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1.发明申请公开(公告)号：US20100177425A1
公开(公告)日：2010-07-15
申请号：US12730912
申请日：2010-03-24
IPC分类号： G11B5/09
摘要： A magnetic recording medium has a RAM region and a ROM region. The RAM region includes a plurality of first tracks each having a first magnetic portion. The first magnetic portions in adjacent tracks are separated from each other. The ROM region includes a plurality of second tracks each having a second magnetic portion. A width of the second magnetic portions in a direction perpendicular to a track direction of the first tracks is larger than that of the first magnetic portions in the perpendicular direction.
摘要翻译： 磁记录介质具有RAM区域和ROM区域。 RAM区域包括多个具有第一磁性部分的第一轨道。 相邻轨道中的第一磁性部分彼此分离。 ROM区域包括多个具有第二磁性部分的第二磁道。 第二磁性部分在与第一磁道的轨道方向垂直的方向上的宽度大于垂直方向上的第一磁性部分的宽度。
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公开(公告)号：US20100314253A1
公开(公告)日：2010-12-16
申请号：US12814415
申请日：2010-06-11
IPC分类号： C25D1/10
CPC分类号： C25D1/10
摘要： According to one embodiment, a three dimensional structure of a stamper is subject to etch by supplying a pulsed electric currentelectric current to the surface of the stamper.
摘要翻译： 根据一个实施例，通过向压模的表面提供脉冲电流电流来对压模的三维结构进行蚀刻。
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公开(公告)号：US20100196528A1
公开(公告)日：2010-08-05
申请号：US12695936
申请日：2010-01-28
CPC分类号： G11B5/855
摘要： According to one embodiment, a stamper includes patterns corresponding to recording tracks or recording bits in a data region and patterns corresponding to information in a servo region formed in protrusions and recesses on a front side of the stamper, in which an inner periphery and an outer periphery are processed and, on a back side, an inner peripheral edge, an outer peripheral edge and a main surface of the back side lie on the same plane.
摘要翻译： 根据一个实施例，压模包括对应于数据区域中的记录轨道或记录位的图案，以及对应于形成在压模正面上的突起和凹陷中的伺服区域中的信息的图案，其中内周和外 周边被处理，并且在背面上，内侧边缘，外周边缘和后侧的主表面位于同一平面上。
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公开(公告)号：US20100155365A1
公开(公告)日：2010-06-24
申请号：US12641135
申请日：2009-12-17
CPC分类号： G11B5/855 , C23C14/04 , C23C14/185 , C23C14/34
摘要： According to one embodiment, when forming first, second, and third stampers by transferring three-dimensional patterns of a master, a height adjusting layer having a film thickness greater on the upper surface of a projection than on the bottom surface of a recess is formed between the second stamper and a second release layer, and the surface of the third stamper is etched with an acidic solution having a pH of less than 3.
