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    Optical switch
    3.
    发明申请
    Optical switch 失效
    光开关

    公开(公告)号：US20070253045A1

    公开(公告)日：2007-11-01

    申请号：US11789771

    申请日：2007-04-24

    申请人： Yoshichika Kato ,  Yoshihiko Hamada ,  Keiichi Mori ,  Osamu Imaki ,  Kenji Kondou

    发明人： Yoshichika Kato ,  Yoshihiko Hamada ,  Keiichi Mori ,  Osamu Imaki ,  Kenji Kondou

    IPC分类号： G02B26/08

    CPC分类号： G02B6/3514 ,  G02B6/3518 ,  G02B6/352 ,  G02B6/355 ,  G02B6/357 ,  G02B6/3584

    摘要： An optical switch, wherein the first and second output ports (optical fibers) are disposed on the opposite sides of the input port (optical fiber) so as to form acute angles with respect to the input port, the input port and the first output port are optically coupled to each other through a first mirror surface, and the input port and the second output port are optically coupled to each other through a second mirror surface. The incident angles of an incident light beam with respect to the mirror surfaces are equalized, and optical path lengths between the input port and the first and second output ports are equalized. The actuator inserts and withdraws the second mirror surface on a position at the front of the first mirror surface.

    摘要翻译： 一种光开关，其中第一和第二输出端口（光纤）设置在输入端口（光纤）的相对侧上，以便相对于输入端口，输入端口和第一输出端口形成锐角 通过第一镜面彼此光学耦合，并且输入端口和第二输出端口通过第二镜面彼此光学耦合。 入射光束相对于镜面的入射角度相等，输入端口与第一和第二输出端口之间的光程长度相等。 致动器在第一镜面前部的位置处插入和撤回第二镜面。

    Optical switch
    4.
    发明申请
    Optical switch 有权
    光开关

    公开(公告)号：US20070086698A1

    公开(公告)日：2007-04-19

    申请号：US11580599

    申请日：2006-10-13

    申请人： Yoshichika Kato ,  Keiichi Mori ,  Kenji Kondou ,  Osamu Imaki ,  Yoshihiko Hamada

    发明人： Yoshichika Kato ,  Keiichi Mori ,  Kenji Kondou ,  Osamu Imaki ,  Yoshihiko Hamada

    IPC分类号： G02B6/26 ,  G02B6/42

    CPC分类号： G02B6/352 ,  G02B6/3514 ,  G02B6/355 ,  G02B6/357 ,  G02B6/358 ,  G02B26/0841

    摘要： The end parts of three optical waveguide parts are supported, mutually in parallel, on a substrate, the end part of the center optical waveguide part being one input port and the end parts of other two optical waveguide parts being a first and a second output port, the emitted light from the input port is switched, by means of a first moving mirror and a second moving mirror which are switchingly inserted into positions having the same distance from the end face of the input port, to either the first output port side or the second output port side, the light from the first moving mirror and the light from the second moving mirror being reflected respectively in a first fixed mirror or a second fixed mirror, the light being respectively coupled to the first or the second output port.

    摘要翻译： 三个光波导部分的端部相互并联地支撑在基板上，中心光波导部分的端部是一个输入端口，另外两个光波导部分的端部是第一和第二输出端口 通过第一移动反射镜和第二移动反射镜将来自输入端口的发射光切换到与输入端口的端面相同距离的位置切换到第一输出端口侧或第二输入端口侧 第二输出端口侧，来自第一移动镜的光和来自第二移动镜的光分别被反射在第一固定镜或第二固定镜中，所述光分别耦合到第一输出端口或第二输出端口。

    Micro-optic device and method of manufacturing same
    5.
    发明申请
    Micro-optic device and method of manufacturing same 失效
    微光器件及其制造方法

    公开(公告)号：US20050069246A1

    公开(公告)日：2005-03-31

    申请号：US10942583

    申请日：2004-09-16

    申请人： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    发明人： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    IPC分类号： B81B3/00 ,  B81C1/00 ,  G02B6/35 ,  G02B26/08 ,  G02B6/26

    CPC分类号： G02B6/3584 ,  B81B3/0083 ,  B81B2201/045 ,  B81C1/00182 ,  G02B6/122 ,  G02B6/136 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/357 ,  G02B6/3596 ,  G02B26/0841

    摘要： A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constructed as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 μm/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.

    摘要翻译： 制造包括复杂结构的微光学装置和可移动反射镜以缩短的时间来制造。 硅衬底和介于其间的二氧化硅中间层的单晶硅器件层限定了其上形成有掩模材料层的衬底并且被图案化以形成具有与所需光学器件的配置相同的图案的掩模 如平面图所示。 要被构造为镜面的表面被选择为在硅晶体的平面内。 使用掩模，通过反应离子干蚀刻垂直蚀刻器件层，直到中间层露出。 随后，使用KOH溶液，对晶体取向进行各向异性的湿式蚀刻，以10分钟左右的时间间隔进行蚀刻速度为0.1μm/分钟左右的蚀刻速度， 镜子变成光滑的结晶表面。 随后，中间层选择性地进行湿式蚀刻，仅在位于光学器件的可移动部分下方的区域中除去中间层。

    Method of manufacturing micro-optic device
    8.
    发明申请
    Method of manufacturing micro-optic device 失效
    微光器件制造方法

    公开(公告)号：US20090004765A1

    公开(公告)日：2009-01-01

    申请号：US12070931

    申请日：2008-02-22

    申请人： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    发明人： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    IPC分类号： H01L21/02

    CPC分类号： G02B6/3584 ,  B81B3/0083 ,  B81B2201/045 ,  B81C1/00182 ,  G02B6/122 ,  G02B6/136 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/357 ,  G02B6/3596 ,  G02B26/0841

    摘要： A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constricted as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 μm/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.

