公开(公告)号：US07130039B2

公开(公告)日：2006-10-31

申请号：US10418352

申请日：2003-04-17

申请人： Mehdi Vaez-Iravani ,  Lawrence Robert Miller

发明人： Mehdi Vaez-Iravani ,  Lawrence Robert Miller

IPC分类号： G01N21/68

CPC分类号： G01N21/95623 ,  G01N21/8806

摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface. In another embodiment, different portions of the same objective may be used for focusing the illumination beams onto the surface and for collecting the scattered radiation from the illuminated spots simultaneously. In another embodiment, a one-dimensional array of illumination beams are directed at an oblique angle to the surface to illuminate a line of illuminated spots at an angle to the plane of incidence. Radiation scattered from the spots are collected along directions perpendicular to the line of spots or in a double dark field configuration.

公开(公告)号：US08817248B2

公开(公告)日：2014-08-26

申请号：US12362191

申请日：2009-01-29

申请人： Mehdi Vaez-Iravani ,  Lawrence Robert Miller

发明人： Mehdi Vaez-Iravani ,  Lawrence Robert Miller

IPC分类号： G01N21/00

CPC分类号： G01N21/95623 ,  G01N21/8806

摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding receiver or detector so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. Radiation reflected from the spots is imaged into a first array of receivers or detectors so that each receiver in the first array receives radiation from a corresponding spot in the array of spots; and scattered radiation from the spots is imaged onto a second array of receivers or detectors in a dark field imaging scheme so that each receiver or detector in the second array receives radiation from a corresponding spot.

摘要翻译： 紧凑且通用的多点检查成像系统采用将辐射束阵列聚焦到表面的目标和具有大数值孔径的第二反射或折射物镜，用于收集来自照明点阵列的散射辐射。 来自每个照明点的散射的辐射被聚焦到相应的接收器或检测器，使得关于散射的信息可以被传送到用于处理的远程检测器阵列中的对应的检测器。 从斑点反射的辐射被成像为第一阵列的接收器或检测器，使得第一阵列中的每个接收器接收来自阵列阵列中的相应斑点的辐射; 并且来自斑点的散射的辐射在暗场成像方案中成像到接收器或检测器的第二阵列上，使得第二阵列中的每个接收器或检测器接收来自相应光斑的辐射。

公开(公告)号：US07471382B2

公开(公告)日：2008-12-30

申请号：US11243349

申请日：2005-10-03

申请人： Lawrence Robert Miller ,  Mehdi Vaez-Iravani

发明人： Lawrence Robert Miller ,  Mehdi Vaez-Iravani

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8822

摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.

摘要翻译： 还存储指示围绕潜在异常位置的被检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常位置的表面上的贴片内的像素强度。 在照明光束和被检查表面之间产生旋转运动的情况下，可以通过比较被检查的两个不同表面上的相应位置处的像素的像素强度来改善信噪比，其中相同相对位置处的相应像素 两个不同的表面被照射，并且在相同的光学条件下收集和检测散射的辐射。

公开(公告)号：US20090116004A1

公开(公告)日：2009-05-07

申请号：US12332037

申请日：2008-12-10

申请人： Lawrence Robert Miller ,  Mehdi Vaez-Iravani

发明人： Lawrence Robert Miller ,  Mehdi Vaez-Iravani

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8822

摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.

摘要翻译： 还存储指示围绕潜在异常位置的被检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常位置的表面上的贴片内的像素强度。 在照明光束和被检查表面之间产生旋转运动的情况下，可以通过比较被检查的两个不同表面上的相应位置处的像素的像素强度来改善信噪比，其中相同相对位置处的相应像素 两个不同的表面被照射，并且在相同的光学条件下收集和检测散射的辐射。

公开(公告)号：US07978323B2

公开(公告)日：2011-07-12

申请号：US12332037

申请日：2008-12-10

申请人： Lawrence Robert Miller ,  Mehdi Vaez-Iravani

发明人： Lawrence Robert Miller ,  Mehdi Vaez-Iravani

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/8806 ,  G01N2021/8822

摘要： Pixel intensities indicative of scattered radiation from portions of the inspected surface surrounding a location of a potential anomaly are also stored so that such data is available for quick review of the pixel intensities within a patch on the surface containing the location of the potential anomaly. Where rotational motion is caused between the illumination beam and the inspected surface, signal-to-noise ratio may be improved by comparing the pixel intensities of pixels at corresponding positions on two different surfaces that are inspected, where corresponding pixels at the same relative locations on the two different surfaces are illuminated and scattered radiation therefrom collected and detected under the same optical conditions.

摘要翻译： 还存储指示围绕潜在异常位置的被检查表面的部分的散射辐射的像素强度，使得这样的数据可用于快速查看包含潜在异常位置的表面上的贴片内的像素强度。 在照明光束和被检查表面之间产生旋转运动的情况下，可以通过比较被检查的两个不同表面上的相应位置处的像素的像素强度来改善信噪比，其中相同相对位置处的相应像素 两个不同的表面被照射，并且在相同的光学条件下收集和检测散射的辐射。

公开(公告)号：US07492451B2

公开(公告)日：2009-02-17

申请号：US11553174

申请日：2006-10-26

申请人： Mehdi Vaez-Iravani ,  Lawrence Robert Miller

发明人： Mehdi Vaez-Iravani ,  Lawrence Robert Miller

IPC分类号： G01N21/00

CPC分类号： G01N21/95623 ,  G01N21/8806

摘要： A compact and versatile multi-spot inspection imaging system employs an objective for focusing an array of radiation beams to a surface and a second reflective or refractive objective having a large numerical aperture for collecting scattered radiation from the array of illuminated spots. The scattered radiation from each illuminated spot is focused to a corresponding optical fiber channel so that information about a scattering may be conveyed to a corresponding detector in a remote detector array for processing. For patterned surface inspection, a cross-shaped filter is rotated along with the surface to reduce the effects of diffraction by Manhattan geometry. A spatial filter in the shape of an annular aperture may also be employed to reduce scattering from patterns such as arrays on the surface.

