利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

150 条记录 (耗时 0.033 秒)

    Inspection apparatus and method for measuring a property of a substrate
    1.
    发明授权
    Inspection apparatus and method for measuring a property of a substrate 有权
    用于测量基板的性质的检查装置和方法

    公开(公告)号：US09235141B2

    公开(公告)日：2016-01-12

    申请号：US13186895

    申请日：2011-07-20

    申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    IPC分类号： G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00 ,  G01N21/47

    CPC分类号： G03F7/70633 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G03F7/70616 ,  G03F9/70

    摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.

    摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

    Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell
    2.
    发明申请
    Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell 有权
    检验设备和方法，平版印刷设备和平版印刷加工单元

    公开(公告)号：US20120033193A1

    公开(公告)日：2012-02-09

    申请号：US13186895

    申请日：2011-07-20

    申请人： Maurits VAN DER SCHAAR ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    发明人： Maurits VAN DER SCHAAR ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

    IPC分类号： G03B27/54 ,  G01J3/36

    CPC分类号： G03F7/70633 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G03F7/70616 ,  G03F9/70

    摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.

    摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

    Method and Apparatus for Determining an Overlay Error
    3.
    发明申请
    Method and Apparatus for Determining an Overlay Error 有权
    确定叠加误差的方法和装置

    公开(公告)号：US20120013881A1

    公开(公告)日：2012-01-19

    申请号：US13181932

    申请日：2011-07-13

    申请人： Arie Jeffrey Den Boef ,  Maurits VAN DER SCHAAR ,  Andreas Fuchs ,  Martyn John Coogans ,  Kaustuve Bhattacharyya ,  Stephen Peter Morgan ,  Michael Kubis

    发明人： Arie Jeffrey Den Boef ,  Maurits VAN DER SCHAAR ,  Andreas Fuchs ,  Martyn John Coogans ,  Kaustuve Bhattacharyya ,  Stephen Peter Morgan ,  Michael Kubis

    IPC分类号： G03B27/54 ,  G06F19/00 ,  G01N21/47

    CPC分类号： A01H1/06 ,  A01G22/00 ,  C12N15/8201 ,  G03B27/52 ,  G03B27/53 ,  G03F7/705 ,  G03F7/70633

    摘要： A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n′), p(n″) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.

    摘要翻译： 确定重叠错误的方法。 测量具有过程引起的不对称性的覆盖目标。 构建目标模型。 修改模型，例如通过移动结构之一来补偿不对称性。 使用修改的模型计算不对称引起的覆盖误差。 通过从测量的重叠错误中减去不对称引起的覆盖误差来确定生产目标中的重叠错误。 在一个示例中，通过改变不对称p（n'），p（n“）来修改模型，并且针对多个散射仪测量配方重复计算不对称引起的重叠误差，并且确定在 生产目标使用计算的不对称引起的重叠误差来选择用于测量生产目标的最佳散射仪测量配方。

    Method and apparatus for angular-resolved spectroscopic lithography characterization
    5.
    发明授权
    Method and apparatus for angular-resolved spectroscopic lithography characterization 有权
    用于角分辨光谱光刻特征的方法和装置

    公开(公告)号：US07564555B2

    公开(公告)日：2009-07-21

    申请号：US11504106

    申请日：2006-08-15

    申请人： Arie Jeffrey Den Boef ,  Mircea Dusa ,  Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Stefan Carolus Jacobus Antonius Keij

    发明人： Arie Jeffrey Den Boef ,  Mircea Dusa ,  Everhardus Cornelis Mos ,  Maurits Van Der Schaar ,  Stefan Carolus Jacobus Antonius Keij

    IPC分类号： G01B11/00

    CPC分类号： G03F7/70633

    摘要： An inspection system is arranged to measure an overlay error by projecting a plurality of radiation beams, differing in wavelength and/or polarization, onto two targets. A first radiation beam is projected onto a first target and the reflected radiation A1+ is detected. The first target comprises two gratings having a bias +d with respect to each other. The first radiation beam is also projected on to a second target, which comprises two gratings having a bias −d with respect to each other, and the reflected radiation A1− is detected. A second radiation beam, having a different wavelength and/or polarization from the first radiation beam, is projected onto the first target and reflected radiation A2+ is detected and projected onto the second target and reflected radiation A2− is detected. Detected radiations A1+, A1−, A2+, and A2− is used to determine the overlay error.

    摘要翻译： 检查系统被布置成通过将不同波长和/或极化的多个辐射束投影到两个目标上来测量覆盖误差。 将第一辐射束投射到第一靶上并检测反射辐射A1 +。 第一个目标包括两个相对于彼此具有偏压+ d的光栅。 第一辐射束也被投射到第二靶上，第二靶被包括相对于彼此具有偏压-d的两个光栅，并且检测到反射辐射A1-。 具有与第一辐射束不同的波长和/或极化的第二辐射束被投影到第一目标上，并且检测反射辐射A2 +并将其投影到第二目标上，并检测反射辐射A2-。 检测到的辐射A1 +，A1-，A2 +和A2-用于确定覆盖误差。

    Method of measurement, an inspection apparatus and a lithographic apparatus
    8.
    发明授权
    Method of measurement, an inspection apparatus and a lithographic apparatus 有权
    测量方法，检查装置和光刻设备

    公开(公告)号：US08111398B2

    公开(公告)日：2012-02-07

    申请号：US12770153

    申请日：2010-04-29

    申请人： Maurits Van der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos

    发明人： Maurits Van der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos

    IPC分类号： G01B11/00 ,  G03C5/00

    CPC分类号： G03F7/70633 ,  H01L22/12

    摘要： According to an example, a first layer of a substrate comprises a plurality of gratings having a periodicity P. A second layer of the substrate comprises a plurality of gratings, overlapping with the first set of gratings, and having a periodicity of NP, where N is an integer greater than 2. A first set of gratings has a bias of +d and the second set of gratings has a bias of −d. A beam of radiation is projected onto the gratings and the angle resolved spectrum of the reflected radiation detected. The overlay error is then calculated using the angle resolved spectrum of the reflected radiation.

    摘要翻译： 根据示例，衬底的第一层包括具有周期P的多个光栅。衬底的第二层包括与第一组光栅重叠并且具有NP的周期性的多个光栅，其中N 是大于2的整数。第一组光栅具有+ d的偏置，第二组光栅具有-d的偏置。 将辐射束投射到光栅上，并检测到反射辐射的角度分辨光谱。 然后使用反射辐射的角度分辨光谱计算覆盖误差。