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    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection
    3.
    发明申请
    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
    用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查

    公开(公告)号：US20060012873A1

    公开(公告)日：2006-01-19

    申请号：US10917626

    申请日：2004-08-13

    申请人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    发明人： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    IPC分类号： G02B21/06

    CPC分类号： G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

    摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.

    摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。 利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。 可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。

    Imaging system for an extreme ultraviolet (EUV) beam-based microscope
    7.
    发明授权
    Imaging system for an extreme ultraviolet (EUV) beam-based microscope 失效
    用于极紫外（EUV）光束显微镜的成像系统

    公开(公告)号：US06894837B2

    公开(公告)日：2005-05-17

    申请号：US10626130

    申请日：2003-07-24

    申请人： Hans-Juergen Dobschal ,  Thomas Scheruebl ,  Robert Brunner ,  Norbert Rosenkranz ,  Joern Greif-Wuestenbecker

    发明人： Hans-Juergen Dobschal ,  Thomas Scheruebl ,  Robert Brunner ,  Norbert Rosenkranz ,  Joern Greif-Wuestenbecker

    IPC分类号： G21K1/06 ,  G21K7/00 ,  G02B21/00

    CPC分类号： G21K1/06 ,  G21K7/00

    摘要： Imaging system for a microscope based on extreme ultraviolet (EUV) radiation. The present invention is directed to a reflective imaging system for an x-ray microscope for examining and object in an object plane, wherein the object is illuminated by rays of a wavelength of less than 100 nm, particularly less than 30 nm, and is imaged in a magnified manner in an image plane. In the imaging system, according to the invention, for a microscope based on extreme ultraviolet (EUV) radiation with wavelengths in the range of less than 100 nm, with a magnification of 0.1× to 1000× and a structural length of less than 5 m, at least one of the imaging optical elements 2 and 3 in the beam path has a diffractive-reflective structure which is arranged on a spherical or plane area and has a non-rotationally symmetric, asymmetric shape. The arrangement according to the invention provides an imaging system which avoids the disadvantages of the prior art and ensures a high imaging quality. The manufacturing cost remains reasonable due to the exclusive use of spherical mirrors.

    摘要翻译： 基于极紫外（EUV）辐射的显微镜成像系统。 本发明涉及一种用于检查和物体在物平面中的X射线显微镜的反射成像系统，其中物体被小于100nm，特别是小于30nm的波长的光照射，并被成像 在图像平面中以放大的方式。 在成像系统中，根据本发明，对于具有波长在小于100nm，具有0.1x至1000x的放大倍数和小于5μm的结构长度的基于极紫外（EUV）辐射的显微镜， 光束路径中的成像光学元件2和3中的至少一个具有布置在球形或平面区域上并具有非旋转对称的不对称形状的衍射反射结构。 根据本发明的装置提供了一种避免现有技术的缺点并确保高成像质量的成像系统。 由于专门使用球面镜，制造成本仍然是合理的。

    Imaging system for emulation of a high aperture scanning system
    8.
    发明授权
    Imaging system for emulation of a high aperture scanning system 有权
    用于高光圈扫描系统仿真的成像系统

    公开(公告)号：US07535640B2

    公开(公告)日：2009-05-19

    申请号：US10923551

    申请日：2004-08-20

    申请人： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    发明人： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    IPC分类号： G02B27/28

    CPC分类号： G03F7/70566 ,  G02B21/002 ,  G02B27/286 ,  G03F7/70666

    摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems is provided. The imaging system for emulating high-aperture scanner systems includes imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. It is possible to examine lithography masks for defects in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems Realistic images of the stepper systems can be generated by emulating the occurring vector effects.

