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    Substrate processing apparatus and substrate processing method
    5.
    发明授权
    Substrate processing apparatus and substrate processing method 有权
    基板加工装置及基板处理方法

    公开(公告)号：US08815048B2

    公开(公告)日：2014-08-26

    申请号：US11853231

    申请日：2007-09-11

    申请人： Masahiro Miyagi ,  Masanobu Sato ,  Hiroyuki Araki

    发明人： Masahiro Miyagi ,  Masanobu Sato ,  Hiroyuki Araki

    IPC分类号： H01L21/461 ,  B08B3/04

    CPC分类号： H01L21/67051

    摘要： A substrate processing apparatus has a cup part for receiving processing liquid which is applied from a processing liquid applying part and is splashed from a substrate, and the cup part is formed of electrical insulation material. Hydrophilic treatment is performed on an outer annular surface of the cup part and water is held on the outer annular surface of the cup part while processing the substrate. With this structure, charged potential of the cup part generated in splashing of pure water can be suppressed by the water held on the outer annular surface, without greatly increasing the manufacturing cost of the substrate processing apparatus by forming the cup part with special conductive material. As a result, it is possible to prevent electric discharge from occurring on the substrate due to induction charging of the substrate, in application of the processing liquid onto the substrate.

    摘要翻译： 基板处理装置具有用于接收从处理液施加部施加并从基板溅出的处理液的杯部，杯部由电绝缘材料形成。 在杯部的外环形表面上进行亲水处理，并且在处理基板的同时将水保持在杯部的外环形表面上。 通过这种结构，通过保持在外环形表面上的水可以抑制在纯水溅出中产生的杯部分的带电电位，而不会通过用特殊导电材料形成杯部而大大增加基板处理装置的制造成本。 结果，可以在将处理液施加到基板上时防止由于基板的感应充电而在基板上发生放电。

    Endoscope information system
    6.
    发明授权
    Endoscope information system 有权
    内窥镜信息系统

    公开(公告)号：US07670283B2

    公开(公告)日：2010-03-02

    申请号：US10693432

    申请日：2003-10-24

    申请人： Hiroyuki Araki

    发明人： Hiroyuki Araki

    IPC分类号： A61B1/00

    CPC分类号： A61B1/00059 ,  A61B1/00006 ,  A61B1/00057 ,  A61B1/04 ,  A61B2560/0271 ,  A61B2560/0276 ,  G06F19/00 ,  G06Q30/016 ,  G06Q50/22 ,  G16H40/40

    摘要： A history information obtaining unit obtains information about a use history of an endoscope. An estimating unit makes an estimation of a secular change in the endoscope from its use start until the present time based on this information. A displaying unit displays a ratio of a result of the estimation made by the estimating unit to the degree of the secular change, which is preset for the endoscope.

    摘要翻译： 历史信息获取单元获取关于内窥镜的使用历史的信息。 基于该信息，估计单元从其使用开始至现在的时间估计内窥镜的长期变化。 显示单元显示由估计单元估计的结果与针对内窥镜预设的长期变化的程度的比率。

    SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
    7.
    发明申请
    SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS 审中-公开
    基板加工方法和基板加工装置

    公开(公告)号：US20080078423A1

    公开(公告)日：2008-04-03

    申请号：US11860733

    申请日：2007-09-25

    申请人： Hiroyuki Araki ,  Toyohide Hayashi

    发明人： Hiroyuki Araki ,  Toyohide Hayashi

    IPC分类号： B08B3/04

    CPC分类号： H01L21/67051 ,  H01L21/02057 ,  H01L21/68728 ,  H01L21/68742

    摘要： Holes having a variety of shapes exist on a surface of a substrate. When pure water is supplied on the substrate in a rinsing process, part of the pure water enters the holes. The pure water which have entered the holes can be hardly shaken off even though the substrate is rotated at a high speed. Therefore, HFE is held on the substrate so as to form an HFE layer after the rinsing process. In this case, the HFE enters the holes while the pure water emerges from the holes to the upper surface of the HFE due to a difference in specific gravity between the pure water and the HFE. Thus, the pure water is reliably prevented from remaining in the holes.

    摘要翻译： 具有各种形状的孔存在于基板的表面上。 当在漂洗过程中在基材上供应纯水时，部分纯水进入孔中。 进入孔的纯水即使基材高速旋转也难以摇动。 因此，HFE被保持在基板上，以便在漂洗过程之后形成HFE层。 在这种情况下，由于纯水和HFE之间的比重差异，HFE进入孔，而纯水从孔到HFE的上表面出现。 因此，可靠地防止纯水残留在孔中。

    Substrate drying apparatus and substrate processing apparatus
    8.
    发明授权
    Substrate drying apparatus and substrate processing apparatus 失效
    基板干燥装置和基板处理装置

    公开(公告)号：US06354311B1

    公开(公告)日：2002-03-12

    申请号：US09522205

    申请日：2000-03-09

    申请人： Masahiro Kimura ,  Hiroyuki Araki

    发明人： Masahiro Kimura ,  Hiroyuki Araki

    IPC分类号： B08B704

    CPC分类号： H01L21/67034 ,  H01L21/67028 ,  Y10S134/902

    摘要： A deionized water temperature control part cools deionized water which is supplied from a deionized water supply source into a processing bath through a pipe after completely cleaning a substrate in the processing bath for maintaining the deionized water at a constant temperature which is lower than the ordinary temperature. A supply port of an IPA.N2 supply part provided in a casing of a multi-functional processing part is directed upward, thereby supplying IPA vapor upward with carrier gas of N2 for forming an atmosphere containing IPA vapor in high concentration above the processing bath. Thus, the substrate cooled to a low temperature is dried in the atmosphere containing the IPA vapor of the ordinary temperature in the upper portion of the processing bath when pulled up from the processing bath. Thus, the amount of the IPA vapor dissolved in the deionized water stored in the processing bath may be small, whereby consumption of the IPA vapor as well as generation of particles can be suppressed.

