摘要:
A plurality of electromagnetic wave radiation waveguides are formed to branch from an electromagnetic wave distribution waveguide. A plurality of slots are provided to each electromagnetic wave radiation waveguide. A width of the electromagnetic wave radiation waveguide, a height of the electromagnetic wave radiation waveguide and an electromagnetic wave radiation waveguide cycle p are set to satisfy a relationship of λ0>p>a2>b2 and p=(λg1/2)+±α (where α is 5% or below of λg1), where λ0 is a free space wavelength of an electromagnetic wave, al is a width of the electromagnetic wave distribution waveguide, εr1 is a specific inductive capacity of a dielectric material in the electromagnetic wave distribution waveguide, and λg1 is a wavelength of the electromagnetic wave output from the electromagnetic wave source in the electromagnetic wave distribution waveguide.
摘要翻译:多个电磁波辐射波导形成为从电磁波分布波导分支。 向每个电磁波辐射波导提供多个槽。 电磁波辐射波导的宽度,电磁波辐射波导的高度和电磁波辐射波导周期p被设定为满足λ<2> / SUB >> b sub> 2和p =(λ1g1 / 2)+±α(其中α为λ1的5%或更低) ),其中λ<0>是电磁波的自由空间波长,a1是电磁波分布波导的宽度,ε是电介质的介电常数 电磁波分布波导中的材料,λ1g1是从电磁波分布波导中的电磁波源输出的电磁波的波长。
摘要:
A plasma processing apparatus comprises: a chamber 12 having at least one opening and for generating plasma; a dielectric member 14 provided to cover the opening air-tightly; at least one wave guide 16 provided in the exterior of the chamber such that the one end side opposes the dielectric member; an electromagnetic wave source 20 provided on the other end side of the wave guide; a plurality of holes 38, 40, 42, 44, 46 provided on a surface opposing the dielectric member of the wave guide; and hole area adjusting means 18 provided in at least one of the above-mentioned holes so as to adjust the opening area of the hole.
摘要:
Disclosed is a plasma processing apparatus for performing a plasma processing, comprising an electromagnetic wave source for generating an electromagnetic wave, a rectangular waveguide, a plurality of slots formed in the rectangular waveguide and constituting a waveguide antenna, an electromagnetic wave radiation window consisting of a dielectric body, and a vacuum chamber, wherein a plasma is generated by an electromagnetic wave radiated from the slots into the vacuum chamber through the electromagnetic wave radiation window, the plasma processing apparatus being constructed to include an electromagnetic wave distributing waveguide portion for distributing the electromagnetic wave generated from the electromagnetic wave source into each of the waveguides, the plural waveguides being branched from the electric field plane or a plane perpendicular to the magnetic field plane of the electromagnetic wave distributing waveguide portion.
摘要:
A high-quality dielectric film is formed by generating plasma of a high electron density by a method such as diluting a rare gas or raising a frequency of a power supplier, and generating oxygen atoms or nitrogen atoms of a high density. The dielectric film contains silicon oxide in which the composition ratio of silicon and oxygen is between (1:1.94) and (1:2) both inclusive, silicon nitride in which the composition ratio of silicon and nitrogen is between (1:1.94) and (1:2) both inclusive, or silicon oxynitride in which the composition ratio of silicon and nitrogen is between (3:3.84) and (3:4) both inclusive.
摘要:
Disclosed is a film-forming method, comprising supplying into a plasma processing chamber at least three kinds of gases including a silicon compound gas, an oxidizing gas, and a rare gas, the percentage of the partial pressure of the rare gas (Pr) based on the total pressure being not smaller than 85%, i.e., 85%≦Pr
摘要:
Disclosed is a film-forming method, comprising supplying into a plasma processing chamber at least three kinds of gases including a silicon compound gas, an oxidizing gas, and a rare gas, the percentage of the partial pressure of the rare gas (Pr) based on the total pressure being not smaller than 85%, i.e., 85%≦Pr
摘要:
Disclosed is a film-forming method, comprising supplying into a plasma processing chamber at least three kinds of gases including a silicon compound gas, an oxidizing gas, and a rare gas, the percentage of the partial pressure of the rare gas (Pr) based on the total pressure being not smaller than 85%, i.e., 85%≦Pr
摘要:
There is provided a plasma treatment apparatus capable of treating a square shaped substrate having a large area even in the case of using reactive plasma, the plasma treatment apparatus including a waveguide 1, a waveguide antenna 2 made up of slots provided on the H-surface of the waveguide 1, an electromagnetic wave radiation window 4 made of a dielectric, a dielectric space 10 sandwiched between the waveguide 2 and the electromagnetic wave radiation window 4, and generating plasma by using the electromagnetic wave radiated from the waveguide antenna 2 through the electromagnetic wave radiation window 4, wherein an uneven portion 11 is provided on the surface of the waveguide 1 opposite to the electromagnetic wave radiation window 4.
摘要:
A film-forming ink includes: film-forming materials containing a π-conjugated compounds; and a liquid medium which is capable of dissolving or dispersing the film-forming material and containing a compound represented by the following formula (I), wherein the compound is one in which the substituent of at least one of R1 to R6 is a linear or branched alkyl group, and the molecular structure of the one substituent is larger than the molecular structure of another substituent, and thus, the molecular weight of the whole molecule is biased towards the side where the one substituent is present.
摘要:
A locking member has a first surface, a first mounting opening and a second mounting opening. Each first mounting opening and second mounting opening is dimensioned to receive the shank portion of a corresponding rotatable member therethrough so that a bottom surface of a head portion of the rotatable member faces toward the first surface of the locking member. A first extending member extends elastically relative to the first surface, wherein the first extending member is disposed in close proximity to the first mounting opening. When the rotatable member is in a mounting position in the first mounting opening, the first extending member contacts the head portion of the rotatable member to inhibit the rotatable member from rotating in a first direction, and the first extending member deflects elastically when the rotatable member rotates in a second direction opposite the first direction.