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48 条记录 (耗时 0.023 秒)

    Photomask including super lens and manufacturing method thereof
    2.
    发明授权
    Photomask including super lens and manufacturing method thereof 有权
    包含超级透镜的光掩模及其制造方法

    公开(公告)号：US08574792B2

    公开(公告)日：2013-11-05

    申请号：US13110024

    申请日：2011-05-18

    申请人： Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hyang-Shik Kong

    发明人： Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hyang-Shik Kong

    IPC分类号： G03F1/00

    CPC分类号： G03F1/50

    摘要： A photomask includes a substrate, a mask pattern layer and a super lens. The substrate includes a pattern which includes protruding portions, and open portions between the protruding portions. The mask pattern layer is in the open portions of the pattern and fills the open portions of the pattern. The super lens is on the substrate and the mask pattern layer.

    摘要翻译： 光掩模包括基板，掩模图案层和超透镜。 基板包括包括突出部分和突出部分之间的开口部分的图案。 掩模图案层位于图案的开口部分并填充图案的开口部分。 超透镜位于基板和掩模图案层上。

    Display device and method for manufacturing the same
    4.
    发明授权
    Display device and method for manufacturing the same 有权
    显示装置及其制造方法

    公开(公告)号：US08866198B2

    公开(公告)日：2014-10-21

    申请号：US13103615

    申请日：2011-05-09

    申请人： Min Kang ,  Jin Ho Ju ,  Jong Kwang Lee

    发明人： Min Kang ,  Jin Ho Ju ,  Jong Kwang Lee

    IPC分类号： H01L27/12

    CPC分类号： G02F1/1368 ,  G02F1/136286

    摘要： The present invention relates to a display device and a method of manufacturing the display device. The display device includes an insulation substrate, a gate conductor including a gate line and a gate electrode, an organic layer on the insulation substrate and the gate line, and a data conductor including a data line, a drain electrode, and a source electrode. The data line crosses the gate line. The gate electrode, the drain electrode, and the source electrode form a transistor, and a thickness of the gate electrode may be larger than a thickness of the gate line.

    摘要翻译： 本发明涉及一种显示装置及其制造方法。 显示装置包括绝缘基板，包括栅极线和栅电极的栅极导体，绝缘基板上的有机层和栅极线，以及包括数据线，漏极和源电极的数据导体。 数据线穿过栅极线。 栅电极，漏电极和源电极形成晶体管，栅电极的厚度可以大于栅极线的厚度。

    Display device and method of manufacturing the same
    5.
    发明授权
    Display device and method of manufacturing the same 有权
    显示装置及其制造方法

    公开(公告)号：US09224763B2

    公开(公告)日：2015-12-29

    申请号：US13211360

    申请日：2011-08-17

    申请人： Min Kang ,  Jong Kwang Lee ,  Sang Hee Jang ,  Jin Ho Ju

    发明人： Min Kang ,  Jong Kwang Lee ,  Sang Hee Jang ,  Jin Ho Ju

    IPC分类号： H01L33/50 ,  H01L27/12 ,  H01L27/32

    CPC分类号： H01L27/1248 ,  H01L27/1218 ,  H01L27/1262 ,  H01L27/3279

    摘要： Provided are a display device and a method of manufacturing of the display device. The display device includes a substrate subjected to a primary preprocess; a conductor formed on the substrate and subjected to a secondary preprocess; and an insulating layer formed on the substrate and the conductor, in which the primary preprocess is performed for a surface energy of the first substrate higher than a first reference value and the secondary preprocess is performed for a surface energy of the conductor lower than a second reference value.

