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公开(公告)号：US06861115B2
公开(公告)日：2005-03-01
申请号：US09860279
申请日：2001-05-18
申请人： Michael D. Morris , Michael S. Darsillo , David J. Fluck , Jason R. Hilton , Rudiger Laufhutte , Michael A. Lucarelli
发明人： Michael D. Morris , Michael S. Darsillo , David J. Fluck , Jason R. Hilton , Rudiger Laufhutte , Michael A. Lucarelli
CPC分类号： B41M5/52 , B41M5/506 , B41M5/508 , B41M5/5218 , B41M5/5236 , B41M5/5245 , B41M5/5254 , B41M5/529 , C09D129/04 , Y10T428/24802 , C08L2666/36 , C08L2666/58
摘要： This invention pertains to an ink jet recording medium comprises a flexible substrate and a coating composition coated on at least one surface of the substrate, wherein the coating composition comprises the product formed from the contact between fumed silica particles and at least one aminoorganosiloxane. The invention also pertains to a method for the preparation of such an ink jet recording medium and to methods for the preparation of a coating composition and a dispersion useful in the preparation of such an ink jet recording medium.
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公开(公告)号：US06284819B1
公开(公告)日：2001-09-04
申请号：US09346455
申请日：1999-07-01
IPC分类号： C04B1204
CPC分类号： B41M5/52 , B41M5/508 , B41M5/5218 , B41M5/5254 , C08L25/06 , C09D129/04 , Y10T428/24893 , Y10T428/24909 , Y10T428/25 , Y10T428/256 , C08L2666/04 , C08L2666/54
摘要： The present invention provides a recording medium comprising a substrate having a glossy coating thereon, wherein the glossy coating comprises a binder and first and second groups of particles, wherein: (a) the first group comprises metal oxide particles, wherein the metal oxide particles are aggregates of smaller, primary particles, (b) the mean diameter of the primary particles is less than about 100 nm, (c) the mean diameter of the aggregates is from about 100 nm to about 500 nm, (d) the mean diameter of the particles in the second group is less than about 50% of the mean diameter of the aggregates in the first group, and (e) the ratio of particles in the first group to particles in the second group is from about 0.1:1 to about 10:1 by weight. The glossy coating of the inventive recording medium has an excellent rate of liquid absorption, a relatively high liquid absorption capacity, excellent adhesiveness, and a non-brittle, crack-resistant, glossy surface. Also provided is a method of preparing a recording medium and a coating composition useful in the preparation of a recording medium.
摘要翻译： 本发明提供了一种记录介质，其中包括在其上具有光泽涂层的基材，其中光泽涂层包括粘合剂和第一和第二组颗粒，其中：（a）第一组包括金属氧化物颗粒，其中金属氧化物颗粒为 （b）初级颗粒的平均直径小于约100nm，（c）聚集体的平均直径为约100nm至约500nm，（d）平均直径为 第二组中的颗粒小于第一组中聚集体的平均直径的约50％，和（e）第一组中的颗粒与第二组中的颗粒的比例为约0.1:1至约 10:1重量份。本发明记录介质的光泽涂层具有优异的液体吸收速率，较高的液体吸收能力，优异的粘附性和非脆性，抗裂纹的光泽表面。 还提供了制备用于制备记录介质的记录介质和涂料组合物的方法。
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公开(公告)号：US06887559B1
公开(公告)日：2005-05-03
申请号：US09670118
申请日：2000-09-26
CPC分类号： B41M5/5218 , B41M5/508 , Y10T428/24893 , Y10T428/25 , Y10T428/259 , Y10T428/26 , Y10T428/2982 , Y10T428/31667 , Y10T428/31786 , Y10T428/31993
摘要： A recording medium comprising a substrate having a glossy coating thereon, wherein the glossy coating comprises a binder and alumina particles that are aggregates of primary particles.
摘要翻译： 一种包括其上具有光泽涂层的基底的记录介质，其中所述光泽涂层包括作为初级颗粒的聚集体的粘合剂和氧化铝颗粒。
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公开(公告)号：US06365264B2
公开(公告)日：2002-04-02
申请号：US09924623
申请日：2001-08-08
IPC分类号： B32B100
CPC分类号： B41M5/52 , B41M5/508 , B41M5/5218 , B41M5/5254 , C08L25/06 , C09D129/04 , Y10T428/24893 , Y10T428/24909 , Y10T428/25 , Y10T428/256 , C08L2666/04 , C08L2666/54
摘要： The present invention provides a recording medium comprising a substrate having a glossy coating thereon, wherein the glossy coating comprises a binder and first and second groups of particles, wherein: (a) the first group comprises metal oxide particles, wherein the metal oxide particles are aggregates of smaller, primary particles, (b) the mean diameter of the primary particles is less than about 100 nm, (c) the mean diameter of the aggregates is from about 100 nm to about 500 nm, (d) the mean diameter of the particles in the second group is less than about 50% of the mean diameter of the aggregates in the first group, and (e) the ratio of particles in the first group to particles in the second group is from about 0.1:1 to about 10:1 by weight. The glossy coating of the inventive recording medium has an excellent rate of liquid absorption, a relatively high liquid absorption capacity, excellent adhesiveness, and a non-brittle, crack-resistant, glossy surface. Also provided is a method of preparing a recording medium and a coating composition useful in the preparation of a recording medium.
