VCSEL WITH NON-CIRCULAR MESA AND CURRENT CONFINEMENT APERTURE FOR HIGHER-ORDER LATERAL MODE EMISSION
    1.
    发明申请
    VCSEL WITH NON-CIRCULAR MESA AND CURRENT CONFINEMENT APERTURE FOR HIGHER-ORDER LATERAL MODE EMISSION 有权
    具有非圆形MESA的VCSEL和用于高阶侧向模式排放的当前配置孔

    公开(公告)号:US20110176572A1

    公开(公告)日:2011-07-21

    申请号:US13121885

    申请日:2009-09-30

    IPC分类号: H01S5/183 H01L21/306 H01S5/20

    摘要: A vertical cavity surface emitting laser (VCSEL) (100) has a substrate (104), on which are disposed first and second distributed Bragg reflectors (DBRs) (106, 112), each DBR comprising a stack of layers of alternating refractive index, an active layer (108) disposed between the DBRs, and an aperture layer (110) disposed either between the DBRs or within one of the DBRs. The aperture layer (110) has a border (116) having an internal boundary with a plurality of indented portions defining one or more apertures. Such a VCSEL is easily manufacturable and provides a narrow bandwidth output, as well as mitigating at least some of the problems of prior art VCSELs. Mesa (102) may be etched to be non-circular and subsequent selective oxidation of aperture layer (110) results in a non-circular current confinement aperture (114) promoting higher-order lateral modes (LP21).

    摘要翻译: 垂直腔表面发射激光器(VCSEL)(100)具有衬底(104),其上设置有第一和第二分布式布拉格反射器(DBD)(106,112),每个DBR包括交替折射率层的叠层, 布置在DBR之间的有源层(108)和布置在DBR之间或在一个DBR内的孔层(110)。 开口层(110)具有边界(116),边界具有限定一个或多个孔的多个凹口部分的内部边界。 这样的VCSEL容易制造并且提供窄带宽输出,以及减轻现有技术VCSEL的至少一些问题。 可以将台面(102)蚀刻成非圆形,随后孔径层(110)的选择性氧化导致促进高阶侧向模式(LP21)的非圆形电流限制孔(114)。

    VCSEL with non-circular mesa and current confinement aperture for higher order lateral mode emission
    2.
    发明授权
    VCSEL with non-circular mesa and current confinement aperture for higher order lateral mode emission 有权
    具有非圆形台面和电流限制孔径的VCSEL用于高阶横向模式发射

    公开(公告)号:US08355423B2

    公开(公告)日:2013-01-15

    申请号:US13121885

    申请日:2009-09-30

    IPC分类号: H01S5/00

    摘要: A vertical cavity surface emitting laser (VCSEL) (100) has a substrate (104), on which are disposed first and second distributed Bragg reflectors (DBRs) (106, 112), each DBR comprising a stack of layers of alternating refractive index, an active layer (108) disposed between the DBRs, and an aperture layer (110) disposed either between the DBRs or within one of the DBRs. The aperture layer (110) has a border (116) having an internal boundary with a plurality of indented portions defining one or more apertures. Such a VCSEL is easily manufacturable and provides a narrow bandwidth output, as well as mitigating at least some of the problems of prior art VCSELs. Mesa (102) may be etched to be non-circular and subsequent selective oxidation of aperture layer (110) results in a non-circular current confinement aperture (114) promoting higher-order lateral modes (LP21).

    摘要翻译: 垂直腔表面发射激光器(VCSEL)(100)具有衬底(104),其上设置有第一和第二分布式布拉格反射器(DBD)(106,112),每个DBR包括交替折射率层的叠层, 布置在DBR之间的有源层(108)和布置在DBR之间或在一个DBR内的孔层(110)。 开口层(110)具有边界(116),边界具有限定一个或多个孔的多个凹口部分的内部边界。 这样的VCSEL容易制造并且提供窄带宽输出,以及减轻现有技术VCSEL的至少一些问题。 可以将台面(102)蚀刻成非圆形,随后孔径层(110)的选择性氧化导致促进高阶侧向模式(LP21)的非圆形电流限制孔(114)。

    High speed vertical cavity surface emitting laser device (VCSEL) with low parasitic capacitance
    3.
    发明授权
    High speed vertical cavity surface emitting laser device (VCSEL) with low parasitic capacitance 有权
    具有低寄生电容的高速垂直腔表面发射激光器件(VCSEL)

    公开(公告)号:US07061956B2

    公开(公告)日:2006-06-13

    申请号:US10422397

    申请日:2003-04-24

    申请人: Sven Eitel

    发明人: Sven Eitel

    IPC分类号: H01S5/00

    摘要: A design of a vertical cavity surface emitting laser chip suitable for high speed data communication. An intracavity contact to the doped layers of the bottom mirror is formed so that both contacts are on the top epitaxial side of the wafer. These main structural features can be used to reduce the bond pad capacitance by a suitable spatial separation of metallizations of the p and n contact. The bond pads are processed as a short symmetric coplanar line in a ground signal ground configuration which allows flexible device testing and packaging. A significant capacitance between the pads of the center strip and the outer ground strips is avoided by etching the doped semiconductor layers between these strips down to the semi-insulating substrate. This design avoids pad metallizations and the corresponding critical photolithographic steps over large height differences from the vertical cavity surface emitting laser mesa top to the substrate. This insures good lithographic fidelity and makes the process reproducible.

    摘要翻译: 垂直腔表面发射激光芯片的设计适用于高速数据通信。 形成与底部反射镜的掺杂层的腔内接触,使得两个触点都在晶片的顶部外延侧上。 这些主要结构特征可用于通过p和n接触的金属化的合适的空间分离来减小接合焊盘电容。 接合焊盘作为地面信号接地配置中的短对称共面线进行处理,允许灵活的设备测试和封装。 通过将这些带之间的掺杂半导体层蚀刻到半绝缘衬底上,避免了中心条的焊盘和外部接地条之间的显着电容。 该设计避免了焊盘金属化和相对于从垂直腔表面发射激光台面到衬底的高高差的相应的临界光刻步骤。 这确保了良好的光刻保真度,并使得该工艺可重现。