公开(公告)号：US08908147B2

公开(公告)日：2014-12-09

申请号：US13181932

申请日：2011-07-13

申请人： Arie Jeffrey Den Boef ,  Maurits Van Der Schaar ,  Andreas Fuchs ,  Martyn John Coogans ,  Kaustuve Bhattacharyya ,  Stephen Peter Morgan ,  Michael Kubis

发明人： Arie Jeffrey Den Boef ,  Maurits Van Der Schaar ,  Andreas Fuchs ,  Martyn John Coogans ,  Kaustuve Bhattacharyya ,  Stephen Peter Morgan ,  Michael Kubis

IPC分类号： G03F7/20 ,  A01H1/06 ,  G03B27/52 ,  G03B27/53 ,  A01G1/00 ,  C12N15/82

CPC分类号： A01H1/06 ,  A01G22/00 ,  C12N15/8201 ,  G03B27/52 ,  G03B27/53 ,  G03F7/705 ,  G03F7/70633

摘要： A method of determining an overlay error. Measuring an overlay target having process-induced asymmetry. Constructing a model of the target. Modifying the model, e.g., by moving one of the structures to compensate for the asymmetry. Calculating an asymmetry-induced overlay error using the modified model. Determining an overlay error in a production target by subtracting the asymmetry-induced overlay error from a measured overlay error. In one example, the model is modified by varying asymmetry p(n′), p(n″) and the calculating an asymmetry-induced overlay error is repeated for a plurality of scatterometer measurement recipes and the step of determining an overlay error in a production target uses the calculated asymmetry-induced overlay errors to select an optimum scatterometer measurement recipe used to measure the production target.

摘要翻译： 确定重叠错误的方法。 测量具有过程引起的不对称性的覆盖目标。 构建目标模型。 修改模型，例如通过移动结构之一来补偿不对称性。 使用修改的模型计算不对称引起的覆盖误差。 通过从测量的重叠错误中减去不对称引起的覆盖误差来确定生产目标中的重叠错误。 在一个示例中，通过改变不对称p（n'），p（n“）来修改模型，并且针对多个散射仪测量配方重复计算不对称引起的重叠误差，并且确定在 生产目标使用计算的不对称引起的重叠误差来选择用于测量生产目标的最佳散射仪测量配方。

公开(公告)号：US09235141B2

公开(公告)日：2016-01-12

申请号：US13186895

申请日：2011-07-20

申请人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

发明人： Maurits Van Der Schaar ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos ,  Andreas Fuchs ,  Martyn John Coogans ,  Hendrik Jan Hidde Smilde

IPC分类号： G03F7/20 ,  G01N21/95 ,  G01N21/956 ,  G03F9/00 ,  G01N21/47

CPC分类号： G03F7/70633 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95607 ,  G03F7/70616 ,  G03F9/70

摘要： An inspection apparatus measures a property of a substrate including a periodic structure. An illumination system provides a beam of radiation with an illumination profile including a plurality of illuminated portions. A radiation projector projects the beam of radiation onto the substrate. A detector detects radiation scattered from the periodic structure and separately detects first order diffracted radiation and at least one higher order of diffracted radiation of each of the illuminated portions. A processor determines the property of the substrate from the detected radiation. The plurality of illuminated portions are arranged such that first order diffracted radiation arising from one or more of the illuminated portions are not overlapped by zeroth order or first order diffracted radiation arising from any other of the illuminated portions. Furthermore, the plurality of illuminated portions are arranged such that first order diffracted radiation arising from the one or more of the illuminated portions are overlapped by at least one of the higher orders of diffracted radiation arising from any other of the illuminated portions.

摘要翻译： 检查装置测量包括周期性结构的基板的性质。 照明系统提供具有包括多个照明部分的照明轮廓的辐射束。 辐射投影仪将辐射束投影到基板上。 检测器检测从周期性结构散射的辐射，并分别检测每个照明部分的一级衍射辐射和衍射辐射的至少一个高阶。 处理器根据检测到的辐射来确定衬底的性质。 多个照明部分被布置成使得从一个或多个被照射部分产生的一级衍射辐射不会被任何其他照明部分产生的零级或一级衍射辐射重叠。 此外，多个照明部分被布置成使得由一个或多个被照射部分产生的一阶衍射辐射与从任何其他照明部分产生的衍射辐射的较高阶数中的至少一个重叠。

公开(公告)号：US09494872B2

公开(公告)日：2016-11-15

申请号：US13060390

申请日：2009-09-08

申请人： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar

发明人： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar

IPC分类号： G03F7/20

CPC分类号： G03F7/70633 ,  G03F7/70625

摘要： The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order to measure the radiation reflected from the target and obtain information related to properties of the substrate. In the present embodiments, the measurement spot, which is the focused beam on the substrate, is larger than the target. Information regarding the radiation reflected from the target is kept and information regarding the radiation reflected from the surface around the target is eliminated. This is done either by having no reflecting (or no specularly reflecting) surfaces around the target or by having known structures around the target, the information from which may be recognized and removed from the total reflected beam. The reflected beam is measured in the pupil plane of the projector such that the information obtained is related to diffraction orders of the reflected beam and profile, critical dimension or overlay of structures on the substrate may be determined.

