Continuous process for the preparation of N-(phosphonomethyl)
iminodiacetic acid
    1.
    发明授权
    Continuous process for the preparation of N-(phosphonomethyl) iminodiacetic acid 有权
    连续制备N-(膦酰基甲基)亚氨基二乙酸的方法

    公开(公告)号:US6130351A

    公开(公告)日:2000-10-10

    申请号:US373106

    申请日:1999-08-12

    摘要: A process for the production of N-(phosphonomethyl)iminodiacetic acid. N-(acetyl)iminodiacetic acid is formed in a amidocarboxymethylation reactor system, into which a source of each of the following is continuously fed: (1) acetamide or an acetamide derivative, (2) formaldehyde or a formaldehyde generator or derivative, (3) a carbonylation catalyst, (4) carbon monoxide, and optionally (5) hydrogen. In turn, an amidocarboxymethylation reaction product stream, which contains N-(acetyl)iminodiacetic acid and the carbonylation catalyst, is withdrawn from the amidocarboxymethylation reactor system. The carbonylation catalyst is separated from the amidocarboxymethylation reaction product stream to recover the carbonylation catalyst and form a catalyst depleted product stream which contains N-(acetyl)iminodiacetic acid. The separated carbonylation catalyst is returned to the amidocarboxymethylation reactor system, and the N-(acetyl)iminodiacetic acid in the catalyst depleted product stream is either: (1) reacted with a source of phosphorous and a source of formaldehyde in the presence of an acid to form a phosphonomethylation reaction product stream containing N-(phosphonomethyl)iminodiacetic acid and acetic acid; or (2) deacylated and cyclized to form a 2,5-diketopiperazine, and then reacted with a source of phosphorous and a source of formaldehyde in the presence of an acid to form a phosphonomethylation reaction product stream containing N-(phosphonomethyl)iminodiacetic acid and acetic acid. Either way, the N-(phosphonomethyl)iminodiacetic acid is precipitated from the phosphonomethylation reaction product stream in the presence of acetic acid, and the precipitate is recovered to form a filtrate stream.

    摘要翻译: 一种生产N-(膦酰基甲基)亚氨基二乙酸的方法。 在酰胺羧甲基化反应器系统中形成N-(乙酰基)亚氨基二乙酸,其中连续供给以下各项的源:(1)乙酰胺或乙酰胺衍生物,(2)甲醛或甲醛发生剂或衍生物,(3 )羰基化催化剂,(4)一氧化碳和任选的(5)氢。 反过来,含有N-(乙酰基)亚氨基二乙酸和羰基化催化剂的酰胺甲基甲基化反应产物流从酰胺羧甲基化反应器系统中排出。 从酰胺羧甲基化反应产物流中分离羰基化催化剂以回收羰基化催化剂并形成含有N-(乙酰基)亚氨基二乙酸的催化剂贫化产物流。 将分离的羰基化催化剂返回到酰胺羧甲基化反应器系统中,催化剂贫化产物流中的N-(乙酰基)亚氨基二乙酸是:(1)在酸存在下与磷源和甲醛源反应 以形成含有N-(膦酰基甲基)亚氨基二乙酸和乙酸的膦酰基甲基化反应产物流; 或(2)脱酰基并环化形成2,5-二酮哌嗪,然后在酸存在下与磷源和甲醛源反应,形成含有N-(膦酰基甲基)亚氨基二乙酸的膦酰基甲基化反应产物流 和乙酸。 无论哪种方式,在乙酸存在下,从膦酰基甲基化反应产物流中沉淀N-(膦酰基甲基)亚氨基二乙酸,并回收沉淀物以形成滤液流。

    Continuous process for the preparation of N-(phosphonomethyl)iminodiacetic acid
    2.
    发明授权
    Continuous process for the preparation of N-(phosphonomethyl)iminodiacetic acid 有权
    连续制备N-(膦酰基甲基)亚氨基二乙酸的方法

    公开(公告)号:US06278017B1

    公开(公告)日:2001-08-21

    申请号:US09612705

    申请日:2000-07-10

    IPC分类号: C07F938

    摘要: A process for the continuous production of N-(phosphonomethyl)glycine is provided. In the process, N-(acetyl)iminodiacetic acid is formed in an amidocarboxymethylation reactor system. The N-(acetyl)iminodiacetic acid product stream is either: (1) reacted with a source of phosphorous and a source of formaldehyde in the presence of an acid to form a phosphonomethylation reaction product stream containing N-(phosphonomethyl)iminodiacetic acid and acetic acid; or (2) deacylated and cyclized to form a 2,5-diketopiperazine, and then reacted with a source of phosphorous and a source of formaldehyde in the presence of an acid to form a phosphonomethylation reaction product stream containing N-(phosphonomethyl)iminodiacetic acid and acetic acid. In either case, the N-(phosphonomethyl)iminodiacetic acid product is recovered and converted to N-(phosphonomethyl)glycine.

