公开(公告)号：US20030137644A1

公开(公告)日：2003-07-24

申请号：US10382874

申请日：2003-03-07

Applicant: Nikon Corporation

Inventor： Masashi Tanaka ,  Masato Kumazawa ,  Kinya Kato ,  Masaki Kato ,  Hiroshi Chiba ,  Hiroshi Shirasu

IPC: G03B027/54

CPC classification number: G02B17/0892 ,  G02B13/22 ,  G02B17/002 ,  G02B17/008 ,  G02B17/045 ,  G02B17/0605 ,  G02B17/08 ,  G02B17/0812 ,  G02B17/082 ,  G02B17/0828 ,  G02B17/086 ,  G02B27/144 ,  G02B27/145 ,  G03B27/32 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791

Abstract: There is disclosed an exposure apparatus for, while moving a first object and a second object in a certain moving direction, effecting projection exposure of an image of the first object onto the second object.

Abstract translation: 公开了一种曝光装置，用于在一定移动方向上移动第一物体和第二物体时，将第一物体的图像投射到第二物体上。

公开(公告)号：US20020021431A1

公开(公告)日：2002-02-21

申请号：US09955116

申请日：2001-09-19

Applicant: NIKON CORPORATION

Inventor： Tomohide Hamada ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kinya Kato

IPC: G03B027/42

CPC classification number: G03F7/70775 ,  G03F7/70358 ,  G03F7/70716 ,  G03F9/70

Abstract: A projection exposure apparatus is provided. The projection exposure apparatus includes an illumination optical system for illuminating a portion of a mask pattern on a mask with an exposing radiation flux of a predetermined shape, a fixed support, a projection optical system fixed to the fixed support for projecting the image of the illuminated portion of the mask pattern onto a substrate, and a carriage for integrally holding the mask and the substrate, the carriage being movable in a predetermined direction with respect to the projection optical system to successively exposing the substrate with the image of the mask pattern formed by the exposing radiation flux. The projection exposure apparatus further includes a long mirror elongated in the predetermined direction and fixed to the fixed support, the length of the long mirror being at least equal to the stroke of the carriage movement in the predetermined direction, and a measurement system for measuring the position of the mask and the position of the substrate with respect to the long mirror to determine the position of the mask relative to the substrate in a direction perpendicular to the predetermined direction.

Abstract translation: 提供投影曝光装置。 投影曝光装置包括：照射光学系统，用于以掩模形式曝光掩模图案的一部分，其具有预定形状的曝光辐射通量;固定支架;固定在固定支架上的投影光学系统，用于投射照明图像 掩模图案的一部分到基板上，以及滑架，用于一体地保持掩模和基板，托架可相对于投影光学系统沿预定方向移动，以使基板与由 曝光辐射通量。 投影曝光装置还包括在预定方向上延伸并固定到固定支撑件上的长镜，长反射镜的长度至少等于滑架在预定方向上的行程的行程，以及测量系统 掩模的位置和基板相对于长镜的位置，以确定掩模相对于基板在垂直于预定方向的方向上的位置。

公开(公告)号：US20040251428A1

公开(公告)日：2004-12-16

申请号：US10816467

申请日：2004-03-31

Applicant: Nikon Corporation.

Inventor： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

IPC: G21K007/00

CPC classification number: H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

Abstract: Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (nullEnullBnull). Upon passing through the EnullB, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the EnullB in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the EnullB. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the EnullB is in the same position as the image formed on the detector when electrical voltage and current are applied to the EnullB. Also provided are nullevaluation chartsnull for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

Abstract translation: 公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。 在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。 当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。 这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。 理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。

公开(公告)号：US20010017694A1

公开(公告)日：2001-08-30

申请号：US09781957

申请日：2001-02-14

Applicant: NIKON CORPORATION

Inventor： Takeo Oomori ,  Kinya Kato

IPC: G01N021/00

CPC classification number: G01N21/956 ,  G01N21/8806

Abstract: An illumination optical system for illuminating a substrate and a light receiving optical system that receives diffracted light from the wafer are provided in a defect inspection apparatus that inspects for a defect present at the wafer based upon an image of the wafer obtained at the light-receiving optical system, with a numerical aperture at the illumination optical system set different from a numerical aperture at the light-receiving optical system and the absolute value of the difference between the numerical apertures at the illumination optical system and the light-receiving optical system set at a value equal to or larger than the quantity of the angular offset manifesting between the direction along which the diffracted light advances and the direction along which an optical axis of the light-receiving optical system extends. As a result, highly reliable inspection results by preventing the contrast of an image of a substrate formed by diffracted light from becoming lowered either in its entirety or in part is achieved even when there is an angular offset between the direction in which the diffracted light from the substrate advances and the direction of the optical axis of a light-receiving system.

Abstract translation: 用于照射基板的照明光学系统和从晶片接收衍射光的光接收光学系统设置在缺陷检查装置中，该缺陷检查装置基于在光接收时获得的晶片的图像来检查存在于晶片的缺陷 光学系统，其在照明光学系统处的数值孔径与光接收光学系统的数值孔径不同，并且照明光学系统和设置在光接收光学系统的光接收光学系统的数值孔径之间的差的绝对值 在衍射光的前进方向与受光光学系统的光轴延伸的方向之间的角度偏移量的数量以上的值等于或大于该值。 因此，通过防止由衍射光形成的基板的图像的对比度全部或部分地降低而实现的高度可靠的检查结果即使当在衍射光的衍射光的方向之间存在角度偏移时， 基板前进并且光接收系统的光轴的方向。