    摘要翻译： 制造包括复杂结构的微光学装置和可移动反射镜以缩短的时间来制造。 硅衬底和介于其间的二氧化硅中间层的单晶硅器件层限定了其上形成有掩模材料层的衬底并且被图案化以形成具有与所需光学器件的配置相同的图案的掩模 如平面图所示。 要被收缩成为镜面的表面被选择在硅晶体的平面内。 使用掩模，通过反应离子干蚀刻垂直蚀刻器件层，直到中间层露出。 随后，使用KOH溶液，对晶体取向进行各向异性的湿式蚀刻，以10分钟左右的时间间隔进行蚀刻速度为0.1μm/分钟左右的蚀刻速度， 镜子变成光滑的结晶表面。 随后，中间层选择性地进行湿式蚀刻，仅在位于光学器件的可移动部分下方的区域中除去中间层。

    Method of forming an optical fiber
    9.
    发明申请
    Method of forming an optical fiber 失效
    形成光纤的方法

    公开(公告)号：US20090003773A1

    公开(公告)日：2009-01-01

    申请号：US12231392

    申请日：2008-09-02

    申请人： Osamu Imaki ,  Yoshihiko Hamada ,  Yoshichika Kato ,  Keiichi Mori ,  Kenji Kondou

    发明人： Osamu Imaki ,  Yoshihiko Hamada ,  Yoshichika Kato ,  Keiichi Mori ,  Kenji Kondou

    IPC分类号： G02B6/36 ,  C03B37/16

    CPC分类号： G02B6/3652 ,  G02B6/3636 ,  G02B6/3692 ,  Y10T225/321

    摘要： Marker grooves of an optical fiber are formed by a marker groove forming device including at least, on a substrate, a fiber guide and optical fiber pressing springs formed on a side wall surface in the fiber guide. The optical fiber pressing springs include edges contacted and pressed to the side of an optical fiber stored in the fiber guide, and plate springs for pressing the edges to the side of the optical fiber with fulcra on the side wall surface in the fiber guide. The optical fiber is pressed to a side wall surface in the fiber guide, and the edges are formed at a predetermined distance from each other.

    摘要翻译： 光纤的标记槽由标记槽形成装置形成，标记槽形成装置至少包括在基板上，纤维引导件和形成在光纤引导件的侧壁表面上的光纤按压弹簧。 光纤按压弹簧包括接触并压在存储在光纤引导器中的光纤的一侧的边缘，以及用于在光纤引导件的侧壁表面上用光束将边缘压向光纤侧面的板簧。 光纤被压到纤维引导件中的侧壁表面，并且边缘彼此以预定的距离形成。

    Micro-optic device and method of manufacturing same
    10.
    发明授权
    Micro-optic device and method of manufacturing same 失效
    微光器件及其制造方法

    公开(公告)号：US07515783B2

    公开(公告)日：2009-04-07

    申请号：US10942583

    申请日：2004-09-16

    申请人： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    发明人： Yoshichika Kato ,  Satoshi Yoshida ,  Keiichi Mori ,  Kenji Kondou ,  Yoshihiko Hamada ,  Osamu Imaki

    IPC分类号： G02B6/26

    CPC分类号： G02B6/3584 ,  B81B3/0083 ,  B81B2201/045 ,  B81C1/00182 ,  G02B6/122 ,  G02B6/136 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3546 ,  G02B6/357 ,  G02B6/3596 ,  G02B26/0841

    摘要： A micro-optic device including a complicate structure and a movable mirror is made to be manufactured in a reduced length of time. A silicon substrate and a single crystal silicon device layer with an intermediate layer of silicon dioxide interposed therebetween defines a substrate on which a layer of mask material is formed and is patterned to form a mask having the same pattern as the configuration of the intended optical device as viewed in plan view. A surface which is to be constructed as a mirror surface is chosen to be in a plane of the silicon crystal. Using the mask, the device layer is vertically etched by a reactive ion dry etching until the intermediate layer is exposed. Subsequently, using KOH solution, a wet etching which is anisotropic to the crystallographic orientation is performed with an etching rate which is on the order of 0.1 μm/min for a time interval on the order of ten minutes is performed to convert the sidewall surface of the mirror into a smooth crystallographic surface. Subsequently, the intermediate layer is selectively subject to a wet etching to remove the intermediate layer only in an area located below the movable part of the optical device.

    摘要翻译： 制造包括复杂结构的微光学装置和可移动反射镜以缩短的时间来制造。 硅衬底和介于其间的二氧化硅中间层的单晶硅器件层限定了其上形成有掩模材料层的衬底并且被图案化以形成具有与所需光学器件的配置相同的图案的掩模 如平面图所示。 要被构造为镜面的表面被选择为在硅晶体的平面内。 使用掩模，通过反应离子干蚀刻垂直蚀刻器件层，直到中间层露出。 随后，使用KOH溶液，对晶体取向进行各向异性的湿式蚀刻，以10分钟左右的时间间隔进行蚀刻速度为0.1μm/分钟左右的蚀刻速度， 镜子变成光滑的结晶表面。 随后，中间层选择性地进行湿式蚀刻，仅在位于光学器件的可移动部分下方的区域中除去中间层。