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    Radiation-sensitive composition containing plasticizer
    1.
    发明授权
    Radiation-sensitive composition containing plasticizer 失效
    含增塑剂的辐射敏感组合物

    公开(公告)号：US5846690A

    公开(公告)日：1998-12-08

    申请号：US615831

    申请日：1996-03-14

    申请人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Hiroshi Okazaki ,  Seiya Masuda ,  Natsumi Kawasaki ,  Satoru Funato ,  Georg Pawlowski

    发明人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Hiroshi Okazaki ,  Seiya Masuda ,  Natsumi Kawasaki ,  Satoru Funato ,  Georg Pawlowski

    IPC分类号： G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/038 ,  G03F7/30

    CPC分类号： G03F7/0045

    摘要： A radiation-sensitive composition is disclosed which includes (a) a binder insoluble in water but soluble in or capable of being swelled in an aqueous alkali solution, (b) a dissolution inhibitor composed of (b1) a poly(N,O-acetal) having a general formula: ##STR1## wherein R.sup.3 is alkyl or substituted or unsubstituted aryl, R.sup.4 is a divalent group selected from alkylene, cycloalkylene, alkene or alkyne, R.sup.5 is alkyl, alkene, alkyne or cycloalkyl, X is --OCO--, --CO-- or --NHCO--, and p is a number not less than 1, and/or (b2) a phenol compound having a hydroxyl group which is protected by a group which can be cleaved in the presence of an acid, (c) a photosensitive compound capable of generating an acid when exposed to an active radiation, (d) a base capable of being decomposed when exposed to an active radiation to form a neutral compound derived therefrom, (e) a plasticizer, and (f) a solvent.

    摘要翻译： 公开了一种辐射敏感性组合物，其包括（a）不溶于水但可溶于或能够在碱性水溶液中溶胀或能够溶胀的粘合剂，（b）由（b1）聚（N，O-缩醛） ）具有以下通式：其中R 3是烷基或取代或未取代的芳基，R 4是选自亚烷基，亚环烷基，烯烃或炔烃的二价基团，R 5是烷基，烯烃，炔烃或环烷基，X是-OCO-， -CO-或-NHCO-，p为不小于1的数，和/或（b2）具有羟基的酚化合物，该羟基被酸可以被可被切割的基团保护，（c ）当暴露于活性辐射时能够产生酸的光敏化合物，（d）当暴露于活性辐射时能够分解以形成由其衍生的中性化合物的碱，（e）增塑剂，和（f） 溶剂。

    Radiation-sensitive composition
    2.
    发明授权
    Radiation-sensitive composition 失效
    辐射敏感组合物

    公开(公告)号：US5773191A

    公开(公告)日：1998-06-30

    申请号：US685850

    申请日：1996-07-24

    申请人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Satoru Funato ,  Natsumi Kawasaki ,  Hiroshi Okazaki ,  Georg Pawlowski

    发明人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Satoru Funato ,  Natsumi Kawasaki ,  Hiroshi Okazaki ,  Georg Pawlowski

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03F7/032 ,  G03F7/30

    CPC分类号： G03F7/0045 ,  Y10S430/106 ,  Y10S430/11

    摘要： A radiation-sensitive composition is disclosed which includes: (a) a copolymer represented by the general formula: ##STR1## wherein R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is a substituted or unsubstituted alkyl group or a substituted or unsubstituted aryl group, Ar is a substituted or unsubstituted phenylene group or a substituted or unsubstituted cyclohexylene group, X is a divalent group represented by --SO.sub.2 -- or --CO--, m and n are individually an integer not less than 1; (b) a dissolution inhibitor composed of a compound represented by the general formula: ##STR2## wherein R.sup.3 is an alkyl group or a substituted or unsubstituted aryl group, R.sup.4 is an alkylene group, a cycloalkylene group, an alkenylene group or an alkynylene group, R.sup.5 is an alkyl group or an cycloalkyl group, Y is --OCO--, --CO-- or --NHCO--, and p is an integer not less than 1, or (b') a cross-linking agent; (c) a photosensitive compound capable of generating an acid when exposed to a radiation; and (e) a solvent.

