Photomask including super lens and manufacturing method thereof
    2.
    发明授权
    Photomask including super lens and manufacturing method thereof 有权
    包含超级透镜的光掩模及其制造方法

    公开(公告)号:US08574792B2

    公开(公告)日:2013-11-05

    申请号:US13110024

    申请日:2011-05-18

    IPC分类号: G03F1/00

    CPC分类号: G03F1/50

    摘要: A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.

    摘要翻译: 光掩模包括基板,掩模图案层和超透镜。 基板包括包括突出部分和突出部分之间的开口部分的图案。 掩模图案层位于图案的开口部分并填充图案的开口部分。 超透镜位于基板和掩模图案层上。

    Mask for exposure and method of fabricating substrate using said mask
    3.
    发明授权
    Mask for exposure and method of fabricating substrate using said mask 有权
    用于曝光的掩模和使用所述掩模制造基底的方法

    公开(公告)号:US09005850B2

    公开(公告)日:2015-04-14

    申请号:US13471080

    申请日:2012-05-14

    IPC分类号: G03F1/32

    CPC分类号: G03F1/32

    摘要: Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.

    摘要翻译: 提供了一种能够在不更换或改变曝光器的情况下形成超出曝光机的临界分辨率的精细图案的光刻掩模。 掩模包括至少部分吸光相移层并使用复合波长光源。

    Method for forming pattern and method for manufacturing display device by using the same
    4.
    发明授权
    Method for forming pattern and method for manufacturing display device by using the same 有权
    用于形成图案的方法和使用该显示装置的方法

    公开(公告)号:US08895439B2

    公开(公告)日:2014-11-25

    申请号:US13486858

    申请日:2012-06-01

    IPC分类号: H01L21/00 G03F7/20

    摘要: A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.

    摘要翻译: 通过使用遮光部和光透射部的间隔比为2CD:1CD的曝光掩模,首先使光致抗蚀剂曝光,形成图案的宽度和间隔为1CD的微细曝光图案的方法, 4CD:1CD,然后在曝光掩模以预定间隔移动之后第二次曝光光致抗蚀剂,或者通过使用形成在光透射部分以预定间隔移动的位置处的曝光掩模来第二次曝光光致抗蚀剂, 光致抗蚀剂,使得可以形成具有像素电极的显示装置,该像素电极包括具有比曝光装置的分辨率更小的宽度和间隔的多个细分支电极。

    Display device and method of manufacturing the same
    6.
    发明授权
    Display device and method of manufacturing the same 有权
    显示装置及其制造方法

    公开(公告)号:US09224763B2

    公开(公告)日:2015-12-29

    申请号:US13211360

    申请日:2011-08-17

    IPC分类号: H01L33/50 H01L27/12 H01L27/32

    摘要: Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.

    摘要翻译: 提供了显示装置和显示装置的制造方法。 显示装置包括经受一次预处理的基板; 形成在基板上并进行二次预处理的导体; 以及形成在所述基板和所述导体上的绝缘层,其中对所述第一基板的表面能进行高于第一参考值的所述初步预处理,并且对于所述导体的表面能进行二次预处理,所述表面能低于第二基准 参考值。

    Display device and method for manufacturing the same
    8.
    发明授权
    Display device and method for manufacturing the same 有权
    显示装置及其制造方法

    公开(公告)号:US08866198B2

    公开(公告)日:2014-10-21

    申请号:US13103615

    申请日:2011-05-09

    IPC分类号: H01L27/12

    CPC分类号: G02F1/1368 G02F1/136286

    摘要: The present invention relates to a display device and a method of manufacturing the display device. The display device includes an insulation substrate, a gate conductor including a gate line and a gate electrode, an organic layer on the insulation substrate and the gate line, and a data conductor including a data line, a drain electrode, and a source electrode. The data line crosses the gate line. The gate electrode, the drain electrode, and the source electrode form a transistor, and a thickness of the gate electrode may be larger than a thickness of the gate line.

