公开(公告)号：US12116466B2

公开(公告)日：2024-10-15

申请号：US17605095

申请日：2020-04-22

申请人： NIKON-ESSILOR CO., LTD. ,  SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Katsuyoshi Takeshita ,  Hideyuki Wakiyasu ,  Tomohiro Ito ,  Tomonori Miyamoto ,  Masayoshi Tokuda

IPC分类号： C08J7/04 ,  B05D1/00 ,  B05D3/10 ,  B05D5/08 ,  C03C17/34 ,  C09D183/04 ,  G02B1/111 ,  G02B1/14 ,  G02B1/18

CPC分类号： C08J7/042 ,  B05D1/60 ,  B05D3/10 ,  B05D5/086 ,  C03C17/3405 ,  C09D183/04 ,  G02B1/111 ,  G02B1/14 ,  G02B1/18 ,  B05D2203/35 ,  B05D2506/10 ,  B05D2518/10 ,  C03C2217/73

摘要： An object of the present invention is to provide a laminate which has a substrate, an intermediate layer, and a water-repellent layer laminated in this order, and has excellent abrasion resistance. The present invention is a laminate comprising: a substrate (s) having an anti-reflection layer; an intermediate layer (c) placed on the anti-reflection layer side of the substrate; and a water-repellent layer (r), in this order, wherein the intermediate layer (c) is a cured layer of a mixture composition (cc) of an organosilicon compound (C), or a vapor deposition layer of the organosilicon compound (C), the organosilicon compound (C) contains a silicon atom together with an amino group and/or an amine skeleton, the water-repellent layer (r) is a cured layer of a mixture composition (ca) of an organosilicon compound (A) in which a monovalent group having a perfluoropolyether structure is bound to a silicon atom through a linking group or without a linking group located therebetween, and a hydrolyzable group is bound to the silicon atom through a linking group or without a linking group located therebetween, and the laminate satisfies the following requirement (1),



(1) a water sliding angle is not larger than 50° after a abrasion resistance test in which a 200 g load per 1.5 cm×1.5 cm area is applied to a surface on the water-repellent layer (r) side of the laminate and the surface is rubbed 20,000 times.

公开(公告)号：US11168226B2

公开(公告)日：2021-11-09

申请号：US16493190

申请日：2018-03-23

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Michiru Uehara ,  Tomohiro Ito

IPC分类号： C09D7/63 ,  C08G77/16 ,  C08G77/08 ,  C08K5/092 ,  C08K5/5415 ,  C09D183/04 ,  C08G77/18 ,  B05D5/00 ,  C09K3/18

摘要： Although a composition for formation of a coating film is sometimes required to have satisfactory storage stability, it could not be said that a conventionally known composition has sufficient storage stability.
It is an object of the present invention to provide a composition comprising an organosilicon compound which is excellent in storage stability.
The present invention provides a composition comprising an organosilicon compound (A) represented by the following formula (a1), a metal compound (B) represented by the following formula (b1), a carboxylic acid compound (C), and an acid catalyst.

公开(公告)号：US11608444B2

公开(公告)日：2023-03-21

申请号：US17402794

申请日：2021-08-16

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Michiru Uehara ,  Tomohiro Ito

IPC分类号： C09D7/63 ,  C09D183/04 ,  C08G77/08 ,  C08K5/092 ,  C08K5/5415 ,  C08G77/18 ,  C09K3/18

摘要： Although a composition for formation of a coating film is sometimes required to have satisfactory storage stability, it could not be said that a conventionally known composition has sufficient storage stability.
It is an object of the present invention to provide a composition comprising an organosilicon compound which is excellent in storage stability.
The present invention provides a composition comprising an organosilicon compound (A) represented by the following formula (a1), a metal compound (B) represented by the following formula (b1), a carboxylic acid compound (C), and an acid catalyst.