    摘要翻译： 公开了一种辐射敏感性组合物，其包括：（a）由以下通式表示的共聚物：其中R 1为氢原子或甲基，R 2为取代或未取代的烷基或取代或未取代的芳基 Ar为取代或未取代的亚苯基或取代或未取代的亚环己基，X为-SO 2 - 或-CO-表示的二价基，m和n分别为1以上的整数， （b）由以下通式表示的化合物组成的溶解抑制剂：其中R3为烷基或取代或未取代的芳基，R4为亚烷基，亚环烷基，亚烯基或亚炔基 ，R5是烷基或环烷基，Y是-OCO-，-CO-或-NHCO-，p是不小于1的整数，或（b'）交联剂; （c）当暴露于辐射时能够产生酸的光敏化合物; 和（e）溶剂。

    Radiation sensitive composition
    4.
    发明授权
    Radiation sensitive composition 失效
    辐射敏感组合物

    公开(公告)号：US5738972A

    公开(公告)日：1998-04-14

    申请号：US864375

    申请日：1997-05-28

    申请人： Munirathna Padmanaban ,  Natsumi Suehiro ,  Yoshiaki Kinoshita ,  Satoru Funato ,  Seiya Masuda ,  Hiroshi Okazaki ,  Georg Pawlowski

    发明人： Munirathna Padmanaban ,  Natsumi Suehiro ,  Yoshiaki Kinoshita ,  Satoru Funato ,  Seiya Masuda ,  Hiroshi Okazaki ,  Georg Pawlowski

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/033 ,  G03F7/039 ,  G03F7/085 ,  H01L21/027 ,  G03F7/38

    CPC分类号： G03F7/0045 ,  Y10S430/106

    摘要： A chemically amplified resist material comprising: a) a homopolymer or a copolymer of hydroxystyrene or hydroxystyrene partly protected by a group sensitive to an acid such as a tetrahydropyranyl or t-butoxycarbonyl group, b) a dissolution inhibitor such as poly(N,O-acetal) or phenol or bisphenol protected by a group cleavable with an acid, c) a photosensitive compound capable of generating an acid upon exposure, d) a base capable of degrading upon radiation to regulate the line width in a period between the exposure step and the processing steps after exposure, e) a low-molecular weight phenolic or polyphenolic compound having a structure represented by the following general formula or a mixture of the phenolic or polyphenolic compounds: ##STR1## where n is an integer of 1 to 5, m is an integer of 0 to 4, n+m.ltoreq.5, and p is an integer of 1 to 10, each R is a C.sub.1 -C.sub.12 alkyl group or an unsubstituted or substituted cycloalkyl group or a C.sub.1 -C.sub.5 hydroxyalkyl group, provided that hydrogen atoms may be substituted with a halogen atom and, when m is not less than 2, each R may be the same or different; A represents a hydrocarbon atomic grouping, having a valence of p, including an unsubstituted or substituted C.sub.1 -C.sub.100 alicyclic, chain aliphatic, or aromatic hydrocarbon or a combination thereof with the carbon atoms being optionally substituted with an oxygen atom, provided that when p is 1, A may represent a hydrogen atom and, when p is 2, A may represent --S--, --SO--, --SO.sub.2 --, --O--, --CO--, or a direct bond, and f) a solvent for dissolving the components a) to e).

    摘要翻译： 一种化学放大抗蚀剂材料，包括：a）部分由对酸如四氢吡喃基或叔丁氧基羰基敏感的基团部分保护的羟基苯乙烯或羟基苯乙烯的均聚物或共聚物，b）溶解抑制剂如聚（N， 乙缩醛）或苯酚或双酚被被一个酸可裂解的基团保护，c）一种能够在暴露时产生酸的感光性化合物，d）能够在辐射下降解以在曝光步骤和 曝光后的处理步骤，e）具有由以下通式表示的结构的低分子量酚或多酚化合物或酚类或多酚化合物的混合物：n为0〜4的整数，n + m = 5 ，p为1〜10的整数，R为C1-C12烷基或未取代或取代的环烷基或C1-C5羟烷基，条件是氢原子可被卤素原子取代， en不小于2，每个R可以相同或不同; A表示具有p价的烃原子团，包括未取代或取代的C1-C100脂环族，链脂族或芳族烃或其任选被氧原子取代的碳原子的组合，条件是当p为 1中，A可以表示氢原子，当p为2时，A可以表示-S-，-SO-，-SO2-，-O-，-CO-或直接键，f）溶解溶剂 组件a）至e）。

