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公开(公告)号：US20100186877A1
公开(公告)日：2010-07-29
申请号：US12691491
申请日：2010-01-21
IPC分类号： B32B37/02
CPC分类号： G11B5/855
摘要： According to one embodiment, a method of manufacturing a stamper includes forming a first stamper from a master plate having lands and grooves through electroforming, forming a second stamper, a width of which is GW, from the first stamper through electroforming, forming a lamination film with a thickness of LLT on the second stamper, forming, on the lamination film, a second releasing layer, a transfer layer with a thickness of TLT and a third electroforming layer with a thickness of ELT, peeling off the transfer layer and the third electroforming layer from the second stamper to form a third stamper, and isotropically etching the transfer layer on the third stamper in an etching thickness of ET to reduce a width of lands of the third stamper, in which the following relations are satisfied: 10 nm≦ELT and ET≦TLT.
摘要翻译： 根据一个实施例，制造压模的方法包括通过电铸从具有焊盘和槽的母板形成第一压模，通过电铸从第一压模形成其宽度为GW的第二压模，形成层压膜 在第二压模上具有LLT的厚度，在层压膜上形成第二释放层，厚度为TLT的转印层和具有ELT厚度的第三电铸层，剥离转印层和第三电铸 从而形成第三压模，并且以蚀刻厚度的ET对第三压模上的转印层进行各向同性蚀刻，以减小第三压模的焊盘的宽度，其中满足以下关系：10nm＆nlE; ELT 和ET＆nlE; TLT。
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公开(公告)号：US20100314253A1
公开(公告)日：2010-12-16
申请号：US12814415
申请日：2010-06-11
IPC分类号： C25D1/10
CPC分类号： C25D1/10
摘要： According to one embodiment, a three dimensional structure of a stamper is subject to etch by supplying a pulsed electric currentelectric current to the surface of the stamper.
摘要翻译： 根据一个实施例，通过向压模的表面提供脉冲电流电流来对压模的三维结构进行蚀刻。
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公开(公告)号：US20100155365A1
公开(公告)日：2010-06-24
申请号：US12641135
申请日：2009-12-17
CPC分类号： G11B5/855 , C23C14/04 , C23C14/185 , C23C14/34
摘要： According to one embodiment, when forming first, second, and third stampers by transferring three-dimensional patterns of a master, a height adjusting layer having a film thickness greater on the upper surface of a projection than on the bottom surface of a recess is formed between the second stamper and a second release layer, and the surface of the third stamper is etched with an acidic solution having a pH of less than 3.
摘要翻译： 根据一个实施例，当通过传送主机的三维图案来形成第一，第二和第三压模时，形成在突起的上表面上比在凹部的底表面上具有更大的膜厚度的高度调节层 在第二压模和第二剥离层之间，并且用pH小于3的酸性溶液蚀刻第三压模的表面。
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公开(公告)号：US20100213069A1
公开(公告)日：2010-08-26
申请号：US12712045
申请日：2010-02-24
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/855 , Y10T428/24612
摘要： According to one embodiment, a master plate for producing a stamper includes a substrate, and patterns of protrusions and recesses formed on the substrate and corresponding to patterns of recording tracks or recording bits in data areas and to information in servo areas, in which the protrusion has a structure in which a first metal layer, a silicon layer and a second metal layer are stacked on the substrate and a metal oxide film is formed on a surface of the protrusion.
摘要翻译： 根据一个实施例，用于制造压模的主板包括基板，并且形成在基板上并对应于数据区域中的记录轨迹或记录位的图案以及伺服区域中的信息的突起和凹陷的图案，其中突起 具有在基板上层叠第一金属层，硅层和第二金属层的结构，在突起的表面上形成金属氧化物膜。
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公开(公告)号：US20100196528A1
公开(公告)日：2010-08-05
申请号：US12695936
申请日：2010-01-28
CPC分类号： G11B5/855
摘要： According to one embodiment, a stamper includes patterns corresponding to recording tracks or recording bits in a data region and patterns corresponding to information in a servo region formed in protrusions and recesses on a front side of the stamper, in which an inner periphery and an outer periphery are processed and, on a back side, an inner peripheral edge, an outer peripheral edge and a main surface of the back side lie on the same plane.
摘要翻译： 根据一个实施例，压模包括对应于数据区域中的记录轨道或记录位的图案，以及对应于形成在压模正面上的突起和凹陷中的伺服区域中的信息的图案，其中内周和外 周边被处理，并且在背面上，内侧边缘，外周边缘和后侧的主表面位于同一平面上。
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6.发明申请公开(公告)号：US20110132752A1
公开(公告)日：2011-06-09
申请号：US12961388
申请日：2010-12-06
CPC分类号： G11B5/855 , B82Y10/00 , B82Y40/00 , C25D1/003 , C25D1/10 , G03F7/0002 , G11B5/746 , G11B5/865
摘要： According to one embodiment, an electroforming master comprises a patterns of protrusions and recesses formed on one major surface of an Si substrate having two major surfaces, corresponding to information for positioning of a read/write head (a preamble, address, and burst), recording tracks or recording bits. Impurity ions are doped in the surface of this patterns of protrusions and recesses. The impurity ion concentration distribution in the film thickness direction of the Si substrate has a peak in a portion from the patterns of protrusions and recesses surface to a depth of 40 nm in the film thickness direction. The impurity concentration of this peak is 1×1020 to 2×1021 ions/cm3.