    摘要翻译: 提供了连续生产N-(膦酰基甲基)甘氨酸的方法。 在此过程中,N-(乙酰基)亚氨基二乙酸在酰胺羧甲基化反应器体系中形成。 N-(乙酰基)亚氨基二乙酸产物流是:(1)在酸存在下与磷源和甲醛源反应,形成含有N-(膦酰基甲基)亚氨基二乙酸和乙酸的膦酰基甲基化反应产物流 酸; 或(2)脱酰基并环化形成2,5-二酮哌嗪,然后在酸存在下与磷源和甲醛源反应,形成含有N-(膦酰基甲基)亚氨基二乙酸的膦酰基甲基化反应产物流 和乙酸。 在任一种情况下,N-(膦酰基甲基)亚氨基二乙酸产物被回收并转化成N-(膦酰基甲基)甘氨酸。

    Resilient material variable resistor
    7.
    发明授权
    Resilient material variable resistor 失效
    弹性材料可变电阻

    公开(公告)号:US07629871B2

    公开(公告)日:2009-12-08

    申请号:US11701643

    申请日:2007-02-01

    IPC分类号: H01C10/00

    摘要: A variable resistance device comprises a resistive member having a resistive resilient material. A first conductor is configured to be electrically coupled with the resistive member at a first contact location over a first contact area. A second conductor is configured to be electrically coupled with the resistance member at a second contact location over a second contact area. The first contact location and second contact location are spaced from one another by a distance. The resistance between the first conductor at the first contact location and the second conductor at the second contact location is equal to the sum of a straight resistance component and a parallel path resistance component. At least one of the first location, the second location, the first contact area, and the second contact area is changed to produce a change in resistance between the first conductor and the second conductor. The straight resistance component increases or decreases as the distance between the first contact location and the second contact location increases or decrease, respectively. The parallel path resistance component has preset desired characteristics based on selected first and second contact locations and selected first and second contact areas. The first and second contact locations and first and second contact areas can be selected such that the change in the resistance between the first and second contact locations is at least substantially equal to the change in the straight resistance component or the change in the parallel path resistance component.

    摘要翻译: 可变电阻装置包括具有电阻弹性材料的电阻构件。 第一导体被配置为在第一接触区域上的第一接触位置处与电阻构件电耦合。 第二导体被配置为在第二接触区域上的第二接触位置处与电阻构件电耦合。 第一接触位置和第二接触位置彼此间隔一定距离。 在第一接触位置处的第一导体与第二接触位置处的第二导体之间的电阻等于直电阻分量和平行路径电阻分量的和。 改变第一位置,第二位置,第一接触区域和第二接触区域中的至少一个,以产生第一导体和第二导体之间的电阻变化。 直电阻分量随着第一接触位置和第二接触位置之间的距离分别增加或减小而增加或减小。 平行路径电阻分量基于所选择的第一和第二接触位置以及所选择的第一和第二接触区域来预设期望的特性。 可以选择第一和第二接触位置以及第一和第二接触区域,使得第一和第二接触位置之间的电阻的变化至少基本上等于直线电阻分量的变化或平行路径电阻的变化 零件。

    Variable resistance devices and methods
    8.
    发明授权
    Variable resistance devices and methods 失效
    可变电阻器件和方法

    公开(公告)号:US07190251B2

    公开(公告)日:2007-03-13

    申请号:US10188513

    申请日:2002-07-03

    IPC分类号: H01C10/06

    摘要: A method of providing a variable resistance from a resistive member including a resistive resilient material comprises electrically coupling a first conductor with the resistive member at a first contact location over a first contact area; and electrically coupling a second conductor with the resistive member at a movable second contact location over a second contact area. The second contact location is movable relative to the resistive member to change the second contact location between the second conductor and the resistive member, the first contact location and the movable second contact location being spaced from one another by a distance. The method further comprises changing at least one of the first location, the second location, the first contact area, and the second contact area to produce a change in resistance in the resistive member, measured between the first conductor at the first contact location and the second conductor at the second contact location, as the resistive member deforms along the second conductor.

    摘要翻译: 从包括电阻弹性材料的电阻构件提供可变电阻的方法包括在第一接触区域上的第一接触位置电耦合第一导体与电阻构件; 以及在第二接触区域上的可移动的第二接触位置处将第二导体与所述电阻构件电耦合。 第二接触位置可相对于电阻构件移动以改变第二导体和电阻构件之间的第二接触位置,第一接触位置和可动第二接触位置彼此间隔一定距离。 该方法还包括改变第一位置,第二位置,第一接触区域和第二接触区域中的至少一个,以在第一接触位置处的第一导体与第一接触位置之间测量的电阻构件中的电阻变化, 第二导体在第二接触位置处,因为电阻构件沿着第二导体变形。