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    SYNTHETIC GRINDING STONE
    8.
    发明申请
    SYNTHETIC GRINDING STONE 有权
    合成磨石

    公开(公告)号：US20100037530A1

    公开(公告)日：2010-02-18

    申请号：US12450366

    申请日：2008-03-25

    申请人： Yuji Yoshida ,  Hiroshi Eda ,  Libo Zhou ,  Masaaki Kenmochi ,  Yoshiaki Tashiro ,  Sumio Kamiya ,  Hisao Iwase ,  Teruki Yamashita ,  Noboru Otake

    发明人： Yuji Yoshida ,  Hiroshi Eda ,  Libo Zhou ,  Masaaki Kenmochi ,  Yoshiaki Tashiro ,  Sumio Kamiya ,  Hisao Iwase ,  Teruki Yamashita ,  Noboru Otake

    IPC分类号： B24D3/28 ,  B24D3/00

    CPC分类号： B24D3/28 ,  B24B37/24 ,  B24B37/245 ,  B24D3/32

    摘要： Disclosed is a synthetic grinding stone used for polishing of silicon wafer, which is composed of a structure comprising cerium oxide fine particles as abrasive grain, a resin as a binder, a salt as a filler and a nano diamond as an additive. This synthetic grinding stone is characterized in that the purity of the cerium oxide is not less than 60% by weight, the content of the salt as a filler is not less than 1% but not more than 20%, the volume content of the nano diamond as an additive is not less than 0.1% but less than 20% relative to the total volume of the structure, and the porosity as the volume fraction relative to the total volume of the structure is less than 30%.

    摘要翻译： 公开了一种用于抛光硅晶片的合成研磨石，其由包含作为磨粒的氧化铈微粒，作为粘合剂的树脂，作为填料的盐和作为添加剂的纳米金刚石的结构组成。 该合成研磨石的特征在于，氧化铈的纯度为60重量％以上，作为填料的盐的含量为1％以上20％以下，纳米粒子的体积含量 作为添加剂的金刚石相对于该结构体的总体积不小于0.1％但小于20％，相对于该结构体积的体积分数的孔隙率小于30％。

    Antibiotic, Spicamycin
    9.
    发明授权
    Antibiotic, Spicamycin 失效
    抗生素，Spicamycin

    公开(公告)号：US4565781A

    公开(公告)日：1986-01-21

    申请号：US583108

    申请日：1984-02-24

    申请人： Noboru Otake ,  Yoichi Hayakawa ,  Hiroyuki Kawai ,  Masaya Nakagawa ,  Kozo Tanabe ,  Junichiro Mochizuki

    发明人： Noboru Otake ,  Yoichi Hayakawa ,  Hiroyuki Kawai ,  Masaya Nakagawa ,  Kozo Tanabe ,  Junichiro Mochizuki

    IPC分类号： A61K31/70 ,  A61K31/7042 ,  A61K31/7052 ,  A61P31/04 ,  A61P35/00 ,  C07H17/02 ,  C12P1/06 ,  C12P19/28 ,  C12P19/32 ,  C12R1/465 ,  C12P19/40 ,  C07H19/06

    CPC分类号： C07H17/02

    摘要： An antibiotic, Spicamycin, having the physicochemical properties set forth below is produced by aerobically cultivating a Spicamycin-producing Streptomyces strain in a suitable culture medium, and recovering from the culture the antibiotic, Spicamycin.(1) Color and properties: Weakly acidic white powder(2) Melting point: 215.degree. to 220.degree. C. (decomposed)(3) Specific rotatory power: [.alpha.].sub.D.sup.25 =+15.degree. (C: 0.15, in methanol)(4) Elementary analysis (Found): C: 57.4%, H: 8.3%; N: 15.7%, O: 18.6%(5) Ultraviolet absorption spectrum (maximum):______________________________________ CH.sub.3 OH 264 nm (E.sub.1cm.sup.1% 257) 0.01N NaOH + CH.sub.3 OH 272 nm (E.sub.1cm.sup.1% 226) 0.01N HCl + CH.sub.3 OH 273 nm (E.sub.1cm.sup.1% 258) ______________________________________ (6) Infrared absorption spectrum (as measured by the potassium bromide method): As shown in FIG. 2.(7) Solubility in Solvent: Soluble in basic water, dimethyl sulfoxide, methanol, ethanol, n-propanol, and n-butanol. Sparingly soluble in water, acetone, ethyl acetate, and chloroform. Insoluble in benzene, ethyl ether, and hexane.(8) Thin layer chromatography (using "Silica Gel 60F.sub.254 " plate supplied by Merck & Co., Inc.):______________________________________ Developing solvent Rf value ______________________________________ Chloroform:Methanol (1:1) 0.34 ______________________________________ (9) NMR spectrum (400 MHz, in deuteromethanol): As shown in FIG. 3.

    摘要翻译： 具有下述物理化学性质的抗生素Spicamycin通过在合适的培养基中有条不紊地培养产生Spicamycin的链霉菌菌株产生，并从培养物中回收抗生素Spicamycin。 （1）颜色和性质：弱酸性白色粉末（2）熔点：215〜220℃（分解）（3）比旋光度：αD25= + 15℃（甲醇中C：0.15） （4）元素分析（实测值）：C：57.4％，H：8.3％ N：15.7％，O：18.6％（5）紫外吸收光谱（最大）：-CH 3 OH 264nm（E1cm1％257）-0.01N NaOH + CH3OH 272nm（E1cm1％226）-0.01N HCl + CH3OH 273nm E1cm1％258） - （6）红外吸收光谱（通过溴化钾法测定）：如图1所示。 （7）溶剂中的溶解度：溶于碱性水，二甲基亚砜，甲醇，乙醇，正丙醇和正丁醇。 微溶于水，丙酮，乙酸乙酯和氯仿。 不溶于苯，乙醚和己烷。 （8）薄层色谱法（使用由Merck＆Co.，Inc。提供的“Silica Gel 60F254”板）：显影溶剂Rf值 - 氯仿：甲醇（1：1）0.34 - （9）NMR谱（400MHz， 在氘甲醇中）： 3。