    摘要翻译： 提供了一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈扫描仪系统的成像系统包括成像光学器件，检测器和评估单元，其中至少一个偏振有源光学元件根据需要在成像光束路径中布置以选择成像光束的不同偏振分量， 可以在成像光束路径中引入具有强度衰减功能的光学元件，由检测器接收掩模和/或样品的图像以用于不同偏振的光束分量，并被传送到评估单元进行进一步处理。 尽管结构越来越小，成像系统的图像侧数值孔径越来越高，可以检查光刻掩模的缺陷。可以通过仿真出现的矢量效应来生成步进系统的现实图像。

    Imaging system for emulation of a high aperture scanning system
    9.
    发明申请
    Imaging system for emulation of a high aperture scanning system 有权
    用于高光圈扫描系统仿真的成像系统

    公开(公告)号：US20060007541A1

    公开(公告)日：2006-01-12

    申请号：US10923551

    申请日：2004-08-20

    申请人： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    发明人： Michael Totzeck ,  Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    IPC分类号： G02B5/30

    CPC分类号： G03F7/70566 ,  G02B21/002 ,  G02B27/286 ,  G03F7/70666

    摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The imaging system, according to the invention, for emulating high-aperture scanner systems comprises imaging optics, a detector and an evaluating unit, wherein at least one polarization-active optical element is arranged as desired in the imaging beam path for selection of different polarization components of the imaging beam, an optical element with intensity attenuation function can be introduced in the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems by means of inspection microscopes with high magnifications. Realistic images of the stepper systems can be generated by emulating the occurring vector effects.

    摘要翻译： 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 根据本发明的用于模拟高光圈扫描器系统的成像系统包括成像光学器件，检测器和评估单元，其中至少一个偏振有源光学元件根据需要在成像光束路径中布置以选择不同的极化 成像光束的成分，具有强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或样品的图像由检测器接收以用于不同偏振的光束分量，并被传送到评估单元进行进一步处理 。 利用所提出的解决方案，可以通过借助于具有高放大率的检查显微镜，检查光刻掩模的缺陷，尽管结构越来越小，成像系统的图像侧数值孔径越来越高。 可以通过仿真出现的矢量效应来生成步进系统的现实图像。

    Method and device for analysing the imaging behavior of an optical imaging element
    10.
    发明授权
    Method and device for analysing the imaging behavior of an optical imaging element 有权
    用于分析光学成像元件的成像行为的方法和装置

    公开(公告)号：US07626689B2

    公开(公告)日：2009-12-01

    申请号：US12158403

    申请日：2006-12-15

    申请人： Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    发明人： Ulrich Stroessner ,  Joern Greif-Wuestenbecker

    IPC分类号： G01B9/00 ,  G01B11/00

    CPC分类号： G01M11/0285 ,  G03F7/705 ,  G03F7/70566 ,  G03F7/70591 ,  G03F7/7085

    摘要： A method for analyzing the imaging behavior of a first optical imaging element, in which an object is imaged by a second optical imaging element and light in the image plane is detected in a spatially resolved manner. The two optical imaging elements differ in at least one imaging characteristic. Values are determined for intensity and at least one second characteristic and then stored in image points, and processed in an emulation step. An emulation image is produced, taking into account the influence of the second characteristic. A series of images is produced by dividing a range of values of the second characteristic into subdomains, associating an image with each subdomain, and associating the corresponding intensity value with the image points of each image, in case the value of the second characteristic, associated with the image point, falls in the subdomain associated with the respective image.

    摘要翻译： 以空间分辨的方式检测第一光学成像元件的成像行为的方法，其中物体被第二光学成像元件成像，并且在图像平面中的光被检测。 两个光学成像元件在至少一个成像特征上不同。 根据强度和至少一个第二特性确定值，然后存储在图像点中，并在仿真步骤中进行处理。 考虑到第二特性的影响，产生仿真图像。 通过将第二特性的值的范围分为子域，将图像与每个子域相关联，并且将相应的强度值与每个图像的图像点相关联，产生一系列图像，在第二特征的值相关联的情况下 与图像点一起落在与相应图像相关联的子域中。