    摘要翻译: 本发明涉及一种显示装置及其制造方法。 显示装置包括绝缘基板,包括栅极线和栅电极的栅极导体,绝缘基板上的有机层和栅极线,以及包括数据线,漏极和源电极的数据导体。 数据线穿过栅极线。 栅电极,漏电极和源电极形成晶体管,栅电极的厚度可以大于栅极线的厚度。

    CABLE-DRIVEN MANIPULATOR
    9.
    发明申请
    CABLE-DRIVEN MANIPULATOR 有权
    电缆驱动操纵器

    公开(公告)号:US20090148263A1

    公开(公告)日:2009-06-11

    申请号:US12328792

    申请日:2008-12-05

    IPC分类号: B66C3/14 B66C3/06

    CPC分类号: B25J9/1045 Y10T74/20323

    摘要: The present invention discloses a cable-driven manipulator comprising an operating unit having a drive motor, and a pulley rotated by the drive motor. An upper arm is coupled, through a joint, to one side of the operating unit. A forearm coupled, through a joint, to the other side of the upper arm by the cable. A gripper of an end effector operably coupled to the forearm, a cable compensation device is installed between the upper arm and the forearm so as to maintain constant the length of the cable that transmits the power of the operating unit to the end effector during the pivoting of the forearm. It is thus possible to prevent the variation of tensile force due to the variation of the length of the cable for operating the end effector during the pivoting of the forearm or the unintended malfunction of the end effector.

    摘要翻译: 本发明公开了一种电缆驱动的操纵器,其包括具有驱动马达的操作单元和由驱动马达旋转的滑轮。 上臂通过接头联接到操作单元的一侧。 前臂通过电缆连接到上臂的另一侧。 可操作地联接到前臂的末端执行器的夹持器,电缆补偿装置安装在上臂和前臂之间,以便在枢转期间保持将操作单元的动力传递到末端执行器的电缆的长度恒定 的前臂。 因此,可以防止在前臂枢转期间用于操作末端执行器的电缆的长度变化引起的拉力的变化或端部执行器的意外故障。

    Telescopic servomanipulator coupling/decoupling apparatus
    10.
    发明授权
    Telescopic servomanipulator coupling/decoupling apparatus 有权
    伸缩式伺服器耦合/解耦装置

    公开(公告)号:US07794171B2

    公开(公告)日:2010-09-14

    申请号:US11819654

    申请日:2007-06-28

    IPC分类号: F16D1/00

    摘要: A system applicable to a bridge transporter telescopic servomanipulator, is provided. The bridge transporter telescopic servomanipulator is used for performing operation and maintenance of process equipments in a working environment having a possibility of radiation exposure. The system can be coupled/decoupled by including a coupling device in a telescopic transfer device and a servomanipulator, and can manipulate an ascending/descending device of the servomanipulator in a remote area without direct access by a worker. The coupling/decoupling device includes a first coupling plate and a second coupling plate, the first coupling plate being provided on a lower portion of the telescopic transfer device, and the second coupling plate being provided on an upper portion of the servomanipulator. While coupling protrusions are inserted into coupling holes being formed on the first coupling plate, position and orientation between a master servomanipulator and a slave servomanipulator correspond to each other, and the servomanipulator can be coupled with the telescopic transfer device since the coupling protrusions are fixed by rotating a rotation plate being provided on the second coupling plate.

    摘要翻译: 提供了一种适用于桥式运输机伸缩式伺服机械手的系统。 桥式运输机伸缩式伺服操纵器用于在具有辐射可能性的工作环境中对工艺设备进行操作和维护。 该系统可以通过在伸缩式传送装置和伺服操纵器中包括耦合装置来耦合/解耦,并且可以在远程区域中操纵伺服操纵器的上升/下降装置,而无需工作人员直接访问。 联接/解耦装置包括第一联接板和第二联接板,第一联接板设置在伸缩传送装置的下部,第二联接板设置在伺服操纵器的上部。 当联接突起插入到形成在第一联接板上的联接孔中时,主伺服操纵器和从动伺服操纵器之间的位置和方向彼此对应,并且伺服操纵器可以与伸缩传送装置联接,因为联接突起被 旋转设置在第二联接板上的旋转板。