    摘要翻译： 提供了显示装置和显示装置的制造方法。 显示装置包括经受一次预处理的基板; 形成在基板上并进行二次预处理的导体; 以及形成在所述基板和所述导体上的绝缘层，其中对所述第一基板的表面能进行高于第一参考值的所述初步预处理，并且对于所述导体的表面能进行二次预处理，所述表面能低于第二基准 参考值。

    Mask for exposure and method of fabricating substrate using said mask
    6.
    发明授权
    Mask for exposure and method of fabricating substrate using said mask 有权
    用于曝光的掩模和使用所述掩模制造基底的方法

    公开(公告)号：US09005850B2

    公开(公告)日：2015-04-14

    申请号：US13471080

    申请日：2012-05-14

    申请人： Bong-Yeon Kim ,  Min Kang ,  Jong Kwang Lee ,  Jin Ho Ju

    发明人： Bong-Yeon Kim ,  Min Kang ,  Jong Kwang Lee ,  Jin Ho Ju

    IPC分类号： G03F1/32

    CPC分类号： G03F1/32

    摘要： Provided is a photolithography mask capable of forming fine patterns beyond a critical resolution of an exposer without replacing or changing the exposer. The mask includes an at least partially light absorbing phase shift layer and uses a complex wavelength light source.

    摘要翻译： 提供了一种能够在不更换或改变曝光器的情况下形成超出曝光机的临界分辨率的精细图案的光刻掩模。 掩模包括至少部分吸光相移层并使用复合波长光源。

    Method for forming pattern and method for manufacturing display device by using the same
    7.
    发明授权
    Method for forming pattern and method for manufacturing display device by using the same 有权
    用于形成图案的方法和使用该显示装置的方法

    公开(公告)号：US08895439B2

    公开(公告)日：2014-11-25

    申请号：US13486858

    申请日：2012-06-01

    申请人： Woo-Seok Jeon ,  Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hoon Kang ,  Seung Bo Shim ,  Gwui-Hyun Park ,  Bong-Yeon Kim ,  Seon-II Kim

    发明人： Woo-Seok Jeon ,  Jong Kwang Lee ,  Jin Ho Ju ,  Min Kang ,  Hoon Kang ,  Seung Bo Shim ,  Gwui-Hyun Park ,  Bong-Yeon Kim ,  Seon-II Kim

    IPC分类号： H01L21/00 ,  G03F7/20

    CPC分类号： G03F7/203 ,  G03F7/20 ,  G03F7/70466 ,  Y10S438/942

    摘要： A method for forming a fine exposure pattern where a width and an interval of the pattern are each 1CD, by first exposing a photoresist by using an exposure mask where an interval ratio of a light shielding part and a light transmission part is 2CD:1CD to 4CD:1CD, and then second exposing the photoresist after the exposure mask is shifted at a predetermined interval, or second exposing the photoresist by using an exposure mask formed at a position where a light transmission part is shifted at a predetermined interval, and developing the photoresist, such that it is possible to form a display device having a pixel electrode including a plurality of fine branch electrodes having a smaller width and interval than a resolution of an exposure apparatus.

    摘要翻译： 通过使用遮光部和光透射部的间隔比为2CD:1CD的曝光掩模，首先使光致抗蚀剂曝光，形成图案的宽度和间隔为1CD的微细曝光图案的方法， 4CD：1CD，然后在曝光掩模以预定间隔移动之后第二次曝光光致抗蚀剂，或者通过使用形成在光透射部分以预定间隔移动的位置处的曝光掩模来第二次曝光光致抗蚀剂， 光致抗蚀剂，使得可以形成具有像素电极的显示装置，该像素电极包括具有比曝光装置的分辨率更小的宽度和间隔的多个细分支电极。

    PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME
    9.
    发明申请
    PHOTORESIST COMPOSITION AND METHOD OF FORMING A FINE PATTERN USING THE SAME 审中-公开
    光刻胶组合物和使用其形成微细图案的方法

    公开(公告)号：US20130048604A1

    公开(公告)日：2013-02-28

    申请号：US13568233

    申请日：2012-08-07

    申请人： Min Kang ,  Jin-Ho Ju ,  Jong-Kwang Lee ,  Bong-Yeon Kim ,  Jeong-Won Kim ,  Deok-Man Kang ,  Jung-Hwan Cho ,  Kyung-Mi Choi