    Positive-working radiation-sensitive mixture
    5.
    发明授权
    Positive-working radiation-sensitive mixture 失效
    正面工作的辐射敏感混合物

    公开(公告)号：US5843319A

    公开(公告)日：1998-12-01

    申请号：US902072

    申请日：1997-07-29

    申请人： Klaus Juergen Przybilla ,  Takanori Kudo ,  Seiya Masuda ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Munirathna Padmanaban ,  Hiroshi Okazaki ,  Hajime Endo ,  Ralph Dammel ,  Georg Pawlowski

    发明人： Klaus Juergen Przybilla ,  Takanori Kudo ,  Seiya Masuda ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Munirathna Padmanaban ,  Hiroshi Okazaki ,  Hajime Endo ,  Ralph Dammel ,  Georg Pawlowski

    IPC分类号： G03F7/004 ,  G03F7/039 ,  B01D15/00 ,  B01J39/00 ,  C02F1/42

    CPC分类号： G03F7/0045 ,  G03F7/039

    摘要： A process for producing a solution of a basic or non-basic sulfonium compound (A) of formulae II-V: ##STR1## wherein R.sup.5, R.sup.6 and R.sup.7 each independently represent a C.sub.1 -C.sub.18 alkyl, aryl or heteroaryl group or an aryl group mono-, di- or tri-substituted with an alkyl, an alkylaryl, an aryl, a halogen, an alkoxy, a phenoxy, a thiophenol, a phenylsulfonyl or a phenylsulphenyl; Y represents (CH.sub.2).sub.n (wherein n is 0 or 1), O or S; R.sup.8 and R.sup.9 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen; R.sup.10 and R.sup.11 represent a C.sub.1 -C.sub.4 alkyl, alkoxy or a halogen; n is 5 or 6; and X.sub.2.sup.- represents a basic anion having a pK.sub.B value of -3 to +5; comprising the steps of: (a) dissolving a sulfonium salt (B) in a metal-ion free polar or non-polar solvent to form a solution, said sulfonium salt (B) being selected from said formulae II-V, wherein R.sup.5 to R.sup.11, Y and n of said sulfonium salt (B) have the sane meaning as above and X.sub.2.sup.- represents a non-nucleophilic anion; (b) contacting said solution for a sufficient amount of time with a basic ion-exchange resin having a quaternary ammonium group to replace the anion of (B) with a hydroxide ion and to form a sulfonium hydroxide solution; (c) separating said sulfonium hydroxide solution from the resin; and optionally (d) adding an active hydrogen containing compound or its base-labile precursor to said sulfonium hydroxide solution to yield a solution of the sulfonium compound (A) wherein X.sub.2.sup.- represents a basic anion other than a hydroxy ion.

    摘要翻译： 制备式II-V的碱性或非碱性锍化合物（A）的溶液的方法：[SR5R6R7] + X2-Ⅱ其中R5，R6和R7各自独立地 独立地表示C1-C18烷基，芳基或杂芳基或被烷基，烷基芳基，芳基，卤素，烷氧基，苯氧基，苯硫酚，苯基磺酰基或苯基磺酰基单 - ，二 - 或三 - 取代的芳基 苯基磺酰基; Y表示（CH 2）n（其中n为0或1），O或S; R8和R9代表C1-C4烷基，烷氧基或卤素; R10和R11表示C1-C4烷基，烷氧基或卤素; n为5或6; X2-表示pKB值为-3〜+5的碱性阴离子; 包括以下步骤：（a）将锍盐（B）溶解在无金属离子的极性或非极性溶剂中以形成溶液，所述锍盐（B）选自所述式II-V，其中R5至 所述锍盐（B）的R 11，Y和n具有如上所述的正义，X2-表示非亲核阴离子; （b）用具有季铵基团的碱性离子交换树脂将所述溶液接触足够的时间以用氢氧根离子代替（B）的阴离子并形成氢氧化锍溶液; （c）从树脂中分离出氢氧化锍溶液; 和任选地（d）在所述氢氧化锍溶液中加入含活性氢的化合物或其碱不稳定的前体，得到其中X2代表羟基离子以外的碱性阴离子的锍化合物（A）的溶液。