摘要翻译： 紧凑且通用的多点检查成像系统采用将辐射束阵列聚焦到表面的目标和具有大数值孔径的第二反射或折射物镜，用于收集来自照明点阵列的散射辐射。 来自每个照明点的散射辐射被聚焦到相应的光纤通道，使得关于散射的信息可以被传送到用于处理的远程检测器阵列中的相应检测器。 对于图案化表面检查，十字形过滤器与表面一起旋转，以减少曼哈顿几何形状的衍射效应。 也可以采用环形孔形状的空间滤光器，以减少从诸如表面上的阵列的图案的散射。

公开(公告)号：US08765496B2

公开(公告)日：2014-07-01

申请号：US12110759

申请日：2008-04-28

申请人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chin Chuang

发明人： Mehran Nasser-Ghodsi ,  Mark Borowicz ,  Dave Bakker ,  Mehdi Vaez-Iravani ,  Prashant Aji ,  Rudy Garcia ,  Tzu Chin Chuang

IPC分类号： H01L21/00

CPC分类号： H01J37/317 ,  G01N1/32 ,  H01J37/244 ,  H01J37/3005 ,  H01J2237/2814 ,  H01J2237/3174 ,  H01J2237/31745

摘要： Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis are provided. One method for measuring a characteristic of a substrate includes removing a portion of a feature on the substrate using an electron beam to expose a cross-sectional profile of a remaining portion of the feature. The feature may be a photoresist feature. The method also includes measuring a characteristic of the cross-sectional profile. A method for preparing a substrate for analysis includes removing a portion of a material on the substrate proximate to a defect using chemical etching in combination with an electron beam. The defect may be a subsurface defect or a partially subsurface defect. Another method for preparing a substrate for analysis includes removing a portion of a material on a substrate proximate to a defect using chemical etching in combination with an electron beam and a light beam.

摘要翻译： 提供了用于测量基板的特性或准备用于分析的基板的方法和系统。 用于测量衬底的特性的一种方法包括使用电子束去除衬底上的特征的一部分以暴露特征的剩余部分的横截面轮廓。 该特征可以是光致抗蚀剂特征。 该方法还包括测量横截面轮廓的特性。 制备用于分析的基板的方法包括使用化学蚀刻与电子束结合来去除靠近缺陷的衬底上的材料的一部分。 缺陷可能是地下缺陷或部分地下缺陷。 制备用于分析的衬底的另一种方法包括使用化学蚀刻与电子束和光束组合地去除邻近缺陷的衬底上的材料的一部分。

公开(公告)号：US07869023B2

公开(公告)日：2011-01-11

申请号：US12123393

申请日：2008-05-19

申请人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

发明人： Guoheng Zhao ,  Stanley Stokowski ,  Mehdi Vaez-Iravani

IPC分类号： G01N21/00

CPC分类号： G01N21/9501

摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.

摘要翻译： 使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。 光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

公开(公告)号：US07607647B2

公开(公告)日：2009-10-27

申请号：US11688720

申请日：2007-03-20

申请人： Guoheng Zhao ,  Alexander Belyaev ,  Christian H. Wolters ,  Paul Andrew Doyle ,  Howard W. Dando ,  Mehdi Vaez-Iravani

发明人： Guoheng Zhao ,  Alexander Belyaev ,  Christian H. Wolters ,  Paul Andrew Doyle ,  Howard W. Dando ,  Mehdi Vaez-Iravani

IPC分类号： B25B11/00

CPC分类号： B25B11/005 ,  F16C29/025 ,  F16C32/0603 ,  H01L21/67784 ,  H01L21/6838

摘要： Substrate processing method and apparatus are disclosed. The substrate processing apparatus includes a non-contact air bearing chuck with a vacuum preload.

摘要翻译： 公开了基板处理方法和装置。 基板处理装置包括具有真空预载的非接触式空气轴承卡盘。

公开(公告)号：US20080229811A1

公开(公告)日：2008-09-25

申请号：US11688720

申请日：2007-03-20

申请人： Guoheng Zhao ,  Alexander Belyaev ,  Christian H. Wolters ,  Paul Andrew Doyle ,  Howard W. Dando ,  Mehdi Vaez-Iravani

发明人： Guoheng Zhao ,  Alexander Belyaev ,  Christian H. Wolters ,  Paul Andrew Doyle ,  Howard W. Dando ,  Mehdi Vaez-Iravani

IPC分类号： G01N21/00

CPC分类号： B25B11/005 ,  F16C29/025 ,  F16C32/0603 ,  H01L21/67784 ,  H01L21/6838

摘要： Substrate processing method and apparatus are disclosed. The substrate processing apparatus includes a non-contact air bearing chuck with a vacuum preload.

摘要翻译： 公开了基板处理方法和装置。 基板处理装置包括具有真空预载的非接触式空气轴承卡盘。