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1.发明申请Substrate including deformed portions and method of adjusting a curvature of a substrate 审中-公开包括变形部分的基板和调整基板的曲率的方法公开(公告)号：US20070224522A1
公开(公告)日：2007-09-27
申请号：US11723280
申请日：2007-03-19
申请人： Myoung-soo Lee , Dong-wan Kim , Sung-min Huh , Suk-jong Bae
发明人： Myoung-soo Lee , Dong-wan Kim , Sung-min Huh , Suk-jong Bae
CPC分类号： H01L31/18 , G03F1/60 , Y10T428/31616
摘要： Adjusting a curvature of a substrate includes forming at least one deformed portion in a predetermined region of a substrate, wherein the substrate includes a curved region before forming the at least one deformed portion, and forming the at least one deformed portion includes irradiating the substrate in the predetermined region so as to fixedly displace substrate material in the predetermined region.
摘要翻译： 调整基板的曲率包括在基板的预定区域中形成至少一个变形部分，其中基板在形成至少一个变形部分之前包括弯曲区域，并且形成至少一个变形部分包括将基板 预定区域，以便在预定区域中固定地移位基板材料。
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公开(公告)号：US20060240334A1
公开(公告)日：2006-10-26
申请号：US11367438
申请日：2006-03-06
申请人： Sung-min Huh , Hee-bom Kim , Seong-woon Choi , Dong-wan Kim , Chan-uk Jeon
发明人： Sung-min Huh , Hee-bom Kim , Seong-woon Choi , Dong-wan Kim , Chan-uk Jeon
摘要： A method of manufacturing an extreme ultra-violet lithography (EUVL) alternating phase-shift mask comprises preparing a substrate having a reflective layer, forming a light-shielding layer pattern on the reflective layer to cover part of the reflective layer while leaving a reflective region of the reflective layer exposed, forming a trench in a phase-shift region of the reflective layer by etching the reflective layer, and changing the physical structure of a non phase-shift region of the reflective region to lower its reflectivity with respect to extreme ultra-violet (EUV) light.
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公开(公告)号：US07601467B2
公开(公告)日：2009-10-13
申请号：US11367438
申请日：2006-03-06
申请人： Sung-min Huh , Hee-bom Kim , Seong-woon Choi , Dong-wan Kim , Chan-uk Jeon
发明人： Sung-min Huh , Hee-bom Kim , Seong-woon Choi , Dong-wan Kim , Chan-uk Jeon
IPC分类号： G03F1/00
摘要： A method of manufacturing an extreme ultra-violet lithography (EUVL) alternating phase-shift mask comprises preparing a substrate having a reflective layer, forming a light-shielding layer pattern on the reflective layer to cover part of the reflective layer while leaving a reflective region of the reflective layer exposed, forming a trench in a phase-shift region of the reflective layer by etching the reflective layer, and changing the physical structure of a non phase-shift region of the reflective region to lower its reflectivity with respect to extreme ultra-violet (EUV) light.
摘要翻译： 制造极紫外光刻（EUVL）交替相移掩模的方法包括制备具有反射层的基板，在反射层上形成遮光层图案以覆盖反射层的一部分，同时留下反射区域 的反射层，通过蚀刻反射层在反射层的相移区域中形成沟槽，并且改变反射区域的非相移区域的物理结构，以降低其相对于极端的超反射区域的反射率 （EUV）灯。
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公开(公告)号：US08072679B2
公开(公告)日：2011-12-06
申请号：US12153785
申请日：2008-05-23
申请人： Dong-wan Kim , Dong-gun Lee , Sung-min Huh
发明人： Dong-wan Kim , Dong-gun Lee , Sung-min Huh
IPC分类号： G02B21/16
CPC分类号： G02B21/16 , G02B21/361
摘要： A microscope includes optics configured to direct beams onto an object including a reflective material, a detector configured to receive a field spectrum formed by beams reflected by the object, and a calculator configured to reconstruct an image of the object from the field spectrum detected by the detector.
摘要翻译： 显微镜包括被配置为将光束引导到包括反射材料的物体上的光学器件，被配置为接收由物体反射的光束形成的场光谱的检测器，以及被配置为从由物体所检测的场光谱重建物体的图像的计算器 探测器。
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公开(公告)号：US20080297891A1
公开(公告)日：2008-12-04
申请号：US12153785
申请日：2008-05-23
申请人： Dong-wan Kim , Dong-gun Lee , Sung-min Huh
发明人： Dong-wan Kim , Dong-gun Lee , Sung-min Huh
IPC分类号： G02B21/06
CPC分类号： G02B21/16 , G02B21/361
摘要： A microscope includes optics configured to direct beams onto an object including a reflective material, a detector configured to receive a field spectrum formed by beams reflected by the object, and a calculator configured to reconstruct an image of the object from the field spectrum detected by the detector.
摘要翻译： 显微镜包括被配置为将光束引导到包括反射材料的物体上的光学器件，被配置为接收由物体反射的光束形成的场光谱的检测器，以及被配置为从由物体所检测的场光谱重建物体的图像的计算器 探测器。
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6.发明申请Polarization measuring devices, ellipsometers and polarization measuring methods 审中-公开极化测量装置，椭偏仪和偏振测量方法公开(公告)号：US20070247623A1
公开(公告)日：2007-10-25
申请号：US11723992
申请日：2007-03-23
申请人： Dong-wan Kim , Dong-gun Lee , Kyoung-yoon Bang
发明人： Dong-wan Kim , Dong-gun Lee , Kyoung-yoon Bang
IPC分类号： G01J4/00
CPC分类号： G01J4/00 , G01N21/211 , G01N21/8422
摘要： A polarization measuring device includes a diffraction grating and a detector. The diffraction grating is configured to diffract incident light to observe the polarization state of the light. The detector is configured to receive the light diffracted by the diffraction grating and display the polarization state of the light.
摘要翻译： 偏振测量装置包括衍射光栅和检测器。 衍射光栅被配置为衍射入射光以观察光的偏振状态。 检测器被配置为接收由衍射光栅衍射的光并显示光的偏振状态。
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7.发明授权(Ge,Si) Nx anti-reflective compositions and integrated circuit devices comprising the same 失效（Ge，Si）Nx抗反射组合物和包含其的集成电路器件
公开(公告)号：US5986318A
公开(公告)日：1999-11-16
申请号：US956776
申请日：1997-10-23
申请人： Yong-beom Kim , Dong-wan Kim
发明人： Yong-beom Kim , Dong-wan Kim
IPC分类号： G03F7/11 , C01B21/082 , G02B5/20 , G03F7/09 , H01L21/027 , H01L21/033 , H01L31/0232
CPC分类号： G03F7/09 , G03F7/091 , H01L21/0276 , H01L21/0332
摘要： An anti-reflective composition used in manufacturing integrated circuit devices comprises a silicon-added germanium nitride material. The composition is present in a solid solution.
摘要翻译： 用于制造集成电路器件的抗反射组合物包括添加硅的氮化锗材料。 组合物以固溶体存在。
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