    Radiation sensitive composition
    6.
    发明授权
    Radiation sensitive composition 失效
    辐射敏感组合物

    公开(公告)号：US5595855A

    公开(公告)日：1997-01-21

    申请号：US390045

    申请日：1995-02-17

    申请人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Takanori Kudo ,  Seiya Masuda ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Georg Pawlowski

    发明人： Munirathna Padmanaban ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Takanori Kudo ,  Seiya Masuda ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Georg Pawlowski

    IPC分类号： C08L25/00 ,  C08L25/18 ,  C08L59/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027 ,  G03C1/72

    CPC分类号： G03F7/038 ,  G03F7/0045

    摘要： A chemically amplified radiation sensitive composition comprising: (a) a copolymer such as poly(4-hydroxystyrene-co-styrene), (b) a dissolution inhibitor such as polyacetal or (b') a crosslinking agent, (c) a radiation sensitive compound capable of generating an acid upon exposure to actinic radiation, (d) a radiation sensitive base capable of stabilizing the width of lines throughout steps from exposure to post-exposure bake treatment, and (e) a solvent for dissolving the components (a) to (d), can realize fine lines and spaces down to 0.22 microns, for example, using KrF laser, and possesses excellent heat and etch resistance and adhesiveness to substrates, and produces patterns with low standing waves arising due to substrate reflectiveness of exposed light.

    摘要翻译： 一种化学增强的辐射敏感组合物，其包含：（a）共聚物如聚（4-羟基苯乙烯 - 共 - 苯乙烯），（b）溶解抑制剂如聚缩醛或（b'）交联剂，（c） 能够在暴露于光化辐射下产生酸的化合物，（d）能够在暴露于曝光后烘烤处理的步骤中稳定整个条纹宽度的辐射敏感性基质，和（e）用于溶解组分的溶剂（a） 至（d），可以实现例如使用KrF激光器至0.22微米的细线和间隔，并且具有优异的耐热和耐蚀刻性以及与衬底的粘附性，并且由于曝光的衬底反射性而产生具有低驻波的图案 。

    Process for preparing resists
    8.
    发明授权
    Process for preparing resists 有权
    抗蚀剂的制备方法

    公开(公告)号：US06284427B1

    公开(公告)日：2001-09-04

    申请号：US09308582

    申请日：1999-08-05

    申请人： Hiroshi Okazaki ,  Georg Pawlowski ,  Satoru Funato ,  Yoshiaki Kinoshita ,  Yuko Yamaguchi

    发明人： Hiroshi Okazaki ,  Georg Pawlowski ,  Satoru Funato ,  Yoshiaki Kinoshita ,  Yuko Yamaguchi

    IPC分类号： G03C173

    CPC分类号： G03F7/039 ,  C08F8/00 ,  C08F8/14 ,  C08F8/18 ,  C08F212/14 ,  C08F257/02 ,  C08F2800/20 ,  C08F2810/30 ,  C08L25/18 ,  C09D125/18 ,  G03F7/0045 ,  Y10S430/119 ,  C08F12/14 ,  C08F216/125 ,  C08F220/14 ,  C08F220/06 ,  C08F112/14

    摘要： A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.

    摘要翻译： 抗蚀剂组合物通过使酸性催化剂存在下使非酚质子溶剂如丙二醇单甲醚乙酸酯中的具有酚羟基或羧基的碱溶性聚合物与乙烯基醚化合物反应来制备， 加入碱，并将光致酸产生剂直接加入到反应溶液中。 当使用二碳酸二烷基酯代替乙烯基醚化合物时，通过在碱性催化剂的存在下进行反应并直接向反应中加入光致酸产生剂制备抗蚀剂组合物。 因此，可以在不分离或纯化已经被催化反应取代的碱溶性聚合物的情况下制备抗蚀剂组合物。

    Process for preparing resists
    9.
    发明授权
    Process for preparing resists 有权
    抗蚀剂的制备方法

