公开(公告)号：US20060082755A1

公开(公告)日：2006-04-20

申请号：US11289472

申请日：2005-11-30

申请人： Kotaro Akutsu ,  Nobushige Korenaga ,  Mitsuru Inoue

发明人： Kotaro Akutsu ,  Nobushige Korenaga ,  Mitsuru Inoue

IPC分类号： G03B27/58

CPC分类号： G03F7/70808 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70816 ,  H01J37/20 ,  H01J2237/20292 ,  H01J2237/3175 ,  H02K1/278 ,  H02K16/00 ,  H02K41/031 ,  H02K2201/18

摘要： A stage system that can meet enlargement of a stroke and thus, particularly, that can be suitably incorporated into an electron beam exposure apparatus. The stage system includes a first fixed guide having a plane along X and Y directions, a first movable guide to be guided by the first fixed guided (the first movable guide having a Y guide 3f extending in the Y direction), a second fixed guide having a plane along X and Y directions, a second movable guide to be guided by the second fixed guide (the second movable guide having an X guide extending in the X direction), and a central movable member to be guided in the X and Y directions by the Y guide and the X guide.

摘要翻译： 能够满足行程的放大，特别是可以适合地并入电子束曝光装置的舞台系统。 舞台系统包括具有沿X和Y方向的平面的第一固定引导件，由第一固定引导（第一可移动引导件具有沿Y方向延伸的Y引导件3f）引导的第一可移动引导件，第二固定引导件 引导件沿着X和Y方向具有平面，第二可移动引导件由第二固定引导件（具有在X方向上延伸的X引导件的第二可移动引导件）引导，以及在X中被引导的中心可移动元件，以及 Y方向由Y指导和X指导。

公开(公告)号：US07030964B2

公开(公告)日：2006-04-18

申请号：US10862383

申请日：2004-06-08

申请人： Kotaro Akutsu ,  Nobushige Korenaga ,  Mitsuru Inoue

发明人： Kotaro Akutsu ,  Nobushige Korenaga ,  Mitsuru Inoue

IPC分类号： G03B27/42 ,  G03B27/58 ,  H01J37/08 ,  H02K41/00

CPC分类号： G03F7/70808 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70816 ,  H01J37/20 ,  H01J2237/20292 ,  H01J2237/3175 ,  H02K1/278 ,  H02K16/00 ,  H02K41/031 ,  H02K2201/18

摘要： A stage system including a first fixed guide having a first guide surface being parallel to a first direction and a second direction being orthogonal to the first direction, a first movable guide to be guided by the first fixed guide and having three freedoms of straight motions in the first and second directions and a motion in a rotational direction about a third direction being orthogonal to the first and second directions, the first movable guide extending in the second direction, a second fixed guide having a second guide surface being parallel to the first and second directions, a second movable guide to be guided by the second fixed guide and having three freedoms of straight motions in the first and second directions and a motion in a rotational direction about the third direction, the second movable guide having a second guide extending in the first direction, and a movable member to be guided in the first and second directions by the first and second movable guides.

摘要翻译： 一种舞台系统，包括：第一固定导向器，具有平行于第一方向的第一导向表面和与第一方向正交的第二方向;第一可移动引导件，由第一固定引导件引导，并且具有三个直线运动自由度 所述第一和第二方向以及围绕第三方向的旋转方向的运动与所述第一和第二方向正交，所述第一可移动引导件沿所述第二方向延伸;第二固定引导件，其具有与所述第一和第二方向平行的第二引导表面， 第二方向，由第二固定引导件引导并且具有在第一和第二方向上的直线运动的三个自由度的第二可移动引导件和围绕第三方向的旋转方向的运动，第二可移动引导件具有延伸到第二方向的第二引导件 第一方向，以及通过第一和第二可移动引导件在第一和第二方向上被引导的可动构件。

公开(公告)号：US20050018166A1

公开(公告)日：2005-01-27

申请号：US10862383

申请日：2004-06-08

申请人： Kotaro Akutsu ,  Nobushige Korenaga ,  Mitsuru Inoue

发明人： Kotaro Akutsu ,  Nobushige Korenaga ,  Mitsuru Inoue

IPC分类号： H01L21/68 ,  G03F7/20 ,  H01J37/20 ,  H01L21/027 ,  H02K41/03 ,  G03B27/58

CPC分类号： G03F7/70808 ,  G03F7/70716 ,  G03F7/70758 ,  G03F7/70816 ,  H01J37/20 ,  H01J2237/20292 ,  H01J2237/3175 ,  H02K1/278 ,  H02K16/00 ,  H02K41/031 ,  H02K2201/18

摘要： Disclosed is a stage system that can meet enlargement of a stroke and thus, particularly, that can be suitably incorporated into an electron beam exposure apparatus. The stage system includes a first fixed guide (1a, 1c) having a plane along X and Y directions, a first movable guide (3) to be guided by the first fixed guided (the first movable guide having a Y guide 3f extending in Y direction), a second fixed guide (1b, 1d) having a plane along X and Y directions, a second movable guide (2) to be guided by the second fixed guide (the second movable guide having an X guide 2f extending in X direction), and a central movable member (4) to be guided in the X and Y directions by the Y guide (3f) and X guide (2f).

