Patterning an optical property on an optical element
    3.
    发明授权
    Patterning an optical property on an optical element 有权
    在光学元件上形成光学性质

    公开(公告)号:US06596201B1

    公开(公告)日:2003-07-22

    申请号:US09607631

    申请日:2000-06-30

    IPC分类号: F21V914

    CPC分类号: G02B5/3083

    摘要: A method for patterning an optical property on a optical element that includes selectively applying an energy source to an optical element to pattern an optical property thereon. A method is disclosed where the optical element includes metal halide particles dispersed in the optical element. A method is also disclosed where localized heating includes pre-heating the optical element and heating a small region of the optical element with sufficient energy for metal halide particles to relax in shape. An additional method is disclosed for patterning an optical property on an optical element that includes fusing pieces of optical element containing the optical property with pieces of optical element without the optical property by heat treatment.

    摘要翻译: 一种用于对光学元件进行图案化的方法,该方法包括选择性地向光学元件施加能量源以对其进行图案化。 公开了一种方法,其中光学元件包括分散在光学元件中的金属卤化物颗粒。 还公开了一种方法,其中局部加热包括预热光学元件并以足够的能量加热光学元件的小区域以使金属卤化物颗粒在形状上放松。 公开了一种用于在光学元件上图案化光学性能的附加方法,该光学元件包括通过热处理而不含有光学特性的光学特性的光学元件的熔合片。

    Photolithography methods and systems
    5.
    发明授权
    Photolithography methods and systems 失效
    光刻方法和系统

    公开(公告)号:US06982232B2

    公开(公告)日:2006-01-03

    申请号:US10842979

    申请日:2004-05-11

    IPC分类号: C03C3/06

    摘要: Lithographic methods are disclosed. In one such method, a pulsed ultraviolet radiation source for producing ultraviolet lithography radiation having a wavelength shorter than about 300 nm at a fluence of less than 10 mJ/cm2/pulse and a high purity fused silica lithography glass having a concentration of molecular hydrogen of between about 0.02×1018 molecules/cm3 and about 0.18×1018 molecules/cm3 are provided. A lithography pattern is formed with the ultraviolet lithography radiation; the lithography pattern is reduced to produce a reduced lithography pattern; and the reduced lithography pattern is projected onto a ultraviolet radiation sensitive lithography medium to form a printed lithography pattern. At least one of the forming, reducing, and projecting steps includes transmitting the ultraviolet lithography radiation through the high purity fused silica lithography glass. Lithography systems and high purity fused silica lithography glass are also described.

    摘要翻译: 公开了平版印刷方法。 在一种这样的方法中,用于产生具有小于约300nm的波长的紫外光刻辐射的脉冲紫外辐射源,其注量小于10mJ / cm 2 /脉冲和高纯度熔融石英光刻 分子氢浓度在约0.02×10 18分子/ cm 3至约0.18×10 18分子/ cm 3之间的玻璃 。 用紫外光刻法形成光刻图案; 光刻图案被减少以产生减小的光刻图案; 并且将还原的光刻图案投影到紫外线照射敏感光刻介质上以形成印刷光刻图案。 形成,还原和突出步骤中的至少一个步骤包括通过高纯度熔融石英光刻玻璃传输紫外光刻辐射。 还描述了平版印刷系统和高纯度熔融石英光刻玻璃。

    Preferred crystal orientation optical elements from cubic materials
    8.
    发明授权
    Preferred crystal orientation optical elements from cubic materials 有权
    来自立方体材料的优选晶体取向光学元件

    公开(公告)号:US06765717B2

    公开(公告)日:2004-07-20

    申请号:US10146761

    申请日:2002-05-15

    IPC分类号: G02B508

    摘要: The invention provides a method of making a crystal direction of the optical calcium fluoride crystal. In a preferred embodiment, the below 194 nm transmitting optical element is a oriented calcium fluoride lens. In a preferred embodiment, the below 194 nm transmitting optical element is a oriented calcium fluoride beam splitter.

    摘要翻译: 本发明提供了一种通过提供具有输入面{100}晶体的光学元件光学氟化钙晶体来制造<194nm波长氟化钙晶体光刻元件,沿着光轴发射具有最小双折射的小于约194nm的波长的方法 并且将具有光轴的光刻元件的光学平版印刷元件表面形成输入面{100}晶面,其光轴与光学氟化钙晶体的<100>晶体方向对准。 在优选实施例中,下述194nm透射光学元件是<100>取向的氟化钙透镜。 在优选实施例中,下述194nm透射光学元件是<100>取向氟化钙分束器。

    Method of making optical fiber devices and devices thereof
    9.
    发明授权
    Method of making optical fiber devices and devices thereof 有权
    制造光纤装置的方法及其装置

    公开(公告)号:US06754429B2

    公开(公告)日:2004-06-22

    申请号:US10183879

    申请日:2002-06-25

    IPC分类号: G02B600

    摘要: The invention provides a method of making optical fiber devices. The method includes providing an ultrashort subpicosecond laser pulse duration pulse laser for producing a laser output with a wavelength &lgr;, providing a laser output focussing lens having an air working distance ≧3 mm and a ≦1 NA numerical aperture for focussing said laser output, providing a controllable positioning translation stage for receiving an optical fiber device oxide bulk glass body, providing an optical fiber device oxide bulk glass body having a transparency at &lgr; of at least 90%/cm, positioning said oxide bulk glass body with said stage wherein said glass body is received by said stage, focussing said laser output through said laser output focussing lens to produce a subpicosecond laser pulse duration focus proximate the oxide bulk glass body and translating the oxide bulk glass body relative to said subpicosecond laser pulse duration focus wherein said focus traces a hole precursor track pattern through the oxide bulk glass body, acid etching the oxide bulk glass body in an agitated heated acid bath wherein the focussed traced hole precursor track pattern is etched into an optical fiber receiving hole, cleansing the acid etched oxide bulk glass body with the etched optical fiber receiving hole, and inserting an optical fiber into the optical fiber receiving hole to provide a hole contained optical fiber.

    摘要翻译: 本发明提供一种制造光纤器件的方法。 该方法包括提供用于产生具有波长λ的激光输出的超短秒亚秒级激光脉冲持续时间脉冲激光器,提供具有空气工作距离> = 3mm的激光输出聚焦透镜和用于聚焦所述激光输出的<= 1NA数值孔径 提供用于接收光纤装置氧化物块体玻璃体的可控定位平移台,提供具有λ至少为90%/ cm 2的透明度的光纤装置氧化物块体玻璃体,将所述氧化物块体玻璃体与所述阶段 所述玻璃体由所述载物台接纳,通过所述激光输出聚焦透镜聚焦所述激光输出,以产生靠近所述氧化物体玻璃体的亚秒级激光脉冲持续时间焦点,并相对于所述亚秒级激光脉冲持续时间焦点平移氧化物体玻璃体,其中所述 焦点通过氧化物块体玻璃体追踪孔前体轨道图案,酸蚀氧化物体积 ass体,其中聚焦的跟踪孔前体轨道图案被蚀刻到光纤接收孔中,用蚀刻的光纤接收孔清洗酸蚀的氧化物块体玻璃体,并将光纤插入到光纤中 接收孔以提供包含光纤的孔。