摘要:
Provided are a photomask, including: a substrate; an opaque pattern formed on the substrate and made of a material which does not penetrate light; a first dielectric layer formed on the substrate and the opaque pattern; and a negative refractive-index meta material layer formed on the first dielectric layer, in which a dispersion mode used in the photomask uses a Quasi bound mode, a manufacturing method of the photomask, and a manufacturing method of a substrate using the photomask.
摘要:
A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.
摘要:
Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.
摘要:
A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.
摘要:
Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.
摘要:
Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.
摘要:
A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.
摘要:
The present invention relates to a display device and a method of manufacturing the display device. The display device includes an insulation substrate, a gate conductor including a gate line and a gate electrode, an organic layer on the insulation substrate and the gate line, and a data conductor including a data line, a drain electrode, and a source electrode. The data line crosses the gate line. The gate electrode, the drain electrode, and the source electrode form a transistor, and a thickness of the gate electrode may be larger than a thickness of the gate line.
摘要:
The present invention discloses a cable-driven manipulator comprising an operating unit having a drive motor, and a pulley rotated by the drive motor. An upper arm is coupled, through a joint, to one side of the operating unit. A forearm coupled, through a joint, to the other side of the upper arm by the cable. A gripper of an end effector operably coupled to the forearm, a cable compensation device is installed between the upper arm and the forearm so as to maintain constant the length of the cable that transmits the power of the operating unit to the end effector during the pivoting of the forearm. It is thus possible to prevent the variation of tensile force due to the variation of the length of the cable for operating the end effector during the pivoting of the forearm or the unintended malfunction of the end effector.
摘要:
A system applicable to a bridge transporter telescopic servomanipulator, is provided. The bridge transporter telescopic servomanipulator is used for performing operation and maintenance of process equipments in a working environment having a possibility of radiation exposure. The system can be coupled/decoupled by including a coupling device in a telescopic transfer device and a servomanipulator, and can manipulate an ascending/descending device of the servomanipulator in a remote area without direct access by a worker. The coupling/decoupling device includes a first coupling plate and a second coupling plate, the first coupling plate being provided on a lower portion of the telescopic transfer device, and the second coupling plate being provided on an upper portion of the servomanipulator. While coupling protrusions are inserted into coupling holes being formed on the first coupling plate, position and orientation between a master servomanipulator and a slave servomanipulator correspond to each other, and the servomanipulator can be coupled with the telescopic transfer device since the coupling protrusions are fixed by rotating a rotation plate being provided on the second coupling plate.