    发明人： Min Kang ,  Jin-Ho Ju ,  Jong-Kwang Lee ,  Bong-Yeon Kim ,  Jeong-Won Kim ,  Deok-Man Kang ,  Jung-Hwan Cho ,  Kyung-Mi Choi

    IPC分类号： G03F7/004 ,  B44C1/22 ,  G03F7/022 ,  G03F7/027 ,  G03F7/016

    CPC分类号： G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/11

    摘要： A photoresist composition includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and the remainder includes an organic solvent. Also provided is a method of forming a fine pattern including forming a thin film on a substrate; forming a photoresist pattern by using a photoresist composition that includes from about 20% to about 50% by weight of a polymer, from about 0.5% to about 1.5% by weight of a photo-acid generator, from about 0.01% to about 0.5% by weight of a photo absorber and a remainder comprising an organic solvent; and patterning the thin film by using the photoresist pattern as an etch-stop layer to form a fine pattern.

    摘要翻译： 光致抗蚀剂组合物包括约20重量％至约50重量％的聚合物，约0.5重量％至约1.5重量％的光酸产生剂，约0.01重量％至约0.5重量％的光吸收剂， 剩余部分包括有机溶剂。 还提供了形成包括在基板上形成薄膜的精细图案的方法; 通过使用光致抗蚀剂组合物形成光致抗蚀剂图案，所述光致抗蚀剂组合物包含约20重量％至约50重量％的聚合物，约0.5重量％至约1.5重量％的光酸产生剂，约0.01重量％至约0.5重量％ 的光吸收剂，余量包含有机溶剂; 并通过使用光致抗蚀剂图案作为蚀刻停止层来图案化薄膜以形成精细图案。

    Array substrate and method of manufacturing the same
    10.
    发明授权
    Array substrate and method of manufacturing the same 有权
    阵列基板及其制造方法

    公开(公告)号：US08071406B2

    公开(公告)日：2011-12-06

    申请号：US12425744

    申请日：2009-04-17

    申请人： Sang-Ki Kwak ,  Min Kang ,  Se-Ah Kwon ,  Hyang-Shik Kong ,  Byung-Duk Yang ,  Sang-Hun Lee ,  Gwan-Soo Kim ,  Yui-Ku Lee

    发明人： Sang-Ki Kwak ,  Min Kang ,  Se-Ah Kwon ,  Hyang-Shik Kong ,  Byung-Duk Yang ,  Sang-Hun Lee ,  Gwan-Soo Kim ,  Yui-Ku Lee

    IPC分类号： H01L21/00

    CPC分类号： G02F1/136227 ,  G02F1/133512 ,  G02F1/13394 ,  G02F2001/133388 ,  G02F2001/136222 ,  H01L27/1288

    摘要： An array substrate includes a substrate including a display area and a peripheral area surrounding the display area, a transistor layer formed in the display area of the substrate and electrically connected to a gate line and a data line, a color filter formed in a pixel region on the transistor layer, a first light blocking member disposed between adjacent color filters, a first transparent member formed on the first light blocking member to cover the first light blocking member, a first color pattern formed in a peripheral area of the substrate and including substantially the same material as the color filter, and a second transparent member including substantially the same material as the first transparent member. The second transparent member is disposed in the peripheral area of the substrate to cover the first color pattern.

    摘要翻译： 阵列基板包括：基板，包括显示区域和围绕显示区域的外围区域;晶体管层，形成在基板的显示区域中，并且电连接到栅极线和数据线;滤色器，形成在像素区域中 在所述晶体管层上，设置在相邻滤色器之间的第一遮光构件，形成在所述第一遮光构件上以覆盖所述第一遮光构件的第一透明构件，形成在所述基板的周边区域中的第一颜色图案， 与滤色器相同的材料，以及包括与第一透明构件基本相同的材料的第二透明构件。 第二透明构件设置在基板的周边区域中以覆盖第一颜色图案。