摘要翻译： 公开了一种能够满足行程放大的舞台系统，特别是可以适当地并入电子束曝光装置中。 舞台系统包括具有沿X和Y方向的平面的第一固定导轨（1a，1c），由第一固定导向（第一可移动导轨具有在Y延伸的Y导引件3f）引导的第一可移动导向件 方向），具有沿X和Y方向的平面的第二固定引导件（1b，1d），由所述第二固定引导件引导的第二可移动引导件（所述第二可移动引导件具有在X方向上延伸的X引导件2f ）和通过Y引导件（3f）和X引导件（2f）在X和Y方向上被引导的中心可动构件（4）。

公开(公告)号：US06172738B2

公开(公告)日：2001-01-09

申请号：US08934134

申请日：1997-09-19

申请人： Nobushige Korenaga ,  Mitsuru Inoue

发明人： Nobushige Korenaga ,  Mitsuru Inoue

IPC分类号： G03B2742

CPC分类号： G03F7/707 ,  G03F7/70358 ,  G03F7/70816

摘要： A scanning exposure apparatus includes a projection optical system, a reticle stage for scanningly moving a reticle relative to the projection optical system a wafer stage for scanningly moving a wafer relative to the projection optical system, in a timed relation with the reticle scan movement, and a holding mechanism for holding the reticle on the reticle stage during the reticle scan movement. The holding mechanism includes a first mechanism for confining an end edge portion of the reticle in a scan direction and a second mechanism for pressing the reticle in a direction perpendicular to a pattern surface of the reticle.

摘要翻译： 扫描曝光装置包括投影光学系统，用于相对于投影光学系统相对于投影光学系统以相对于投影光学系统扫描移动晶片的晶片台相对于掩模版扫描运动以定时关系扫描地移动掩模版的掩模版台，以及 保持机构，用于在掩模版扫描运动期间将掩模版保持在标线片台上。 保持机构包括用于将掩模版的端边缘部分沿扫描方向限制的第一机构和用于在垂直于掩模版的图案表面的方向上按压光罩的第二机构。

公开(公告)号：US06320645B1

公开(公告)日：2001-11-20

申请号：US09324652

申请日：1999-06-03

申请人： Mitsuru Inoue ,  Nobushige Korenaga ,  Yukio Tokuda

发明人： Mitsuru Inoue ,  Nobushige Korenaga ,  Yukio Tokuda

IPC分类号： G03B2742

CPC分类号： G03F7/70691 ,  G03B27/42 ,  Y10T74/20354

摘要： A stage system includes a movable stage, a guide mechanism for guiding the stage with respect to a predetermined direction, and a preloading mechanism for producing a magnetic attraction force with which the rigidity of the guide mechanism can be increased, wherein a portion to be attracted by the magnetic attraction force is made of a material having a product of a residual magnetic flux density Br and a holding force Hc in a hysteresis curve, not greater than 100 J/m3, this being very effective to reduce the hysteresis force, which is resistance due to the residual magnetic force, as compared with the preloading attraction force, whereby high precision positioning of the stage is accomplished.

摘要翻译： 舞台系统包括可动台，用于相对于预定方向引导舞台的引导机构，以及用于产生引力机构的刚性的磁吸引力的预加载机构，其中吸引的部分 通过磁吸引力由具有残余磁通密度Br和滞后曲线中的保持力Hc的乘积的材料制成，不大于100J / m 3，这对减小滞后力是非常有效的，这是非常有效的 与预载吸引力相比，由于剩余磁力产生的阻力，从而实现了台的高精度定位。

公开(公告)号：US08810770B2

公开(公告)日：2014-08-19

申请号：US13157618

申请日：2011-06-10

申请人： Yuji Maehara ,  Nobushige Korenaga

发明人： Yuji Maehara ,  Nobushige Korenaga

IPC分类号： G03B27/52 ,  G03B27/58 ,  G03B27/60

CPC分类号： G03F7/70875 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/20 ,  H01J37/3174 ,  H01J2237/2001 ,  H01J2237/2482

摘要： An apparatus for exposing a substrate to an energy in a vacuum includes a substrate stage having a mirror surface; a mirror configured to deflect a light into a Z axis direction; a measuring device configured to measure the stage position in the Z axis direction with the light in which the mirror surface is irradiated; a driving device configured to move the measuring device so that the mirror surface is irradiated with the light; an optical system configured to project the energy onto the substrate; and a cooling device including a radiation plate (arranged between the optical system and the stage in the Z axis direction and having a first opening which the energy passes and a second opening which the light passes), including a cooler configured to cool the first radiation plate, and configured to perform radiation cooling of the substrate.

