公开(公告)号：US06790681B2

公开(公告)日：2004-09-14

申请号：US10173079

申请日：2002-06-18

申请人： Masataka Matsunaga ,  Akira Miyata ,  Yuichi Douki

发明人： Masataka Matsunaga ,  Akira Miyata ,  Yuichi Douki

IPC分类号： H01L2100

CPC分类号： H01L21/67748 ,  H01L21/67098 ,  H01L21/6715 ,  H01L21/67276 ,  Y10S438/905

摘要： In this invention, a time period taken with a wafer W to be transferred to the heat processing apparatus in the post exposure baking unit through the out stage in the aligner, the wafer transfer mechanism, the transition unit, the wafer transfer mechanism, and the temperature regulation and transfer apparatus in the post exposure baking unit is controlled to be approximately constant.

摘要翻译： 在本发明中，通过对准器，晶片传送机构，转移单元，晶片传送机构以及晶片传送机构中的输出级将待传送到后曝光烘焙单元中的热处理设备的晶片W所花费的时间段 后曝光烘烤单元中的温度调节和传送装置被控制为近似恒定。

公开(公告)号：US20120063765A1

公开(公告)日：2012-03-15

申请号：US13225985

申请日：2011-09-06

申请人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： G03F7/3021 ,  G03F7/162 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745

摘要： A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.

摘要翻译： 一种处理块，包括一组液体处理相关单元块，布置在该组单位块的载体块侧的第一加热处理相关块，以及布置在该单元块的界面块侧的第二加热处理相关块 单位块组。 液体处理单元块组包括用于形成防反射膜和抗蚀剂膜的预处理的双重单元块，用于形成上层膜的后处理和进行曝光之前的清洁操作的双倍单位块，以及用于 发展。 第一加热工艺相关块加热涂覆有抗蚀剂液体和已经显影的基底的基底。 第二加热处理相关块加热已经暴露但尚未显影的基板，已经形成有抗反射膜的基板和已经形成有上层膜的基板。

公开(公告)号：US08506186B2

公开(公告)日：2013-08-13

申请号：US13225985

申请日：2011-09-06

申请人： Shinichi Hayashi ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi Hayashi ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： G03F7/3021 ,  G03F7/162 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745

摘要： A process block including a group of liquid-process related unit blocks, a first heating-process related block arranged on a carrier block side of the group of unit blocks, and a second heating-process related block arranged on an interface block side of the group of unit blocks. The group of liquid-process unit blocks includes doubled unit blocks for preprocessing for forming an antireflection film and a resist film, doubled unit blocks for post-processing for forming an upper layer film and performing a cleaning operation before exposure, and a unit block for developing. The first heating-process related block heats a substrate coated with a resist liquid and a substrate that has been developed. The second heating-process related block heats a substrate that has been exposed but is not yet developed, a substrate on which an antireflection film has been formed and a substrate on which an upper layer film has been formed.

摘要翻译： 一种处理块，包括一组液体处理相关单元块，布置在该组单位块的载体块侧的第一加热处理相关块，以及布置在该单元块的界面块侧的第二加热处理相关块 单位块组。 液体处理单元块组包括用于形成防反射膜和抗蚀剂膜的预处理的双重单元块，用于形成上层膜的后处理和进行曝光之前的清洁操作的双倍单位块，以及用于 发展。 第一加热工艺相关块加热涂覆有抗蚀剂液体和已经显影的基底的基底。 第二加热处理相关块加热已经暴露但尚未显影的基板，已经形成有抗反射膜的基板和已经形成有上层膜的基板。

公开(公告)号：US20120057862A1

公开(公告)日：2012-03-08

申请号：US13221072

申请日：2011-08-30

申请人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi HAYASHI ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67745

摘要： A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit bock for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.