    摘要翻译： 去离子水温度控制部件在去离子水中冷却去离子水，所述去离子水在完全清洁处理槽中的基底之后通过管道从加工槽中提供到处理槽中，以将去离子水保持在低于常温的恒定温度 。 设置在多功能处理部件的壳体中的IPA.N2供给部的供给口朝向上方，从而向N 2的载气向上供给IPA蒸气，以形成含有高浓度的IPA蒸汽的气氛，高于处理槽。 因此，在从处理槽拉出时，在含有处理槽上部的常温的IPA蒸气的气氛中冷却到低温的基板被干燥。 因此，溶解在处理槽中的去离子水中的IPA蒸气的量可能较小，从而可以抑制IPA蒸气的消耗以及颗粒的产生。

    Substrate treating apparatus and substrate treating method
    9.
    发明授权
    Substrate treating apparatus and substrate treating method 有权
    基板处理装置及基板处理方法

    公开(公告)号：US06352083B1

    公开(公告)日：2002-03-05

    申请号：US09195190

    申请日：1998-11-17

    申请人： Hiroyuki Araki ,  Kenichiro Arai ,  Masaaki Yabuta

    发明人： Hiroyuki Araki ,  Kenichiro Arai ,  Masaaki Yabuta

    IPC分类号： B08B300

    CPC分类号： H01L21/67057 ,  B08B3/102 ,  H01L21/67051

    摘要： A control unit controls a lifter to raise at least part of each of a group of substrates above the liquid level of a treating liquid in a treating bath. Thereafter, a valve is opened to drain the treating liquid from the treating bath at a high speed. As a result, a physical force to tilt and adhere an upper portion of the adjacent substrates accompanied by lowering of the liquid level of the treating liquid due to the high speed drainage acts upon a lower portion of the substrates near the lowered liquid level of the treating liquid, thereby reducing the physical force exerted on the substrates. This arrangement, even if a holding interval between the substrates is narrowed at a half of a normal pitch, eliminates a contact of the adjacent substrates and prevents damage of the substrates due to the contact without providing an additional member such as a substrate support guide in the treating bath.

    摘要翻译： 控制单元控制升降器，以将处理液中的处理液的液面以上的一组基板中的每一个的至少一部分升高。 此后，打开阀门以高速排出处理液。 结果，伴随着由于高速排水引起的处理液的液面的降低而倾斜并附着相邻基板的上部的物理力作用在基板的较低部分附近， 从而减少施加在基板上的物理力。 这种布置，即使基板之间的保持间隔在正常间距的一半处变窄，消除了相邻基板的接触，并且防止了由于接触而导致的基板的损坏，而没有提供诸如基板支撑引导件的附加构件 治疗浴。

    Medical service support system, medical service support server, and medical service support terminal for supporting medical service
    10.
    发明授权
    Medical service support system, medical service support server, and medical service support terminal for supporting medical service 有权
    医疗服务支持​​系统，医疗服务支持​​服务器，医疗服务支持​​终端支持医疗服务

    公开(公告)号：US07885826B2

    公开(公告)日：2011-02-08

    申请号：US12197507

    申请日：2008-08-25

    申请人： Hiroyuki Araki ,  Shinichi Omori

    发明人： Hiroyuki Araki ,  Shinichi Omori

    IPC分类号： G06Q10/00 ,  G06Q50/00 ,  A61B5/00 ,  G06F19/00

    CPC分类号： G06F19/3456 ,  G06F19/00 ,  G06Q10/10 ,  G06Q50/22 ,  G06Q50/24 ,  G16H40/20

    摘要： In the embodiment of the present invention, when identification information acquired from a drug or instrument to be used on a patient is not included in schedule information stored beforehand, a user is notified to confirm that the identification information is not included in the schedule information. After the notification is provided, in registering the acquired identification information as practice details, the name of a doctor who instructed to use the drug or instrument, which is different from the drug or instrument specified by schedule information, and the reason for the instruction are registered, while associated with the practice details. Accordingly, drugs or instruments necessary for patients can be used in an appropriate manner.

    摘要翻译： 在本发明的实施例中，当从用于患者的药物或器具获取的识别信息不包括在预先存储的调度信息中时，通知用户以确认标识信息不包括在调度信息中。 在提供通知后，在获取的身份信息作为实践细节登记时，指示使用药物或器具的医生名称与由时间表信息指定的药物或器械不同，以及指示的原因是 注册，同时与实践细节相关联。 因此，可以以适当的方式使用患者所需的药物或器械。