volatile semiconductor memory and method of manufacturing the same
    3.
    发明授权
    Non-volatile semiconductor memory and method of manufacturing the same 失效
    非易失性半导体存储器及其制造方法

    公开(公告)号:US5323039A

    公开(公告)日:1994-06-21

    申请号:US499342

    申请日:1990-06-21

    摘要: The present invention relates to a non-volatile semiconductor memory having non-volatile memory cells capable of electrically erasing and writing data. Each memory cell has a floating gate formed on the surface of the semiconductor substrate above the channel region, and a control gate. The floating gate partially covers the channel region. Each memory cell is thereby constructed of a parallel connection of a floating gate transistor and an enhancement type transistor. The floating gate transistor is displaced in one of the widthwise directions of the channel region, or partially covers only the central portion of the channel region in the widthwise direction thereof. A plurality of memory cells are connected in series to constitute a basic block. Adjacent basic blocks are separated by an enhancement type MOS transistor. In this memory, a memory cell (floating gate) and an enhancement type MOS transistor (gate) are formed in self alignment with each other using the same mask. In addition, in this memory, a control gate and a floating gate are formed in self alignment with each other using the same mask.

    摘要翻译: PCT No.PCT / JP89 / 00942 Sec。 371 1990年6月21日第 102(e)日期1990年6月21日PCT提交1989年9月14日PCT公布。 公开号WO90 / 04855 日期为1990年5月3日。本发明涉及具有能够电擦除和写入数据的非易失性存储单元的非易失性半导体存储器。 每个存储单元具有形成在沟道区域上方的半导体衬底的表面上的浮置栅极和控制栅极。 浮动栅极部分地覆盖沟道区域。 因此,每个存储单元由浮栅晶体管和增强型晶体管的并联连接构成。 浮栅晶体管在沟道区域的宽度方向中的一个方向上位移,或部分仅覆盖沟道区域的宽度方向的中心部分。 多个存储单元串联连接以构成基本块。 相邻的基本块由增强型MOS晶体管分开。 在该存储器中,使用相同的掩模,以彼此对准的方式形成存储单元(浮置栅极)和增强型MOS晶体管(栅极)。 此外,在该存储器中,使用相同的掩模,以彼此对准的方式形成控制栅极和浮动栅极。