公开(公告)号：US08654309B2

公开(公告)日：2014-02-18

申请号：US12634242

申请日：2009-12-09

申请人： Nicolaas Rudolf Kemper ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

发明人： Nicolaas Rudolf Kemper ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC分类号： G03B27/42 ,  G03B27/32 ,  G03F7/20 ,  F01N1/02

CPC分类号： G03F7/70341 ,  F01N1/023 ,  G03F7/709

摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US20100149501A1

公开(公告)日：2010-06-17

申请号：US12634242

申请日：2009-12-09

申请人： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

发明人： Nicolaas Rudolf KEMPER ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Michel Riepen ,  Martinus Wilhelmus Van Den Heuvel ,  Paul Petrus Joannes Berkvens ,  Christophe De Metsenaere ,  Jimmy Matheus Wilhelmus Van De Winkel ,  Cornelius Maria Rops

IPC分类号： G03B27/52 ,  B01D69/14 ,  B01D61/36

CPC分类号： G03F7/70341 ,  F01N1/023 ,  G03F7/709

摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.

摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。

公开(公告)号：US07072025B2

公开(公告)日：2006-07-04

申请号：US11118476

申请日：2005-05-02

申请人： Henrikus Herman Marie Cox ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Petrus Matthijs Henricus Vosters ,  Sven Antoin Johan Hol ,  Sebastiaan Maria Johannes Cornelissen

发明人： Henrikus Herman Marie Cox ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Petrus Matthijs Henricus Vosters ,  Sven Antoin Johan Hol ,  Sebastiaan Maria Johannes Cornelissen

IPC分类号： G03B27/42 ,  G03B27/58 ,  G05B5/01

CPC分类号： G03F7/70766 ,  B23Q1/58 ,  B23Q11/0032 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70833 ,  G03F7/709

摘要： A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.

摘要翻译： 一种在平衡块和基板台之间产生反作用力的光刻投影装置。 平衡质量弹性地耦合到基架上，其悬挂本征频率在0.3和10Hz之间。

公开(公告)号：US06906786B2

公开(公告)日：2005-06-14

申请号：US10454839

申请日：2003-06-05

申请人： Henrikus Herman Marie Cox ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Petrus Matthijs Henricus Vosters ,  Sven Antoin Johan Hol ,  Sebastiaan Maria Johannes Cornelissen

发明人： Henrikus Herman Marie Cox ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Petrus Matthijs Henricus Vosters ,  Sven Antoin Johan Hol ,  Sebastiaan Maria Johannes Cornelissen

IPC分类号： B23Q1/58 ,  B23Q11/00 ,  F16F15/02 ,  G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/58 ,  G03B5/01

CPC分类号： G03F7/70766 ,  B23Q1/58 ,  B23Q11/0032 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70833 ,  G03F7/709

摘要： A lithographic projection apparatus in which a reaction force is generated between a balance mass and a substrate table. The balance mass is elastically coupled to the base frame with a suspension eigenfrequency of between 0.3 and 10 Hz.

公开(公告)号：US07361911B2

公开(公告)日：2008-04-22

申请号：US11007579

申请日：2004-12-09

申请人： Johannes Hubertus Josephina Moors ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Vadim Yevgenyevich Banine ,  Gert-Jan Heerens ,  Frederik Theodorus Elisabeth Heuts ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Hendrik Antony Johannes Neerhof

发明人： Johannes Hubertus Josephina Moors ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Vadim Yevgenyevich Banine ,  Gert-Jan Heerens ,  Frederik Theodorus Elisabeth Heuts ,  Johannes Henricus Wilhelmus Jacobs ,  Paulus Martinus Maria Liebregts ,  Hendrik Antony Johannes Neerhof

IPC分类号： B21D53/84

CPC分类号： G03F7/70916 ,  G03F7/70883 ,  G03F7/70908

摘要： A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.

摘要翻译： 一种器件制造方法包括将图案化的辐射束投射通过光学隔室和通道，其在光学隔室和衬底隔室之间提供开放的连接到衬底上，保持电离冲洗气体在通道中的压力高于在 衬底隔室和在光电隔室中，在用电离冲洗气体从衬底发射的颗粒中突出，截留颗粒时，使用耦合到与至少一个 隔室，并且在通道的壁与出口和/或泵的转子之间建立电势差，使得泵的出口和/或转子吸引来自于冲洗气体的带正电荷的离子 渠道。

公开(公告)号：US07030967B2

公开(公告)日：2006-04-18

申请号：US10738987

申请日：2003-12-19

申请人： Robertus Nicodemus Jacobus Van Ballegoij ,  Martinus Agnes Willem Cuijpers ,  Pieter Johannes Gertrudis Meijers ,  Gerardus Petrus Matthijs Van Nunen ,  Joost Jeroen Ottens

发明人： Robertus Nicodemus Jacobus Van Ballegoij ,  Martinus Agnes Willem Cuijpers ,  Pieter Johannes Gertrudis Meijers ,  Gerardus Petrus Matthijs Van Nunen ,  Joost Jeroen Ottens

IPC分类号： G03B27/58 ,  G03B27/42

CPC分类号： G03F7/707 ,  G03F7/70783

摘要： A substrate holder has burls having a height not less than 100 μm and at least 10 vacuum ports arranged within a central region extending to a radius of two thirds the radius of the substrate. Thereby concave wafers can be reliably clamped by generating an initial vacuum in a central region which exerts a clamping force tending to flatten the wafer and allowing the initial vacuum to deepen until the wafer is fully clamped.

摘要翻译： 衬底保持器具有高度不小于100μm的孔，并且至少10个真空端口布置在延伸到衬底半径的三分之一半径的中心区域内。 由此，可以通过在中心区域产生初始真空来可靠地夹紧凹形晶片，该中心区域施加趋于平坦化晶片的夹紧力并允许初始真空加深直到晶片完全夹紧。