摘要:
In plasma activated chemical vapour deposition a plasma decomposition unit is used that is arranged in or connected to a vacuum vessel having a relatively low pressure or vacuum, to which an operating gas is provided. Periodically repeated voltage pulses are applied between the anode and the cathode of the plasma decomposition unit in such a manner that pulsed electric discharges are produced between the cathode and the surrounding anode of the plasma decomposition unit. The anode is arranged in a special way so that at least a portion thereof will obtain only an electrically conductive coating or substantially no coating when operating the unit. For that purpose, the anode includes a portion located in the direct vicinity of the free surface of the cathode. The portion is a flange or edge portion which is located or extends over margins of the free surface of the cathode. In that way, the anode will include a portion that is shielded for direct coating with particles from the plasma formed and that hence will obtain e.g. substantially no dielectric coating at all.
摘要:
In plasma activated chemical vapour deposition a plasma decomposition unit is used that is arranged in or connected to a vacuum vessel having a relatively low pressure or vacuum, to which an operating gas is provided. Periodically repeated voltage pulses are applied between the anode and the cathode of the plasma decomposition unit in such a manner that pulsed electric discharges are produced between the cathode and the surrounding anode of the plasma decomposition unit. The anode is arranged in a special way so that at least a portion thereof will obtain only an electrically conductive coating or substantially no coating when operating the unit. For that purpose, the anode includes a portion located in the direct vicinity of the free surface of the cathode. The portion is a flange or edge portion which is located or extends over margins of the free surface of the cathode. In that way, the anode will include a portion that is shielded for direct coating with particles from the plasma formed and that hence will obtain e.g. substantially no dielectric coating at all.
摘要:
A method for composite material synthesis at the surface of a work piece, wherein it includes PECVD, PEPVD methods and plasma generation by electric discharges with closed electron drift. The composite material comprises at least one layer of substantially parallel carbon pillars extending from the bottom surface of the at least one layer up to the top surface of the at least one layer. The carbon pillars have a cross-sectional dimension in the range of 50-200 μm, and heights in the range of 50 μm-2 mm.
摘要:
A composite, carbon based material that can be used for enhancing the dynamic stiffness of objects, in the case where it for instance is applied as a coating, comprises at least one layer of substantially parallel carbon pillars. The pillars extend from the bottom surface up to the top surface of the layer, substantially perpendicularly to said surfaces, have substantially hexagonal or pentagonal cross-sections and a relatively weak conical shape, their cross-section widening from their bottom ends to their top ends. The carbon based pillars can typically have a cross-sectional dimension in the range of 50-200 μm such as about 100 μm and have heights in the range of 50 μm-2 mm. The pillars can be seen as built from macro-sized aggregates that have at least one dimension in the nano range, e.g. in the range of 10-800 run, and include carbon, oxygen and hydrogen and in most cases also nitrogen. The material can be produced using PECVD, PEPVD methods and plasma generation by electric discharges with closed electron drift.