摘要翻译： 本发明涉及一种检查装置和方法，其包括将测量辐射束投射到基板上的目标上，以便测量从目标反射的辐射，并获得与基板的特性有关的信息。 在本实施例中，作为基板上的聚焦光束的测量点大于目标。 关于从目标反射的辐射的信息被保留，并且关于从目标周围的表面反射的辐射的信息被消除。 这可以通过在靶周围没有反射（或没有镜面反射）表面或通过在靶周围具有已知结构来完成，可以从总反射光束识别和去除信息。 在投影仪的瞳平面中测量反射光束，使得所获得的信息与反射光束的衍射级和轮廓，基底上的结构的临界尺寸或重叠相关。

公开(公告)号：US20110229830A1

公开(公告)日：2011-09-22

申请号：US13060390

申请日：2009-09-08

申请人： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar

发明人： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar

IPC分类号： G03F7/20 ,  G01N21/55 ,  G01B11/14 ,  G03B27/54

CPC分类号： G03F7/70633 ,  G03F7/70625

摘要： The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order to measure the radiation reflected from the target and obtain information related to properties of the substrate. In the present embodiments, the measurement spot, which is the focused beam on the substrate, is larger than the target. Information regarding the radiation reflected from the target is kept and information regarding the radiation reflected from the surface around the target is eliminated. This is done either by having no reflecting (or no specularly reflecting) surfaces around the target or by having known structures around the target, the information from which may be recognized and removed from the total reflected beam. The reflected beam is measured in the pupil plane of the projector such that the information obtained is related to diffraction orders of the reflected beam and profile, critical dimension or overlay of structures on the substrate may be determined.

摘要翻译： 本发明涉及一种检查装置和方法，其包括将测量辐射束投射到基板上的目标上，以便测量从目标反射的辐射，并获得与基板的特性有关的信息。 在本实施例中，作为基板上的聚焦光束的测量点大于目标。 关于从目标反射的辐射的信息被保留，并且关于从目标周围的表面反射的辐射的信息被消除。 这可以通过在靶周围没有反射（或没有镜面反射）表面或通过在靶周围具有已知结构来完成，可以从总反射光束识别和去除信息。 在投影仪的瞳平面中测量反射光束，使得所获得的信息与反射光束的衍射级和轮廓，基底上的结构的临界尺寸或重叠相关。

公开(公告)号：US08786825B2

公开(公告)日：2014-07-22

申请号：US12936327

申请日：2009-04-20

申请人： Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar ,  Andreas Fuchs ,  Martyn John Coogans

发明人： Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar ,  Andreas Fuchs ,  Martyn John Coogans

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/7065 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7088

摘要： The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.

摘要翻译： 本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。 特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。

公开(公告)号：US20110102753A1

公开(公告)日：2011-05-05

申请号：US12936327

申请日：2009-04-20

申请人： Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar ,  Andreas Fuchs ,  Martyn John Coogans

发明人： Marcus Adrianus Van De Kerkhof ,  Maurits Van Der Schaar ,  Andreas Fuchs ,  Martyn John Coogans

IPC分类号： G03B27/54 ,  G01J3/28 ,  G01N21/47 ,  G03F7/20 ,  G03B27/52

CPC分类号： G03F7/7065 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/956 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7088

摘要： The present invention makes the use of measurement of a diffraction spectrum in or near an image plane in order to determine a property of an exposed substrate. In particular, the positive and negative first diffraction orders are separated or diverged, detected and their intensity measured to determine overlay (or other properties) of exposed layers on the substrate.

摘要翻译： 本发明使用在图像平面内或附近测量衍射光谱，以便确定曝光的基底的性质。 特别地，正和负的第一衍射级被分离或发散，被检测并且测量它们的强度以确定衬底上的暴露层的覆盖层（或其它性质）。

公开(公告)号：US08709687B2

公开(公告)日：2014-04-29

申请号：US13401882

申请日：2012-02-22

申请人： Maurits Van Der Schaar ,  Patrick Warnaar ,  Kaustuve Bhattacharyya ,  Hendrik Jan Hidde Smilde ,  Michael Kubis

发明人： Maurits Van Der Schaar ,  Patrick Warnaar ,  Kaustuve Bhattacharyya ,  Hendrik Jan Hidde Smilde ,  Michael Kubis

IPC分类号： G03F9/00

CPC分类号： G03F9/7042 ,  G03F7/70616 ,  G03F7/70633 ,  G03F7/70683 ,  H01L23/544 ,  H01L23/58 ,  H01L2924/0002 ,  H01L2924/00

摘要： A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.

