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1.发明授权Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide 失效共聚萘酚和苯酚与甲醛与正邻醌二叠氮化物或负叠氮化物混合的光致抗蚀剂组合物
公开(公告)号：US4551409A
公开(公告)日：1985-11-05
申请号：US549286
申请日：1983-11-07
申请人： Michael Gulla , Paul Taylor , Michael J. Oddi
发明人： Michael Gulla , Paul Taylor , Michael J. Oddi
CPC分类号： G03F7/0236 , C08G8/04 , C08L61/06
摘要： A photoresist composition comprising a sensitizer in a binder that is a naphthol polymer alone or mixed with another compatible resin such as a novolak resin or a polyvinyl phenol. The use of the naphthol resin as a portion of the binder increases the heat distortion temperature of the photoresist composition.
摘要翻译： 一种光致抗蚀剂组合物，其包含单独的萘酚聚合物的粘合剂中的敏化剂或与酚醛清漆树脂或聚乙烯基苯酚等其它相容性树脂混合的光敏性组合物。 使用萘酚树脂作为粘合剂的一部分增加了光致抗蚀剂组合物的热变形温度。
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公开(公告)号：US5312715A
公开(公告)日：1994-05-17
申请号：US829371
申请日：1992-02-03
IPC分类号： C08G59/18 , C08G59/00 , C08G59/62 , C08L61/04 , C08L61/10 , C08L61/20 , C08L61/28 , C08L63/00 , G03F7/004 , G03F7/029 , G03F7/038 , H05K3/28 , G03C1/725
CPC分类号： G03F7/038 , H05K3/287 , Y10S430/136
摘要： A photoimageable composition and process for use of the same. The composition comprises a binder that is a mixture of a phenolic resin and a multifunctional epoxy or vinyl ether pound and a curing system comprising a photoactive compound capable of generating a curing catalyst capable of crosslinking the binder components. The process for use of the composition comprises application of the composition to a substrate, drying of the same, exposing the dried coating to activating radiation, curing the binder in light exposed areas, developing the coating and thermally curing the developed image. The composition is especially useful as a solder mask.
摘要翻译： 一种可光成像的组合物及其使用方法。 该组合物包含作为酚醛树脂和多官能环氧树脂或乙烯基醚磅的混合物的粘合剂和包含能够产生能够交联粘合剂组分的固化催化剂的光活性化合物的固化体系。 使用该组合物的方法包括将组合物施用于基材，干燥该组合物，使干燥的涂层暴露于活化辐射，固化曝光区域中的粘合剂，显影涂层和热固化显影图像。 该组合物作为阻焊剂特别有用。
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公开(公告)号：US5206116A
公开(公告)日：1993-04-27
申请号：US663604
申请日：1991-03-04
CPC分类号： G03F7/038 , H05K3/287 , Y10S430/136
摘要： A light sensitive composition and process for using said composition. The light sensitive composition comprises a phenolic resin, a multifunctional epoxy or vinyl compound, a photoinitiator and a thermal crosslinking agent. The process for using the same comprises application of the light sensitive composition to a substrate, drying of the same, exposing the dried coating to activating radiation, partially heat curing the coating, developing the coating and thermally curing the developed image. The composition is especially useful as a solder mask.
摘要翻译： 光敏组合物和使用所述组合物的方法。 光敏组合物包含酚醛树脂，多官能环氧或乙烯基化合物，光引发剂和热交联剂。 使用该方法的方法包括将光敏组合物施用于基材，干燥基材，将干燥的涂料暴露于活化辐射，部分热固化涂层，显影涂层和热固化显影图像。 该组合物作为阻焊剂特别有用。
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4.发明授权Method of applying photoresist by screening in the formation of printed circuits 失效通过在形成印刷电路中进行筛选来施加光致抗蚀剂的方法
公开(公告)号：US4376815A
公开(公告)日：1983-03-15
申请号：US87223
申请日：1979-10-22
申请人： Michael J. Oddi , Alfred P. Orio
发明人： Michael J. Oddi , Alfred P. Orio
CPC分类号： H05K3/28 , G03F7/16 , H05K2203/0759 , H05K3/064 , H05K3/108 , H05K3/1216 , Y10S430/136
摘要： This invention is directed to processes for using a light sensitive photoresist material in the manufacture of an article having a surface permanently modified in an image pattern. The process comprises applying the photoresist to a substrate through a screen, preferably as a continuous, incompletely imaged layer and thereafter, imaging and developing to provide a relief image in the photoresist layer and treating the substrate to provide a permanent image in the finished article. The process is particularly useful in the manufacture of printed circuits. The process is believed to be a departure from conventional processes in the step of screening a light sensitive photoresist material over a substrate.
摘要翻译： 本发明涉及在制造具有以图像图案永久修改的表面的制品时使用光敏光致抗蚀剂材料的方法。 该方法包括通过筛网将光致抗蚀剂施加到基底上，优选地作为连续不完全成像的层，然后进行成像和显影以在光致抗蚀剂层中提供浮雕图像并处理基底以在成品中提供永久图像。 该方法在印刷电路的制造中特别有用。 据信这种方法是在衬底上筛选光敏光刻胶材料的步骤中的常规方法的偏离。
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公开(公告)号：US5397685A
公开(公告)日：1995-03-14
申请号：US157312
申请日：1993-11-26
CPC分类号： G03F7/038 , H05K3/287 , Y10S430/136
摘要： A photoimageable composition and process for use of the same. The composition comprises a binder that is a mixture of a phenolic resin and a multifunctional epoxy or vinyl compound and a curing system comprising a photoactive compound capable of generating a curing catalyst capable of crosslinking the binder components. The process for use of the composition comprises application of the composition to a substrate, drying of the same, exposing the dried coating to activating radiation, curing the binder in light exposed areas, developing the coating and thermally curing the developed image. The composition is especially useful as a solder mask.
摘要翻译： 一种可光成像的组合物及其使用方法。 该组合物包含作为酚醛树脂和多官能环氧基或乙烯基化合物的混合物的粘合剂和包含能够产生能够交联粘合剂组分的固化催化剂的光活性化合物的固化体系。 使用该组合物的方法包括将组合物施用于基材，干燥该组合物，使干燥的涂层暴露于活化辐射，固化曝光区域中的粘合剂，显影涂层和热固化显影图像。 该组合物作为阻焊剂特别有用。
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6.发明授权Positive acting photoresist comprising diazide ester, novolak resin and rosin 失效包含二叠氮酯，酚醛清漆树脂和松香的正性光致抗蚀剂
公开(公告)号：US4148654A
公开(公告)日：1979-04-10
申请号：US707672
申请日：1976-07-22
申请人： Michael J. Oddi
发明人： Michael J. Oddi
CPC分类号： G03F7/0233 , Y10S430/106
摘要： Rosinous material is added to photoresist compositions to improve flexiblity, rheology and other physical properties. The rosinous material may be a rosin or a hydrogenated, esterified or neutralized derivative of a rosin. Particular advantages are achieved when the photoresists also contain a polyvinyl alkyl ether.
摘要翻译： 将松香材料加入到光致抗蚀剂组合物中以提高柔韧性，流变性和其它物理性能。 松香物质可以是松香或氢化，酯化或中和的松香衍生物。 当光致抗蚀剂还含有聚乙烯基烷基醚时，可以实现特别的优点。
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