摘要翻译： 用于将衬底暴露于真空中的能量的装置包括具有镜面的衬底台; 配置为将光偏转到Z轴方向的反射镜; 测量装置，被配置为用照射所述镜面的光来测量所述Z轴方向上的所述平台位置; 驱动装置，其构造成使所述测量装置移动，使得所述镜面被所述光照射; 配置成将能量投射到基板上的光学系统; 以及冷却装置，其包括辐射板（布置在所述光学系统和所述台架之间的Z轴方向上并且具有所述能量通过的第一开口和所述光通过的第二开口），所述冷却装置包括冷却器，所述冷却器被配置为冷却所述第一辐射 并且被配置为执行基板的辐射冷却。

公开(公告)号：US07282819B2

公开(公告)日：2007-10-16

申请号：US10983573

申请日：2004-11-09

申请人： Nobushige Korenaga

发明人： Nobushige Korenaga

IPC分类号： H02K41/00 ,  G03B27/42

CPC分类号： H02K41/03 ,  G03F7/70758 ,  H02K2201/18 ,  Y10T74/20201

摘要： A stage apparatus in which support units supporting a counter-mass surface plate on a reference surface each include a first permanent magnet disposed on one of the surface plate and the reference surface, and a pair of second permanent magnets disposed on the other of the surface plate and the reference surface so as to sandwich the first permanent. This stage apparatus is arranged to satisfy the following relations: (1) [(stroke of movement of the stage in a first direction)×(mass of moving portion of the stage in the first direction)/(mass of surface plate)]

摘要翻译： 其中支撑在基准面上的反质量面板的支撑单元的平台装置包括设置在所述表面板和参考表面之一上的第一永磁体和设置在所述表面的另一个表面上的一对第二永磁体 板和参考表面，以便夹持第一永久物。 该台装置被配置为满足以下关系：（1）[（第一方向的台阶的移动行程）×（第一方向的台的移动部的质量）/（表面板的质量）] [第一方向上的第一和第二永久磁铁之间的空间总和]; 和/或（2）[（阶段在第二方向的移动行程）x（阶段在第二方向的移动部分的质量）/（表面板的质量）] <[ 第二永久磁铁面对第一永久磁铁的第二方向]。

公开(公告)号：US07075197B2

公开(公告)日：2006-07-11

申请号：US11068784

申请日：2005-03-02

申请人： Nobushige Korenaga

发明人： Nobushige Korenaga

IPC分类号： H02K41/00 ,  H02K7/09

CPC分类号： G03F7/70758 ,  H02K3/47 ,  H02K16/02 ,  H02K41/031 ,  H02K2201/18

摘要： An aligning apparatus includes a moving member, a magnetic member arranged vertically above the moving member, a stator unit which is arranged vertically below the moving member and has a plurality of coreless coils, a first magnet unit which is provided to the moving member and generates a force with the magnetic member, and a second magnet unit which is provided to the moving member and generates a force with the stator unit. The aligning apparatus has no coils between the magnetic member and the moving member.

摘要翻译： 一种定位装置，包括移动构件，垂直于移动构件上方布置的磁性构件，定子单元，其垂直设置在移动构件的下方并具有多个无芯线圈;第一磁体单元，设置在移动构件上，并产生 具有磁性构件的力，以及第二磁体单元，其设置在所述移动构件上并与所述定子单元产生力。 对位装置在磁性构件和移动构件之间没有线圈。

公开(公告)号：US07057710B2

公开(公告)日：2006-06-06

申请号：US10893932

申请日：2004-07-20

申请人： Nobushige Korenaga

发明人： Nobushige Korenaga

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70716 ,  G03F7/70758

摘要： A stage system that reduces disturbances caused by deformation of a cable and achieves high-precision positioning. The stage system includes a substrate stage movable in at least two axial directions, a fine-motion cable unit that holds a cable and finely moves in at least two axial directions, and a coarse-motion cable unit that coarsely moves the fine-motion cable unit in at least one axial direction.

摘要翻译： 一种降低电缆变形引起的干扰并实现高精度定位的舞台系统。 舞台系统包括可沿至少两个轴向移动的衬底台，保持电缆并沿至少两个轴向精细移动的精细运动电缆单元，以及粗动电缆单元，其将细微运动电缆 在至少一个轴向方向上单元。

公开(公告)号：US20050194843A1

公开(公告)日：2005-09-08

申请号：US11068784

申请日：2005-03-02

申请人： Nobushige Korenaga

发明人： Nobushige Korenaga

IPC分类号： H01L21/68 ,  G03F7/20 ,  H01L21/027 ,  H02K9/19 ,  H02K41/03 ,  H02K41/00

CPC分类号： G03F7/70758 ,  H02K3/47 ,  H02K16/02 ,  H02K41/031 ,  H02K2201/18

摘要： A aligning apparatus includes a moving member, a magnetic member arranged vertically above the moving member, a stator unit which is arranged vertically below the moving member and has a plurality of coreless coils, a first magnet unit which is provided to the moving member and generates a force with the magnetic member, and a second magnet unit which is provided to the moving member and generates a force with the stator unit. High accurate aligning can be performed while suppressing coil heat generation.

摘要翻译： 定位装置包括移动构件，垂直于移动构件上方布置的磁性构件，定子单元，其垂直地设置在移动构件下方并具有多个无芯线圈;第一磁体单元，设置在移动构件上并产生 具有磁性构件的力，以及第二磁体单元，其设置在所述移动构件上并与所述定子单元产生力。 可以在抑制线圈发热的同时进行高精度对准。