POSITIONING SYSTEM USING SURFACE PATTERN RECOGNITION AND INTERPOLATION
    2.
    发明申请
    POSITIONING SYSTEM USING SURFACE PATTERN RECOGNITION AND INTERPOLATION 有权
    使用表面图案识别和插值的定位系统

    公开(公告)号:US20150301459A1

    公开(公告)日:2015-10-22

    申请号:US14689570

    申请日:2015-04-17

    申请人: NIKON CORPORATION

    IPC分类号: G03F7/20

    摘要: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

    摘要翻译: 一种用于沿着第一轴线定位装置的台架组件,所述台架组件包括:底座; 保持装置并移动到基座上方的台阶; 移动器组件,其使舞台沿第一轴线相对于底座移动; 第一传感器系统,其监测所述载物台沿着所述第一轴的移动,所述第一传感器系统产生第一信号,所述第一传感器系统具有第一传感器精度; 第二传感器系统,其监测所述台沿着所述第一轴的运动,所述第二传感器系统具有与所述第一传感器系统的所述第一传感器精度不同的第二传感器精度,所述第二传感器产生第二信号; 以及控制系统,其使用第一传感器和第二信号中的至少一个来控​​制动子组件。

    Positioning system using surface pattern recognition and interpolation

    公开(公告)号:US10884344B2

    公开(公告)日:2021-01-05

    申请号:US15669661

    申请日:2017-08-04

    申请人: NIKON CORPORATION

    摘要: A stage assembly for positioning a device along a first axis, the stage assembly comprising: a base; a stage that retains the device and moves above the base; a mover assembly that moves the stage along the first axis relative to the base; a first sensor system that monitors the movement of the stage along the first axis, the first sensor system generating a first signal, the first sensor system having a first sensor accuracy; a second sensor system that monitors the movement of the stage along the first axis, the second sensor system having a second sensor accuracy that is different from the first sensor accuracy of the first sensor system, the second sensor generating a second signal; and a control system that controls the mover assembly using at least one of the first sensor and the second signal.

    SYSTEM AND METHOD FOR CONTROL OF A WORKPIECE AND A CHUCK

    公开(公告)号:US20180074417A1

    公开(公告)日:2018-03-15

    申请号:US15698503

    申请日:2017-09-07

    申请人: NIKON CORPORATION

    IPC分类号: G03F7/20

    CPC分类号: G03F7/70875 G03F7/707

    摘要: An exposure apparatus (10) for transferring one or more features to a workpiece (22) includes an illumination source (44A); (ii) a chuck (40) that retains the workpiece (22); (iii) a chamber housing (28A) that encircles the chuck and the workpiece; and (iv) a temperature controller (32) (34) that adjusts the temperature of at least one of the chuck (40) and the workpiece (22) so that a predetermined temperature differential (309) exists between the chuck (40) and the workpiece (22) before transferring the features to the workpiece (22).