摘要翻译： 来自图案形成装置的图案通过光刻装置施加到基板。 应用模式包括产品功能和计量目标。 测量目标包括大目标和小目标，用于测量覆盖。 一些较小的目标分布在较大目标之间的位置，而其他小目标则放置在与大目标相同的位置。 通过比较在相同位置使用小目标和大目标测量的值，可以校正使用所有小目标测量的参数值以获得更高的精度。 大型目标主要位于划线范围内，而小目标则分布在产品区域内。

公开(公告)号：US20130059240A1

公开(公告)日：2013-03-07

申请号：US13401882

申请日：2012-02-22

申请人： Maurits Van Der Schaar ,  Patrick Warnaar ,  Kaustuve Bhattacharyya ,  Hendrik Jan Hidde Smilde ,  Michael Kubis

发明人： Maurits Van Der Schaar ,  Patrick Warnaar ,  Kaustuve Bhattacharyya ,  Hendrik Jan Hidde Smilde ,  Michael Kubis

IPC分类号： G01B11/14 ,  G03F7/20 ,  G03B27/00

CPC分类号： G03F9/7042 ,  G03F7/70616 ,  G03F7/70633 ,  G03F7/70683 ,  H01L23/544 ,  H01L23/58 ,  H01L2924/0002 ,  H01L2924/00

摘要： A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.

摘要翻译： 来自图案形成装置的图案通过光刻装置施加到基板。 应用模式包括产品功能和计量目标。 测量目标包括大目标和小目标，用于测量覆盖。 一些较小的目标分布在较大目标之间的位置，而其他小目标则放置在与大目标相同的位置。 通过比较在相同位置使用小目标和大目标测量的值，可以校正使用所有小目标测量的参数值以获得更高的精度。 大型目标主要位于划线范围内，而小目标则分布在产品区域内。

公开(公告)号：US07911612B2

公开(公告)日：2011-03-22

申请号：US11808922

申请日：2007-06-13

申请人： Antoine Gaston Marie Kiers ,  Arie Jeffrey Den Boef ,  Maurits Van Der Schaar

发明人： Antoine Gaston Marie Kiers ,  Arie Jeffrey Den Boef ,  Maurits Van Der Schaar

IPC分类号： G01B11/00 ,  G03F9/00 ,  G03C5/00 ,  H01L21/76

CPC分类号： G01N21/4788 ,  G01N21/95607 ,  G01N2021/95615 ,  G03F7/70633 ,  Y10T428/24331 ,  Y10T428/24942

摘要： An overlay target on a substrate is disclosed, the overlay target including a periodic array of structures wherein every nth structure is different from the rest of the structures. The periodic array is desirably made of two interlaced gratings, one of the gratings having a different pitch from the other grating in order to create an asymmetry in the array. This asymmetry can then be measured by measuring the diffraction spectra of radiation reflected from the overlay target. Variation in the asymmetry indicates the presence of an overlay error in layers on the substrate, where overlay targets are printed on subsequent layers.

摘要翻译： 公开了一种在衬底上的覆盖目标，覆盖目标包括周期性结构阵列，其中每第n个结构与其余结构不同。 期望地由两个隔行光栅制成周期阵列，其中一个光栅与另一个光栅具有不同的间距，以便在阵列中产生不对称性。 然后可以通过测量从覆盖目标反射的辐射的衍射光谱来测量该不对称性。 不对称性的变化表示衬底上存在覆盖层错误，其中覆盖目标印刷在后续层上。

公开(公告)号：US07791727B2

公开(公告)日：2010-09-07

申请号：US10918742

申请日：2004-08-16

申请人： Arie Jeffrey Den Boef ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Maurits Van Der Schaar

发明人： Arie Jeffrey Den Boef ,  Mircea Dusa ,  Antoine Gaston Marie Kiers ,  Maurits Van Der Schaar

IPC分类号： G01B9/02 ,  G01B11/00

CPC分类号： G01N21/8806 ,  G03F7/70341 ,  G03F7/70633 ,  G03F7/7065 ,  G03F9/7034

摘要： An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.

摘要翻译： 通过在高数值孔径透镜的光瞳平面中测量作为辐射的结果的角度分辨光谱从衬底反射来确定衬底的性质的装置和方法。 该属性可以是角度和波长相关的，并且可以包括TM-和TE-偏振光的强度及其相对相位差。