摘要翻译： 根据一个实施例，电铸母版包括形成在具有两个主表面的Si衬底的一个主表面上的突起和凹槽的图案，其对应于用于定位读/写头（前导码，地址和突发）的信息， 记录轨道或记录位。 杂质离子掺杂在这种突起和凹陷图案的表面。 Si衬底的膜厚方向上的杂质离子浓度分布在从薄膜厚度方向的突起和凹陷表面的图案到深度为40nm的部分中具有峰值。 该峰的杂质浓度为1×1020〜2×1021离子/ cm3。
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公开(公告)号：US20100215989A1
公开(公告)日：2010-08-26
申请号：US12705456
申请日：2010-02-12
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, subjecting the magnetic recording layer exposed in the recesses to modifying treatment to change an etching rate, and deactivating the magnetic recording layer exposed in the recesses.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，对暴露于凹部中的磁记录层进行修改处理以改变蚀刻速率，以及使在凹部中暴露的磁记录层失活。
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公开(公告)号：US20100214694A1
公开(公告)日：2010-08-26
申请号：US12705421
申请日：2010-02-12
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist on a magnetic recording layer, imprinting a stamper to the resist to transfer patterns of protrusions and recesses to the resist, removing residues remaining in the recesses of the patterned resist, etching the second hard mask by using the patterned resist as a mask to transfer the patterns of protrusions and recesses to the second hard mask, etching the first hard mask by using the second hard mask as a mask to transfer the patterns of protrusions and recesses to the first hard mask, removing the second hard mask remaining on the protrusions of the first hard mask, and deactivating the magnetic recording layer exposed in the recesses by means of ion beam irradiation.
摘要翻译： 根据一个实施例，一种制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂，将压模压印到抗蚀剂上，以将凹凸图案转印到抗蚀剂上， 去除残留在图案化抗蚀剂的凹部中的残留物，通过使用图案化抗蚀剂作为掩模蚀刻第二硬掩模以将突起和凹陷的图案转移到第二硬掩模，通过使用第二硬掩模蚀刻第一硬掩模 用于将突起和凹陷的图案转移到第一硬掩模的掩模，去除残留在第一硬掩模的突起上的第二硬掩模，以及通过离子束照射去除在凹部中暴露的磁记录层。
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公开(公告)号：US20100147791A1
公开(公告)日：2010-06-17
申请号：US12636610
申请日：2009-12-11
IPC分类号： B44C1/22
摘要： According to one embodiment, a method of manufacturing a magnetic recording medium includes forming a first hard mask, a second hard mask and a resist film on a magnetic recording layer, imprinting a stamper on the resist film to transfer patterns of recesses and protrusions, removing residues remained in recess of the patterned resist film, etching the second hard mask using the patterned resist film as a mask to transfer patterns of recesses and protrusions, etching the first hard mask using the patterned second hard mask as a mask to transfer patterns of recesses and protrusions, and deactivating magnetism of the magnetic recording layer exposed in the recesses together with removing the second hard mask by ion-beam etching.
摘要翻译： 根据一个实施例，制造磁记录介质的方法包括在磁记录层上形成第一硬掩模，第二硬掩模和抗蚀剂膜，在抗蚀剂膜上压印印模以转印凹凸图案，去除 残留物保留在图案化抗蚀剂膜的凹部中，使用图案化的抗蚀剂膜作为掩模蚀刻第二硬掩模以转移凹凸和突起的图案，使用图案化的第二硬掩模作为掩模蚀刻第一硬掩模以转移凹槽的图案 和突起，并且通过离子束蚀刻去除第二硬掩模，使暴露于凹部中的磁记录层的磁性失活。
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公开(公告)号：US20130075361A1
公开(公告)日：2013-03-28
申请号：US13528348
申请日：2012-06-20
申请人： Yoshiaki KAWAMONZEN , Yasuaki OOTERA , Akiko YUZAWA , Naoko KIHARA , Yoshiyuki KAMATA , Hiroyuki HIEDA , Norikatsu SASAO , Ryosuke YAMAMOTO , Takeshi OKINO , Tomoyuki MAEDA , Takuya SHIMADA
发明人： Yoshiaki KAWAMONZEN , Yasuaki OOTERA , Akiko YUZAWA , Naoko KIHARA , Yoshiyuki KAMATA , Hiroyuki HIEDA , Norikatsu SASAO , Ryosuke YAMAMOTO , Takeshi OKINO , Tomoyuki MAEDA , Takuya SHIMADA
IPC分类号： B44C1/22
CPC分类号： B44C1/227 , B41M5/00 , B81C1/0046 , B81C2201/0153 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/0337 , Y10T156/1041
摘要： A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.
摘要翻译： 根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。
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