公开(公告)号：US5145812A

公开(公告)日：1992-09-08

申请号：US747488

申请日：1991-08-19

申请人： Mikiro Arai ,  Osamu Funayama ,  Hayato Nishii ,  Tamio Ishiyama ,  Hiroshi Kaya ,  Takeshi Isoda ,  Kouichi Yasuda ,  Atsuro Takazawa ,  Tadashi Suzuki ,  Ichiro Kohshi ,  Masaaki Ichiyama ,  Tomohiro Kato

发明人： Mikiro Arai ,  Osamu Funayama ,  Hayato Nishii ,  Tamio Ishiyama ,  Hiroshi Kaya ,  Takeshi Isoda ,  Kouichi Yasuda ,  Atsuro Takazawa ,  Tadashi Suzuki ,  Ichiro Kohshi ,  Masaaki Ichiyama ,  Tomohiro Kato

IPC分类号： C04B35/589 ,  C04B35/593 ,  C08G79/00

CPC分类号： C04B35/589 ,  C04B35/593 ,  C08G79/00

摘要： A molded body formed of a silicon nitride-based ceramic containing Si and N and optionally O, C and/or a metal. The ceramic is formed from a polysilazane. A molded body may be a composite body which is composed of a matrix of the ceramic and a reinforcing material such as powder or fiber embedded within the matrix or which is composed of ceramic powder bound with a binder formed of the silicon nitride-based ceramic.

摘要翻译： 由含有Si和N以及任选的O，C和/或金属的氮化硅基陶瓷形成的成型体。 陶瓷由聚硅氮烷形成。 成型体可以是由陶瓷基体和嵌入基体内的粉末或纤维等增强材料构成的复合体，或由与氮化硅系陶瓷形成的粘合剂结合的陶瓷粉末构成的复合体。

公开(公告)号：US5494978A

公开(公告)日：1996-02-27

申请号：US346845

申请日：1994-11-30

申请人： Yasuo Shimizu ,  Yuuji Tashiro ,  Hiroyuki Aoki ,  Masaaki Ichiyama ,  Hayato Nishii ,  Toshihide Kishi ,  Kouji Okuda ,  Takeshi Isoda

发明人： Yasuo Shimizu ,  Yuuji Tashiro ,  Hiroyuki Aoki ,  Masaaki Ichiyama ,  Hayato Nishii ,  Toshihide Kishi ,  Kouji Okuda ,  Takeshi Isoda

IPC分类号： C04B35/589 ,  C08G77/48 ,  C08G77/62 ,  C08F283/12

CPC分类号： C08G77/62 ,  C04B35/589

摘要： A stabilized polysilazane obtained by reacting an inorganic polysilazane having a number average molecular weight of about 100 to about 100,000 with an alcohol, an organic acid, an ester, a ketone, an aldehyde, a mercaptan, or an alkysilazane preferably at a molar ratio of from 50/50 to 99.99/0.01 is described.

摘要翻译： 将数均分子量为约100〜约100,000的无机聚硅氮烷与醇，有机酸，酯，酮，醛，硫醇或烷基硅氮烷反应得到的稳定化聚硅氮烷，优选摩尔比为 从50/50至99.99 / 0.01。

公开(公告)号：US20070259106A1

公开(公告)日：2007-11-08

申请号：US11629592

申请日：2005-08-12

申请人： Yasuo Shimizu ,  Masaaki Ichiyama ,  Teruno Nagura

发明人： Yasuo Shimizu ,  Masaaki Ichiyama ,  Teruno Nagura

IPC分类号： B32B9/00 ,  C09D183/16 ,  H01B3/46

CPC分类号： C08G77/62 ,  C08K5/56 ,  C09D183/16 ,  H01L21/02126 ,  H01L21/02145 ,  H01L21/02222 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/3125 ,  H01L21/316 ,  H01L21/3162 ,  C08L2666/52

摘要： There are provided a process for producing a siliceous film having excellent insulating properties, and a coating composition for use in the process. The coating composition comprises a perhydropolysilazane or modified perhydropolysilazane having a number average molecular weight of 100 to 50,000 and an aluminum compound, the composition having an aluminum content of not less than 10 ppb and not more than 100 ppm in terms of the molar ratio of the aluminum atom to the silicon atom. The siliceous film is produced by coating the coating composition onto a substrate and firing the coated substrate in an atmosphere containing steam, oxygen, or a mixed gas composed of steam and oxygen.