摘要翻译： 通过在接口块的侧面上的载体块，一组液体处理相关单元块和加热块的侧面上布置加热处理相关块来形成处理块，从 载波块到接口块的一侧。 一组液相处理相关单元块由以下组成：一组用于涂覆膜的单元块，其通过向上堆叠用于抗反射膜的单元块，用于抗蚀剂膜的单元块和用于上部的单元块 层膜，按顺序; 以及用于显影的单元块相对于用于涂膜的单元块组在上下方向上彼此堆叠。 每个液体处理相关单元块的液体处理模块布置在用于基板的传送路径的右侧和左侧。

公开(公告)号：US08480319B2

公开(公告)日：2013-07-09

申请号：US13221072

申请日：2011-08-30

申请人： Shinichi Hayashi ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

发明人： Shinichi Hayashi ,  Yuichi Douki ,  Akira Miyata ,  Yuuichi Yamamoto ,  Kousuke Yoshihara ,  Nobuaki Matsuoka ,  Suguru Enokida

IPC分类号： G03D5/00

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/3021 ,  H01L21/67178 ,  H01L21/6719 ,  H01L21/67745

摘要： A process block is formed by arranging a heating-process related block on the side of a carrier block, a group of liquid-process related unit blocks, and a heating block on the side of an interface block, in this order from the side of the carrier block to the side of the interface block. The group of liquid-process related unit blocks is composed of: a group of unit blocks for coating films that is formed by stacking upward a unit block for an antireflection film, a unit block for a resist film, and a unit block for an upper layer film, in this order; and unit blocks for developing that are stacked on one another in the up and down direction with respect to the group of unit blocks for coating films. Liquid process modules of each of the liquid-process related unit blocks are arranged on the right and left sides of a transfer path for a substrate.

摘要翻译： 通过在接口块的侧面上的载体块，一组液体处理相关单元块和加热块的侧面上布置加热处理相关块来形成处理块，从侧面 载波块到接口块的一侧。 一组液相处理相关单元块由以下组成：一组用于涂覆膜的单元块，其通过向上堆叠用于抗反射膜的单元块，用于抗蚀剂膜的单元块和用于上部的单元块 层膜，按顺序; 以及用于显影的单元块相对于用于涂膜的单元块组在上下方向上彼此堆叠。 每个液体处理相关单元块的液体处理模块布置在用于基板的传送路径的右侧和左侧。

公开(公告)号：US09412198B2

公开(公告)日：2016-08-09

申请号：US13144702

申请日：2009-09-10

申请人： Akira Miyata ,  Nobuyuki Takahashi ,  Toshihiro Azuma

发明人： Akira Miyata ,  Nobuyuki Takahashi ,  Toshihiro Azuma

IPC分类号： G06F7/60 ,  G06F17/10 ,  G06T17/00 ,  B25J9/16 ,  G05B19/4061 ,  G06F17/50

摘要： A collision determination device includes a target cell designation unit that designates a target cell for a voxel model which represents the shape of a first object. A determination test point generation unit generates determination test points for the target cell. A spatial curve creation unit creates a spatial curve as the trajectory curve of a determination test point. A curve intersecting determination unit determines whether or not each boundary element of a boundary representation model representing the shape of a second object is intersecting the spatial curve. A distance computation unit computes the closest distance from the spatial curve to the boundary surface of the boundary representation model. A collision determination unit determines, based on the determination result and the computation result, whether there is a possibility of collision between both objects.

公开(公告)号：US20140114458A1

公开(公告)日：2014-04-24

申请号：US14123653

申请日：2012-06-20

申请人： Akira Miyata

发明人： Akira Miyata

IPC分类号： G06F17/50

CPC分类号： G06F17/5086 ,  G05B19/4069 ,  G05B2219/35349

摘要： A machining simulation device includes a local-region setting unit that sets a local region for a workpiece, an offset-deformation processing unit that offsets and deforms a shape of a part of a whole three-dimensional shape model of the workpiece, for which the local region is set, and generates a local three-dimensional shape model of the workpiece, a local tool-movement-data output unit that outputs local tool movement data from whole tool movement data based on a tool model and movement path data of a tool, a local cutting-deformation processing unit that cuts and deforms the local three-dimensional shape model of a workpiece based on the local tool movement data, and a display superimposing unit that superimposes the cut and deformed local three-dimensional shape model of the workpiece on the whole three-dimensional shape model of the workpiece, and displays the superimposed result.