    公开(公告)号：US06686121B2

    公开(公告)日：2004-02-03

    申请号：US09824198

    申请日：2001-04-02

    申请人： Hiroshi Okazaki ,  Georg Pawlowski ,  Satoru Funato ,  Yoshiaki Kinoshita ,  Yuko Yamaguchi

    发明人： Hiroshi Okazaki ,  Georg Pawlowski ,  Satoru Funato ,  Yoshiaki Kinoshita ,  Yuko Yamaguchi

    IPC分类号： G03C173

    CPC分类号： G03F7/039 ,  C08F8/00 ,  C08F8/14 ,  C08F8/18 ,  C08F212/14 ,  C08F257/02 ,  C08F2800/20 ,  C08F2810/30 ,  C08L25/18 ,  C09D125/18 ,  G03F7/0045 ,  Y10S430/119 ,  C08F12/14 ,  C08F216/125 ,  C08F220/14 ,  C08F220/06 ,  C08F112/14

    摘要： A resist composition is prepared by reacting an alkali-soluble polymer having a phenolic hydroxyl or carboxyl groups with a vinyl ether compound in an aprotic solvent, such as propylene glycol monomethyl ether acetate, in the presence of an acid catalyst, suspending the reaction by the addition of a base, and directly adding a photoacid generator to the reaction solution. When a dialkyl dicarbonate is used in stead of the vinyl ether compound, a resist composition is prepared by carrying out the reaction in the presence of a basic catalyst and adding a photoacid generator directly to the reaction. Thus resist compositions can be prepared without isolating or purifying an alkali-soluble polymer which has been substituted by a catalytic reaction.

    摘要翻译： 抗蚀剂组合物通过使酸性催化剂存在下使非酚质子溶剂如丙二醇单甲醚乙酸酯中的具有酚羟基或羧基的碱溶性聚合物与乙烯基醚化合物反应来制备， 加入碱，并将光致酸产生剂直接加入到反应溶液中。 当使用二碳酸二烷基酯代替乙烯基醚化合物时，通过在碱性催化剂的存在下进行反应并直接向反应中加入光致酸产生剂制备抗蚀剂组合物。 因此，可以在不分离或纯化已经被催化反应取代的碱溶性聚合物的情况下制备抗蚀剂组合物。

    Radiation-sensitive mixture comprising a basic iodonium compound
    10.
    发明授权
    Radiation-sensitive mixture comprising a basic iodonium compound 失效
    包含碱性碘鎓化合物的辐射敏感性混合物

    公开(公告)号：US5663035A

    公开(公告)日：1997-09-02

    申请号：US420787

    申请日：1995-04-12

    申请人： Seiya Masuda ,  Munirathna Padmanaban ,  Takanori Kudo ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Klaus Jurgen Przybilla

    发明人： Seiya Masuda ,  Munirathna Padmanaban ,  Takanori Kudo ,  Yoshiaki Kinoshita ,  Natsumi Suehiro ,  Yuko Nozaki ,  Hiroshi Okazaki ,  Klaus Jurgen Przybilla

    IPC分类号： G03F7/004 ,  G03F7/039

    CPC分类号： G03F7/0045

    摘要： A radiation-sensitive mixture for use in the production of semiconductor elements, which has high sensitivity and high resolution, which can be developed by an aqueous alkaline solution, and which is based on a novel concept in that a stable acid latent image is controlled by using a radiation-decomposable base.The mixture is characterized by comprising as essential components a) a binder which is insoluble in water but soluble in an aqueous alkaline solution; b.sup.1) a compound having at least one bond which can be cleaved by an acid, or b.sup.2) a compound having at least one bond which is crosslinked with the compound a) by an acid; c) a compound which generates an acid when irradiated; and d) a basic iodonium compound.

    摘要翻译： 用于生产半导体元件的辐射敏感性混合物，其具有高灵敏度和高分辨率，其可以通过碱性水溶液开发，并且其基于新的概念，其中稳定的酸潜像由 使用辐射分解碱。 该混合物的特征在于包含作为必需组分的a）不溶于水但可溶于碱性水溶液的粘合剂; b1）具有至少一个可被酸切割的键的化合物，或b2）具有至少一个键的化合物，其通过酸与化合物a）交联; c）当照射时产生酸的化合物; 和d）碱性碘鎓化合物。