摘要翻译： 提供了一种制备具有优异绝缘性能的硅质膜的方法和用于该方法的涂料组合物。 涂料组合物包括数均分子量为100〜50,000的全氢聚硅氮烷或改性的全氢聚硅氮烷，铝化合物的铝含量为10ppb以上且100ppm以下，以 铝原子与硅原子。 通过将涂料组合物涂布在基材上并在包含蒸汽，氧气或由蒸汽和氧气组成的混合气体的气氛中焙烧涂覆的基材来制备硅质膜。

公开(公告)号：US20060160321A1

公开(公告)日：2006-07-20

申请号：US10548222

申请日：2004-03-03

申请人： Masaaki Ichiyama ,  Teruno Nagura ,  Tomonori Ishikawa ,  Takaaki Sakurai ,  Yasuo Shimizu

发明人： Masaaki Ichiyama ,  Teruno Nagura ,  Tomonori Ishikawa ,  Takaaki Sakurai ,  Yasuo Shimizu

IPC分类号： H01L21/76

CPC分类号： H01L21/76224

摘要： There is provided a method for trench isolation structure formation, which produces neither voids nor cracks within a groove. This method comprises the steps of: forming a groove on a surface of a silicon substrate; coating a polysilazane solution; prebaking the coating at a prebaking temperature regulated so that the temperature is raised in a temperature range of 50° C. to 400° C. over time; curing the coating at a temperature above the maximum prebaking temperature; and polishing and etching the film. The prebaking is carried out while raising the temperature either stepwise in two or more stages or in a monotonically increasing manner.

摘要翻译： 提供了一种用于沟槽隔离结构形成的方法，其在凹槽内既不产生空隙也不产生裂纹。 该方法包括以下步骤：在硅衬底的表面上形成沟槽; 涂覆聚硅氮烷溶液; 在预烘烤温度下预烘烤涂层，使温度在50℃至400℃的温度范围内随时间升高; 在高于最高预烘温度的温度下固化涂层; 并抛光和蚀刻该膜。 在两步或更多阶段或以单调增加的方式逐步升高温度的同时进行预烘烤。

公开(公告)号：US20080102211A1

公开(公告)日：2008-05-01

申请号：US11795100

申请日：2006-02-01

申请人： Hideki Matsuo ,  Masaaki Ichiyama ,  Tomonori Ishikawa ,  Hiroyuki Aoki ,  Bruce Kiker ,  Joseph Oberlander

发明人： Hideki Matsuo ,  Masaaki Ichiyama ,  Tomonori Ishikawa ,  Hiroyuki Aoki ,  Bruce Kiker ,  Joseph Oberlander

IPC分类号： B05D3/10 ,  C07C13/20 ,  C07C13/19 ,  C07D493/08 ,  C07C15/02

CPC分类号： H01L21/02087 ,  C09D7/20 ,  C09D183/16 ,  C11D7/24 ,  C11D7/26 ,  C11D7/50 ,  H01L21/02222

摘要： The present invention provides a polysilazane-treating solvent which has excellent dissolving power and stability, has no influence on a substrate as an underlying layer and the properties of a polysilazane, is excellent in shape of cut edge, and further has high safety to the human body. The treating solvent comprises a solvent selected from the group consisting of tetralin, p-menthane, p-cymene, α-pinene, 1,8-cineol, and mixtures thereof, and a polysilazane treatment method using the same. This solvent may further comprise a solvent selected from the group consisting of aliphatic hydrocarbons, alicyclic hydrocarbons, and mixtures thereof.

摘要翻译： 本发明提供了具有优异的溶解力和稳定性的聚硅氮烷处理溶剂，对作为下层的基材没有影响，聚硅氮烷的性质，切边的形状优异，对人的安全性更高 身体。 处理溶剂包括选自四氢化萘，对薄荷烷，对甲基异丙基苯，α-蒎烯，1,8-桉树脑及其混合物的溶剂，以及使用该溶剂的聚硅氮烷处理方法。 该溶剂还可以包含选自脂族烃，脂环族烃及其混合物的溶剂。