摘要翻译： 根据一个实施例，当通过传送主机的三维图案来形成第一，第二和第三压模时，形成在突起的上表面上比在凹部的底表面上具有更大的膜厚度的高度调节层 在第二压模和第二剥离层之间，并且用pH小于3的酸性溶液蚀刻第三压模的表面。
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5.发明申请公开(公告)号：US20100047625A1
公开(公告)日：2010-02-25
申请号：US12544606
申请日：2009-08-20
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses, and partially etching the magnetic recording layer in areas not covered with patterns of the resist used as masks by ion beam etching using a mixed gas of He and N2 as well as modifying a remainder of the magnetic recording layer to leave behind a nonmagnetic layer having a reduced thickness.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成抗蚀剂，将压模压印到抗蚀剂上以转印突起和凹陷的图案，以及在不覆盖图案的区域中部分蚀刻磁记录层 通过使用He和N2的混合气体的离子束蚀刻用作掩模的抗蚀剂以及修改磁记录层的剩余部分留下厚度减小的非磁性层。
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公开(公告)号：US20100000966A1
公开(公告)日：2010-01-07
申请号：US12561168
申请日：2009-09-16
IPC分类号： B44C1/22
CPC分类号： G11B5/855 , H01F10/12 , H01F10/265 , H01F41/34
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes depositing a magnetic recording layer on a substrate, forming masks on areas corresponding to recording regions of the magnetic recording layer, partially etching the magnetic recording layer in areas not covered with the masks with an etching gas to form protrusions and recesses on the magnetic recording layer, modifying the magnetic recording layer remaining in the recesses with Ne gas to form non-recording regions, and forming a protecting film on an entire surface.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在基片上沉积磁记录层，在与磁记录层的记录区对应的区域上形成掩模，在未被掩模覆盖的区域中部分蚀刻磁记录层 用蚀刻气体在磁记录层上形成突起和凹陷，用Ne气体修饰残留在凹槽中的磁记录层，形成非记录区，并在整个表面上形成保护膜。
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公开(公告)号：US20120082800A1
公开(公告)日：2012-04-05
申请号：US13216555
申请日：2011-08-24
IPC分类号： C23C14/04
CPC分类号： C23C14/0605 , C23C14/0635 , C23C14/0658 , C23C14/5893 , G11B5/855
摘要： According to one embodiment, there is provided a method for manufacturing a magnetic recording medium, the method including: depositing a magnetic recording layer on a substrate; forming a mask on a region of the magnetic recording layer corresponding to a recording area; irradiating another region of the magnetic recording layer where the mask is not formed with an ion beam using a C-containing gas as a source gas to deactivate the another region and to thereby form a non-recording area; and forming a protective film over an entire surface of the substrate.
摘要翻译： 根据一个实施例，提供了一种用于制造磁记录介质的方法，所述方法包括：在基板上沉积磁记录层; 在对应于记录区域的磁记录层的区域上形成掩模; 使用含C气体作为源气体照射没有形成掩模的磁记录层的另一个区域，使离子束使其另一区域失活，从而形成非记录区域; 以及在所述基板的整个表面上形成保护膜。
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8.发明申请公开(公告)号：US20110132752A1
公开(公告)日：2011-06-09
申请号：US12961388
申请日：2010-12-06
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , C25D1/003 , C25D1/10 , G03F7/0002 , G11B5/746 , G11B5/865
摘要： According to one embodiment, an electroforming master comprises a patterns of protrusions and recesses formed on one major surface of an Si substrate having two major surfaces, corresponding to information for positioning of a read/write head (a preamble, address, and burst), recording tracks or recording bits. Impurity ions are doped in the surface of this patterns of protrusions and recesses. The impurity ion concentration distribution in the film thickness direction of the Si substrate has a peak in a portion from the patterns of protrusions and recesses surface to a depth of 40 nm in the film thickness direction. The impurity concentration of this peak is 1×1020 to 2×1021 ions/cm3.
摘要翻译： 根据一个实施例，电铸母版包括形成在具有两个主表面的Si衬底的一个主表面上的突起和凹槽的图案，其对应于用于定位读/写头（前导码，地址和突发）的信息， 记录轨道或记录位。 杂质离子掺杂在这种突起和凹陷图案的表面。 Si衬底的膜厚方向上的杂质离子浓度分布在从薄膜厚度方向的突起和凹陷表面的图案到深度为40nm的部分中具有峰值。 该峰的杂质浓度为1×1020〜2×1021离子/ cm3。
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公开(公告)号：US20100215989A1
公开(公告)日：2010-08-26
申请号：US12705456
申请日：2010-02-12
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，对暴露于凹部中的磁记录层进行修改处理以改变蚀刻速率，以及使在凹部中暴露的磁记录层失活。
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公开(公告)号：US20100214694A1
公开(公告)日：2010-08-26
申请号：US12705421
申请日：2010-02-12
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，去除残留在第一硬掩模的突起上的第二硬掩模，以及通过离子束照射去除在凹部中暴露的磁记录层。
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