摘要翻译： 本发明提供了一种记录介质，其中包括在其上具有光泽涂层的基材，其中光泽涂层包括粘合剂和第一和第二组颗粒，其中：（a）第一组包括金属氧化物颗粒，其中金属氧化物颗粒为 （b）初级颗粒的平均直径小于约100nm，（c）聚集体的平均直径为约100nm至约500nm，（d）平均直径为 第二组中的颗粒小于第一组中聚集体的平均直径的约50％，和（e）第一组中的颗粒与第二组中的颗粒的比例为约0.1:1至约 10：1。 本发明记录介质的光泽涂层具有优良的液体吸收率，较高的液体吸收能力，优异的粘合性和非脆性，抗裂纹的光泽表面。 还提供了制备用于制备记录介质的记录介质和涂料组合物的方法。
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公开(公告)号：US07431993B2
公开(公告)日：2008-10-07
申请号：US11091672
申请日：2005-03-28
IPC分类号： B32B9/04 , B32B5/16 , C01B33/113
CPC分类号： B41M5/5218 , B41M5/508 , Y10T428/24893 , Y10T428/25 , Y10T428/259 , Y10T428/26 , Y10T428/2982 , Y10T428/31667 , Y10T428/31786 , Y10T428/31993
摘要： The invention provides a recording medium comprising a substrate having a glossy coating thereon, wherein the glossy coating comprises a binder and alumina particles that are aggregates of primary particles.
摘要翻译： 本发明提供了一种包括其上具有光泽涂层的基底的记录介质，其中光泽涂层包括作为初级颗粒的聚集体的粘合剂和氧化铝颗粒。
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公开(公告)号：US06964992B2
公开(公告)日：2005-11-15
申请号：US10146749
申请日：2002-05-16
申请人： Michael D. Morris , Michael S. Darsillo , David J. Fluck , Jason R. Hilton , Rudiger Laufhutte , Michael A. Lucarelli
发明人： Michael D. Morris , Michael S. Darsillo , David J. Fluck , Jason R. Hilton , Rudiger Laufhutte , Michael A. Lucarelli
CPC分类号： B41M5/52 , B41M5/506 , B41M5/508 , B41M5/5218 , B41M5/5236 , B41M5/5245 , B41M5/5254 , B41M5/529 , C09D129/04 , Y10T428/24802 , C08L2666/36 , C08L2666/58
摘要： This invention pertains to an ink jet recording medium comprises a flexible substrate and a coating composition coated on at least one surface of the substrate, wherein the coating composition comprises the product formed from the contact between fumed silica particles and at least one aminoorganosiloxane. The invention also pertains to a method for the preparation of such an ink jet recording medium and to methods for the preparation of a coating composition and a dispersion useful in the preparation of such an ink jet recording medium.
摘要翻译： 本发明涉及一种喷墨记录介质，其包含柔性基材和涂覆在基材的至少一个表面上的涂料组合物，其中涂料组合物包含由热解法二氧化硅颗粒与至少一种氨基有机硅氧烷之间的接触形成的产物。 本发明还涉及制备这种喷墨记录介质的方法以及制备涂料组合物和可用于制备这种喷墨记录介质的分散体的方法。
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公开(公告)号：US06420039B1
公开(公告)日：2002-07-16
申请号：US09411164
申请日：1999-10-01
IPC分类号： B32B904
CPC分类号： B41M5/5218 , B41M5/508 , C01B13/145 , C01B33/149 , C01P2004/62 , C01P2006/12 , C01P2006/60 , Y10T428/259 , Y10T428/26 , Y10T428/31667
摘要： The present invention provides a recording medium comprising a substrate having a glossy coating thereon, wherein the glossy coating comprises cationic silica. The cationic silica comprises silica particles having a mean diameter of less than about 1 &mgr;m that have been contacted with at least one aluminum compound. The present invention also provides an aqueous dispersion of cationic silica, a coating composition comprising it, and methods of preparing the dispersion, coating composition, and recording medium.
