摘要:
According to an embodiment of the present invention, a method of determining or adjusting the sensitivity of a biosensor arrangement comprising at least one field effect biosensor is provided, each of the at least one field effect biosensor comprising: a semiconductor substrate comprising a source region, a drain region and a channel region disposed between the source region and the drain region; a gate isolation layer covering the channel region; and a reference electrode disposed over the gate isolation layer such that a electrolytic solution to be sensed can be provided between the reference electrode and the gate isolation layer. The method comprises the following processes carried out for each field effect biosensor: providing an electrolytic solution between the reference electrode and the gate isolation layer; applying a source/drain voltage between the source region and the drain region; varying a reference voltage supplied to the reference electrode over a voltage range; measuring a resulting drain current while varying the reference voltage in order to obtain a corresponding drain current function; and determining the sensitivity of the field effect biosensor based on the reference voltage supplied to the reference electrode and the corresponding drain current function.
摘要:
According to an embodiment of the present invention, a method of determining or adjusting the sensitivity of a biosensor arrangement comprising at least one field effect biosensor is provided, each of the at least one field effect biosensor comprising: a semiconductor substrate comprising a source region, a drain region and a channel region disposed between the source region and the drain region; a gate isolation layer covering the channel region; and a reference electrode disposed over the gate isolation layer such that a electrolytic solution to be sensed can be provided between the reference electrode and the gate isolation layer. The method comprises the following processes carried out for each field effect biosensor: providing an electrolytic solution between the reference electrode and the gate isolation layer; applying a source/drain voltage between the source region and the drain region; varying a reference voltage supplied to the reference electrode over a voltage range; measuring a resulting drain current while varying the reference voltage in order to obtain a corresponding drain current function; and determining the sensitivity of the field effect biosensor based on the reference voltage supplied to the reference electrode and the corresponding drain current function.
摘要:
A method of forming a tungsten film on a surface of an object to be processed in a vessel capable of being vacuumized, includes the steps of forming a tungsten film by alternately repeating a reduction gas supplying process for supplying a reduction gas and a tungsten gas supplying process for supplying a tungsten-containing gas with an intervening purge process therebetween for supplying an inert gas while vacuumizing the vessel. A reduction gas supplying period of a reduction gas supplying process among the repeated reduction gas supplying processes is set to be longer than that of the remaining reduction gas supplying processes.
摘要:
A method of forming a tungsten film, capable of restricting voids and volcanoes as large as adversely affecting characteristics despite the small diameter of a buried hole, and providing good burying characteristics. When forming a tungsten film on the surface of an object of treating (W) in a vacuumizing-enabled treating vessel (22), a reduction gas supplying process 70 and a tungsten gas supplying process 72 for supplying a tungsten-containing gas are alternately repeated with a purge process 74, for supplying an inert gas while vacuumizing, intervened therebetween to thereby form an initial tungsten film 76. Therefore, an initial tungsten film can be formed as a nucleation layer high in film thickness uniformity; and, accordingly, when main tungsten films are subsequently deposited, it is possible to restrict voids and volcanoes as large as adversely affecting characteristics despite the small diameter of a buried hole, and provide good burying characteristics.
摘要:
Embodiments provide a cooling device. The cooling device comprises a container configured as a heat sink. The container is at least partially made from heat conducting material. The cooling device further comprises endothermic chemical material which is contained in the container.
摘要:
The present invention discloses a process for the production of a transparent rubber-modified monovinylidene aromatic resin. The rubber-modified monovinylidene aromatic resin comprises: a dispersed rubber particle (A) and a continuous phase matrix copolymer (B). The surface of the molding has a maximum height difference (ΔHmax) of less than 3,200 Å, and an average height difference (ΔHave) of less than 2,000 Å when measured with a surface profiler. The average ratios of major diameter to minor diameter of said rubber particles before and after annealing at 120° C. for 40 minutes are A1 and A2 respectively, and the ratio of A1/A2 ranges form 1.08 to 2.35.
摘要翻译:本发明公开了一种透明橡胶改性单亚乙烯基芳族树脂的制造方法。 橡胶改性的单亚乙烯基芳族树脂包括:分散的橡胶颗粒(A)和连续相基质共聚物(B)。 当用表面轮廓仪测量时,模制件的表面具有小于3,200Å的最大高差(DeltaHmax)和小于2000Å的平均高差(DeltaHave)。 在120℃退火40分钟之前和之后,所述橡胶颗粒的长径与小直径的平均比分别为A 1和A 2,A 1 / A 2的比例范围为1.08至2.35。
摘要:
A low voltage triggering silicon controlled rectifier (LVTSCR) is disclosed. The LVTSCR utilizes an added resistor disposed in a second doped region between the anode of the LVTSCR and the emitter of the parasitical bipolar PNP transistor to increase the holding voltage thereof when the LVTSCR is triggered. The LVTSCR includes a semiconductor substrate with a first conductive type and a gate. The semiconductor substrate includes a first doped region with a second conductive type, a second doped region with the first conductive type, a third doped region with the second conductive type, a fourth doped region with the second conductive type and a fifth doped region with the first conductive type. The gate is applied with a lower triggering voltage to trigger the LVTSCR.