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公开(公告)号：US20170196046A1
公开(公告)日：2017-07-06
申请号：US15380139
申请日：2016-12-15
Applicant: Mattson Technology, Inc.
Inventor： Rolf Bremensdorfer , Dave Camm , Pete Lembesis , Joseph Cibere
CPC classification number: H05B3/0047 , H01J61/0732 , H01J61/526 , H01L21/67109 , H01L21/67115 , H01L21/6719 , H01L21/67248 , H05B31/0057
Abstract: Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.
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公开(公告)号：US11721539B2
公开(公告)日：2023-08-08
申请号：US17533593
申请日：2021-11-23
Inventor： Michael X. Yang , Rolf Bremensdorfer , Dave Camm , Joseph Cibere , Dieter Hezler , Shawming Ma , Yun Yang
IPC: H01J61/073 , H01J61/86 , H05H1/48 , H01J61/52 , H01J61/28
CPC classification number: H01J61/86 , H01J61/0732 , H01J61/28 , H01J61/526 , H05H1/48
Abstract: Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.
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公开(公告)号：US12120780B2
公开(公告)日：2024-10-15
申请号：US17215369
申请日：2021-03-29
Inventor： Rolf Bremensdorfer , Dave Camm , Pete Lembesis , Joseph Cibere
IPC: H05B3/00 , H01J61/073 , H01J61/52 , H01L21/67 , H05B31/00
CPC classification number: H05B3/0047 , H01J61/0732 , H01J61/526 , H01L21/67109 , H01L21/67115 , H01L21/6719 , H01L21/67248 , H05B31/0057
Abstract: Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.
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Patent Agency Ranking
公开(公告)号：US20210307115A1
公开(公告)日：2021-09-30
申请号：US17215369
申请日：2021-03-29
Inventor： Rolf Bremensdorfer , Dave Camm , Pete Lembesis , Joseph Cibere
IPC: H05B3/00 , H01L21/67 , H01J61/52 , H01J61/073
Abstract: Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.
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公开(公告)号：US12119216B2
公开(公告)日：2024-10-15
申请号：US18336552
申请日：2023-06-16
Inventor： Michael X. Yang , Rolf Bremensdorfer , Dave Camm , Joseph Cibere , Dieter Hezler , Shawming Ma , Yun Yang
IPC: H01J61/073 , H01J61/28 , H01J61/52 , H01J61/86 , H05H1/48
CPC classification number: H01J61/86 , H01J61/0732 , H01J61/28 , H01J61/526 , H05H1/48
Abstract: Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.
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公开(公告)号：US20230352294A1
公开(公告)日：2023-11-02
申请号：US18336552
申请日：2023-06-16
Inventor： Michael X. Yang , Rolf Bremensdorfer , Dave Camm , Joseph Cibere , Dieter Hezler , Shawming Ma , Yun Yang
IPC: H01J61/86 , H01J61/073 , H05H1/48 , H01J61/52 , H01J61/28
CPC classification number: H01J61/86 , H01J61/0732 , H05H1/48 , H01J61/526 , H01J61/28
Abstract: Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.
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公开(公告)号：US20220165561A1
公开(公告)日：2022-05-26
申请号：US17533593
申请日：2021-11-23
Inventor： Michael X. Yang , Rolf Bremensdorfer , Dave Camm , Joseph Cibere , Dieter Hezler , Shawming Ma , Yun Yang
IPC: H01J61/86 , H01J61/28 , H05H1/48 , H01J61/073 , H01J61/52
Abstract: Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.
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公开(公告)号：US10966286B2
公开(公告)日：2021-03-30
申请号：US15380139
申请日：2016-12-15
Inventor： Rolf Bremensdorfer , Dave Camm , Pete Lembesis , Joseph Cibere
IPC: H05B3/00 , H01L21/67 , H01J61/52 , H01J61/073 , H05B31/00
Abstract: Systems and methods for reducing contamination of one or more arc lamps are provided. One example implementation is directed to a millisecond anneal system. The millisecond anneal system includes a processing chamber for thermally treating a substrate using a millisecond anneal process. The system further includes one or more arc lamps. Each of the one or more arc lamps is coupled to a water loop for circulating water through the arc lamp during operation of the arc lamp. The system includes a reagent injection source configured to introduce a reagent, such as nitrogen gas, into water circulating through the arc lamp during operation of the arc lamp.
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