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115 条记录 (耗时 0.025 秒)

    Body-contact protective interface structure with neutral internal adhesive interface
    2.
    发明申请
    Body-contact protective interface structure with neutral internal adhesive interface 审中-公开
    机身接触保护接口结构，具有中性内部粘合剂界面

    公开(公告)号：US20060032572A1

    公开(公告)日：2006-02-16

    申请号：US11257617

    申请日：2005-10-25

    申请人： Michael Dennis ,  Michael Tucker ,  Gerhard Paasche

    发明人： Michael Dennis ,  Michael Tucker ,  Gerhard Paasche

    IPC分类号： B31B1/60 ,  B32B37/00

    CPC分类号： B32B3/04 ,  B32B7/12 ,  B32B25/00 ,  B32B2307/51 ,  B32B2307/724 ,  B32B2307/7265 ,  B32B2437/04 ,  Y10T156/10 ,  Y10T428/249953 ,  Y10T428/249958

    摘要： A method for fabricating a plural-layer, body-contacting protective and cushioning interface structure including the steps of (a) providing at least a pair of viscoelastic, non-springy, acceleration-rate-sensitive core layers, (b) facially bonding these two core layers using curable and initially wet, flowable adhesive which is based upon a solvent of one character, and thereafter (c) completing the fabrication by the application of a curable, and initially wet, flowable barrier-layer material to form a fully moisture-impervious but gas-permeable coating barrier layer which substantially completely encloses the bonded core layers.

    摘要翻译： 一种用于制造多层体接触保护和缓冲界面结构的方法，包括以下步骤：（a）提供至少一对粘弹性，非弹性的加速度敏感芯层，（b）将这些 两个核心层，其使用可固化和初始湿的可流动的粘合剂，其基于一个特性的溶剂，然后（c）通过施加可固化的和最初湿的可流动阻挡层材料来完成制造，以形成完全水分 - 透气但透气的涂层阻挡层，其基本上完全包围粘合的芯层。

    Vertically adjustable garment hanger
    5.
    发明授权
    Vertically adjustable garment hanger 有权

    公开(公告)号：US09993100B2

    公开(公告)日：2018-06-12

    申请号：US15265944

    申请日：2016-09-15

    申请人： Michael Tucker

    发明人： Michael Tucker

    IPC分类号： A47G25/32 ,  A47G25/38

    CPC分类号： A47G25/32 ,  A47G25/38

    摘要： A vertically adjustable garment hanger. The vertically adjustable garment hanger includes a supporting hook having a curved upper end and a lower end. The first end of a vertical suspending member is connected to the lower end of the supporting hook. An end stop is disposed on the second end of the vertical suspending member. A garment retaining body supports clothing thereon and includes an aperture. The vertical suspending member is inserted through the aperture in sliding engagement therewith. An adjustable support member is slidably disposed on the vertical suspending member. The adjustable support member allows the distance between the supporting hook and garment retaining to be changed so that users can hang clothing from a horizontal supporting rod at a desired height.

    Vertically Adjustable Garment Hanger
    6.
    发明申请
    Vertically Adjustable Garment Hanger 审中-公开
    垂直可调衣架

    公开(公告)号：US20170071388A1

    公开(公告)日：2017-03-16

    申请号：US15265944

    申请日：2016-09-15

    申请人： Michael Tucker

    发明人： Michael Tucker

    IPC分类号： A47G25/44

    CPC分类号： A47G25/32 ,  A47G25/38

    摘要： A vertically adjustable garment hanger. The vertically adjustable garment hanger includes a supporting hook having a curved upper end and a lower end. The first end of a vertical suspending member is connected to the lower end of the supporting hook. An end stop is disposed on the second end of the vertical suspending member. A garment retaining body supports clothing thereon and includes an aperture. The vertical suspending member is inserted through the aperture in sliding engagement therewith. An adjustable support member is slidably disposed on the vertical suspending member. The adjustable support member allows the distance between the supporting hook and garment retaining to be changed so that users can hang clothing from a horizontal supporting rod at a desired height.

    摘要翻译： 垂直调节的衣架。 可垂直调节的衣架包括具有弯曲上端和下端的支撑钩。 垂直悬挂构件的第一端连接到支撑钩的下端。 端部止动件设置在垂直悬挂构件的第二端上。 衣服保持体支撑其上的衣服并且包括孔。 垂直悬挂构件通过孔与其滑动接合插入。 可调节的支撑构件可滑动地设置在垂直悬挂构件上。 可调整的支撑构件允许支撑钩和衣物保持件之间的距离改变，使得使用者可以将衣物从水平支撑杆悬挂在期望的高度。

    Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
    7.
    发明授权
    Method for fracturing and forming a pattern using shaped beam charged particle beam lithography 有权
    使用成形束带电粒子束光刻法压裂和形成图案的方法

    公开(公告)号：US08501374B2

    公开(公告)日：2013-08-06

    申请号：US13723329

    申请日：2012-12-21

    申请人： Akira Fujimura ,  Michael Tucker

    发明人： Akira Fujimura ,  Michael Tucker

    IPC分类号： G03F1/20 ,  G03F9/00

    CPC分类号： G06F17/5081 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/36 ,  G03F1/68 ,  G03F1/70 ,  G03F1/78 ,  G03F7/2061 ,  G06F17/5045 ,  H01J37/3026 ,  H01J37/3174 ,  Y10S430/143

    摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, in which a plurality of shaped beam shots is determined which will form a target pattern on a surface, within a predetermined tolerance, where the plurality of shaped beam shots includes a plurality of circular or nearly-circular character projection (CP) shots plus one or more non-circular shot, and where at least two shots in the plurality of circular or nearly-circular shots overlap. Methods for manufacturing a surface and for manufacturing a semiconductor device on a substrate are also disclosed.

    摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或接近效应校正的方法和系统，其中确定将在表面上形成目标图案的多个成形射束， 在预定的公差范围内，其中多个成形射束包括多个圆形或近圆形的字符投影（CP）镜头加上一个或多个非圆形镜头，并且其中多个圆形或近似圆形的镜头中的至少两个镜头， 圆形镜头重叠。 还公开了用于制造表面和用于制造衬底上的半导体器件的方法。

    Method for Integrated Circuit Manufacturing and Mask Data Preparation Using Curvilinear Patterns
    8.
    发明申请
    Method for Integrated Circuit Manufacturing and Mask Data Preparation Using Curvilinear Patterns 有权
    使用曲线模式的集成电路制造和掩模数据准备的方法

    公开(公告)号：US20120094219A1

    公开(公告)日：2012-04-19

    申请号：US13269618

    申请日：2011-10-09

    申请人： Akira Fujimura ,  Michael Tucker

    发明人： Akira Fujimura ,  Michael Tucker

    IPC分类号： G03F1/00 ,  G06F17/50

    CPC分类号： G06F17/5081 ,  G03F7/70441 ,  G06F17/5077 ,  G06F2217/12

    摘要： A method for manufacturing a semiconductor device is disclosed, wherein during the physical design process, a curvilinear path is designed to represent an interconnecting wire on the fabricated semiconductor device. A method for fracturing or mask data preparation (MDP) is also disclosed in which a manhattan path which is part of the physical design of an integrated circuit is modified to create a curvilinear pattern, and where a set of charged particle beam shots is generated, where the set of shots is capable of forming the curvilinear pattern on a resist-coated surface.

    摘要翻译： 公开了一种用于制造半导体器件的方法，其中在物理设计过程期间，设计曲线路径以表示制造的半导体器件上的互连线。 还公开了一种用于压裂或掩模数据准备（MDP）的方法，其中作为集成电路的物理设计的一部分的曼哈顿路径被修改以产生曲线图案，并且在产生一组带电粒子束照射的情况下， 其中一组镜头能够在抗蚀剂涂覆的表面上形成曲线图案。

    Method for Fracturing and Forming a Pattern Using Circular Characters with Charged Particle Beam Lithography
    9.
    发明申请
    Method for Fracturing and Forming a Pattern Using Circular Characters with Charged Particle Beam Lithography 有权
    用带电粒子束光刻技术的圆形断裂和形成图案的方法

    公开(公告)号：US20120034554A1

    公开(公告)日：2012-02-09

    申请号：US13274346

    申请日：2011-10-16

    申请人： Akira Fujimura ,  Michael Tucker

    发明人： Akira Fujimura ,  Michael Tucker

    IPC分类号： G03F1/78 ,  G06F17/50 ,  G03F7/20

    CPC分类号： G06F17/5081 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/36 ,  G03F1/68 ,  G03F1/70 ,  G03F1/78 ,  G03F7/2061 ,  G06F17/5045 ,  H01J37/3026 ,  H01J37/3174 ,  Y10S430/143

    摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a plurality of shots of circular or nearly-circular character projection characters, having at least two shots that overlap, can form a non-circular pattern on a surface. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming non-circular patterns on a surface using a plurality of circular or nearly-circular character projection shots, where at least two shots overlap, is also disclosed.

    摘要翻译： 在使用成形带电粒子束光刻的半导体制造领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中多个圆形或近圆形字符投影字符的镜头具有至少两个镜头 重叠，可以在表面上形成非圆形图案。 还公开了用于制造掩模版和用于通过使用多个圆形或几乎圆形的角色投影镜在表面上形成非圆形图案来制造诸如硅晶片的基板的方法，其中至少两个重叠。

    Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography
    10.
    发明申请
    Method for Fracturing and Forming a Pattern Using Curvilinear Characters with Charged Particle Beam Lithography 有权
    使用具有带电粒子束光刻的曲线字符压缩和形成图案的方法

    公开(公告)号：US20120025108A1

    公开(公告)日：2012-02-02

    申请号：US13269497

    申请日：2011-10-07

    申请人： Akira Fujimura ,  Michael Tucker

    发明人： Akira Fujimura ,  Michael Tucker

    IPC分类号： G21K5/10 ,  G06F17/50

    CPC分类号： G06F17/5081 ,  B82Y10/00 ,  B82Y40/00 ,  G03F1/36 ,  G03F1/68 ,  G03F1/70 ,  G03F1/78 ,  G03F7/2061 ,  G06F17/5045 ,  H01J37/3026 ,  H01J37/3174 ,  Y10S430/143

    摘要： In the field of semiconductor production using shaped charged particle beam lithography, a method and system for fracturing or mask data preparation or proximity effect correction is disclosed, wherein a series of curvilinear character projection shots are determined for a charged particle beam writer system, such that the set of shots can form a continuous track, possibly of varying width, on a surface. A method for forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed. Methods for manufacturing a reticle and for manufacturing a substrate such as a silicon wafer by forming a continuous track on a surface using a series of curvilinear character projection shots is also disclosed.

    摘要翻译： 在使用成形带电粒子束光刻的半导体生产领域中，公开了一种用于压裂或掩模数据准备或邻近效应校正的方法和系统，其中为带电粒子束写入器系统确定了一系列曲线角色投影镜头，使得 一组镜头可以在表面上形成可能具有不同宽度的连续轨迹。 还公开了使用一系列曲线角色投影镜头在表面上形成连续轨道的方法。 还公开了用于制造掩模版和用于通过使用一系列曲线字符投影镜在表面上形成连续轨迹来制造诸如硅晶片的基板的方法。