摘要翻译： 本发明提供一种包含其上具有光泽涂层的基材的记录介质，其中光泽涂层包含阳离子二氧化硅。 阳离子二氧化硅包括已经与至少一种铝化合物接触的平均直径小于约1μm的二氧化硅颗粒。 本发明还提供了阳离子二氧化硅的水分散体，包含它的涂料组合物，以及制备分散体，涂料组合物和记录介质的方法。
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8.发明申请METHOD OF PASSIVATING CHEMICAL MECHANICAL POLISHING COMPOSITIONS FOR COPPER FILM PLANARIZATION PROCESSES 有权铜膜平面化方法的化学机械抛光组合物的处理方法公开(公告)号：US20090137122A1
公开(公告)日：2009-05-28
申请号：US12234199
申请日：2008-09-19
申请人： Jun Liu , Mackenzie King , Michael S. Darsillo , Karl E. Boggs , Jeffrey F. Roeder , Peter Wrschka , Thomas H. Baum
发明人： Jun Liu , Mackenzie King , Michael S. Darsillo , Karl E. Boggs , Jeffrey F. Roeder , Peter Wrschka , Thomas H. Baum
IPC分类号： H01L21/306
CPC分类号： C23F3/06 , C09G1/02 , C23F3/00 , C23F11/141 , H01L21/3212
摘要： A method of passivating a CMP composition by dilution and determining the relationship between the extent of dilution and the static etch rate of copper. Such relationship may be used to control the CMP composition during the CMP polish to minimize the occurrence of dishing or other adverse planarization deficiencies in the polished copper, even in the presence of substantial levels of copper ions in the CMP composition and at the copper/CMP composition interface.
摘要翻译： 通过稀释钝化CMP组合物并确定稀释程度与铜的静态蚀刻速率之间的关系的方法。 这种关系可以用于在CMP抛光期间控制CMP组成，以尽量减少抛光铜中的凹陷或其他不利平面化缺陷的发生，即使在CMP组合物中和在铜/ CMP处存在大量的铜离子 组合界面。
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9.发明授权Structure precipitated silicates and silicas, production and use in ink jet printing 失效结构沉淀硅酸盐和二氧化硅，在喷墨印刷中的生产和使用
公开(公告)号：US5827363A
公开(公告)日：1998-10-27
申请号：US767677
申请日：1996-12-17
IPC分类号： B41J2/01 , B41M5/00 , B41M5/50 , B41M5/52 , C09C1/30 , C09C3/04 , C09C3/10 , C09D11/00 , C04B14/04
CPC分类号： B41M5/5218 , C09C1/3018 , C09C3/041 , B41M5/5254 , C01P2002/02 , C01P2004/50 , C01P2004/51 , C01P2004/61 , C01P2006/12 , C01P2006/19 , C01P2006/22 , C01P2006/60
摘要： A method for preparing precipitated silicates and silicas having good high shear rheology in high solids aqueous slurries. Destructuring of aluminum silicate and silica via dry milling results in decreasing DBP oil absorption. The destructured materials are useful for ink jet coating formulations.
摘要翻译： 一种在高固体含水浆料中制备具有良好高剪切流变性的沉淀硅酸盐和二氧化硅的方法。 通过干磨将铝硅酸盐和二氧化硅破坏导致DBP吸油量降低。 破坏后的材料可用于喷墨涂料配方。
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10.发明申请STABILIZATION OF POLYMER-SILICA DISPERSIONS FOR CHEMICAL MECHANICAL POLISHING SLURRY APPLICATIONS 审中-公开用于化学机械抛光浆料的聚合物二氧化硅分散体的稳定性公开(公告)号：US20100087065A1
公开(公告)日：2010-04-08
申请号：US12525325
申请日：2008-01-31
IPC分类号： C09K13/00 , H01L21/461
CPC分类号： H01L21/3212 , C09G1/02 , C09K3/1463
摘要： Chemical mechanical polishing (CMP) compositions and single CMP platen process for the removal of copper and barrier layer material from a microelectronic device substrate having same thereon. The process includes the in situ transformation of a copper removal CMP composition, which is used to selectively remove and planarize copper, into a barrier removal CMP composition, which is used to selectively remove barrier layer material, on a single CMP platen pad.
摘要翻译： 化学机械抛光（CMP）组合物和用于从其上具有其的微电子器件衬底去除铜和阻挡层材料的单CMP压板工艺。 该方法包括将铜去除CMP组合物原位转化成单层CMP压板用于选择性去除阻挡层材料的屏障去除CMP组合物，其用于选择性地去除和平坦化铜。
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