摘要翻译： 一种加工模拟装置包括设定工件的局部区域的局部区域设定单元，使工件的整体三维形状模型的一部分的形状偏移和变形的偏移变形处理单元， 本地区域被设置，并且生成工件的局部三维形状模型，本地刀具运动数据输出单元，其基于工具模型和工具的移动路径数据从整个刀具运动数据输出局部刀具运动数据 根据局部刀具移动数据切割和变形工件的局部三维形状模型的局部切割变形处理单元，以及叠加工件的切割变形局部三维形状模型的显示重叠单元 在工件的整体三维形状模型上，并显示叠加结果。

公开(公告)号：US08610791B2

公开(公告)日：2013-12-17

申请号：US13306290

申请日：2011-11-29

申请人： Akira Miyata

发明人： Akira Miyata

IPC分类号： H04N5/228 ,  H04N5/76 ,  G03B17/18 ,  G03B17/00

CPC分类号： H04N5/232 ,  H04N5/23219 ,  H04N5/23222 ,  H04N5/772

摘要： An image pickup apparatus includes an image pickup section to pick up a subject image; and a central processing section to perform processing of arbitrarily setting at least one automatic photographing condition among a plurality of kinds of automatic photographing conditions, judging whether the set automatic photographing condition is satisfied or not, and instructing the image pickup section to pick up a recording subject image when the set automatic photographing condition is judged to be satisfied.

摘要翻译： 图像拾取装置包括用于拾取被摄体图像的图像拾取部分; 以及中央处理部，执行在多种自动拍摄条件中任意设定至少一个自动拍摄条件的处理，判断所设定的自动拍摄条件是否满足，并且指示图像拾取部拾取记录 当设定的自动拍摄条件被判定为满足时，拍摄对象图像。

公开(公告)号：US20120284686A1

公开(公告)日：2012-11-08

申请号：US13443604

申请日：2012-04-10

申请人： Rakesh SHARRMA ,  Sujoy Bhattacharjee ,  Akira Miyata

发明人： Rakesh SHARRMA ,  Sujoy Bhattacharjee ,  Akira Miyata

IPC分类号： G06F9/44

CPC分类号： G06F8/36 ,  G06F8/20 ,  G06F8/30 ,  G06F8/34 ,  G06F8/38 ,  G06F8/64 ,  G06F8/76 ,  G06F9/453 ,  G06F9/454

摘要： The present invention relates to the field of mobile applications and, more specifically, to a system and method for building a mobile application in a mobile application development environment in a simple and cost effective manner.

摘要翻译： 本发明涉及移动应用领域，更具体地，涉及一种以简单且成本有效的方式在移动应用开发环境中构建移动应用的系统和方法。

公开(公告)号：US08294779B2

公开(公告)日：2012-10-23

申请号：US12481667

申请日：2009-06-10

申请人： Akira Miyata

发明人： Akira Miyata

IPC分类号： H04N5/228 ,  H04N5/225 ,  H04N5/235 ,  H04N5/222

CPC分类号： H04N5/23293 ,  H04N1/2145 ,  H04N1/2158 ,  H04N5/2621 ,  H04N2101/00

摘要： An image sensing apparatus according to this invention includes an image sensing unit which sequentially generates still image data, a holding unit which holds a plurality of still image data, a display unit which displays the still image data, a setting unit which sets a predetermined state as the start timing of shooting by the image sensing unit, a determination unit which determines whether the predetermined state has been obtained, a shooting control unit which causes the image sensing unit to start shooting when the determination unit determines that the predetermined state has been obtained, a display control unit which causes the display unit to sequentially display, at a display speed lower than an actual time, the still image data, a selection unit which selects one of a plurality of image data displayed on the display unit, and a recording unit which records the selected image data.

摘要翻译： 根据本发明的图像感测装置包括依次产生静止图像数据的图像感测单元，保持多个静止图像数据的保持单元，显示静止图像数据的显示单元，设置预定状态的设置单元 作为图像感测单元的拍摄的开始时刻，确定单元，其确定是否获得了预定状态;当确定单元确定已经获得预定状态时，使得图像感测单元开始拍摄的拍摄控制单元 显示控制单元，其使显示单元以低于实际时间的显示速度顺序地显示静止图像数据;选择单元，其选择显示在显示单元上的多个图像数据中的一个，以及记录 记录所选择的图像数据的单元。