公开(公告)号：US5223693A

公开(公告)日：1993-06-29

申请号：US659691

申请日：1991-02-25

申请人： Nobuyuki Zumoto ,  Toshinori Yagi ,  Yasuhito Myoi ,  Yoshie Uchiyama ,  Masaaki Tanaka ,  Teruo Miyamoto ,  Masao Izumo

发明人： Nobuyuki Zumoto ,  Toshinori Yagi ,  Yasuhito Myoi ,  Yoshie Uchiyama ,  Masaaki Tanaka ,  Teruo Miyamoto ,  Masao Izumo

IPC分类号： B23K26/06 ,  G03F1/00 ,  G03F7/20 ,  H05K3/00

CPC分类号： G03F7/70283 ,  B23K26/066 ,  G03F7/2006 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/702 ,  H05K3/0017

摘要： An optical machining apparatus for irradiating light from a light source onto a source to be machined to form a grooves in the surface. The apparatus uses a mask disposed in the path of light from the light source. The mask includes reflective parts for reflecting the light from the light source. The reflective parts are on a first surface of the mask. The mask also includes a reflection member for returning the light reflected at the reflective parts of the mask toward the mask.

摘要翻译： 一种用于将来自光源的光照射到要加工的源上以在表面中形成凹槽的光学加工设备。 该设备使用设置在来自光源的光的路径中的掩模。 掩模包括用于反射来自光源的光的反射部分。 反射部分位于掩模的第一表面上。 掩模还包括用于将在掩模的反射部分反射的光返回到掩模的反射构件。

公开(公告)号：US5355194A

公开(公告)日：1994-10-11

申请号：US888782

申请日：1992-05-27

申请人： Nobuyuki Zumoto ,  Toshinori Yagi ,  Yasuhito Myoi ,  Teruo Miyamoto ,  Masaaki Tanaka ,  Masao Izumo

发明人： Nobuyuki Zumoto ,  Toshinori Yagi ,  Yasuhito Myoi ,  Teruo Miyamoto ,  Masaaki Tanaka ,  Masao Izumo

IPC分类号： B23K26/00 ,  B23K26/06 ,  B23K26/38 ,  G03F1/00 ,  G03F1/68 ,  G03F7/20 ,  H01S3/101 ,  H05K3/00 ,  G02B17/00

CPC分类号： G03F7/2008 ,  B23K26/066 ,  H05K3/0017

摘要： An optical processing apparatus utilizing multiple reflections of a light beam between a mask and a reflector has improved uniformity in the distribution of the light beam over a surface of the mask. In one form, the reflector is disposed in a face-to-face relation with respect to the mask with an angle of inclination relative thereto. In another form, the reflector has a flat or curved taper surface for decreasing an angle of reflection of the light beam at the mask surface at an initial stage, and a flat surface disposed in parallel with the mask surface. In a further form, the reflector is curved in a direction of transmission of the light beam. In a yet further form, an angle of incidence of the light beam is properly adjusted such that a portion of the light beam, which is first reflected from the mask and escapes outwardly from the reflector, is minimized.

摘要翻译： 在掩模和反射器之间利用光束的多次反射的光学处理装置改善了光束在掩模表面上的分布的均匀性。 在一种形式中，反射器相对于掩模以相对于掩模的倾斜角度的面对面关系设置。 在另一种形式中，反射器具有平坦或弯曲的锥形表面，用于在初始阶段减小光掩模在掩模表面处的反射角度，以及与掩模表面平行设置的平坦表面。 在另一形式中，反射器在光束的透射方向上弯曲。 在另一种形式中，光束的入射角被适当调节，使得首先从掩模反射并从反射器向外逸出的光束的一部分被最小化。

公开(公告)号：US5684642A

公开(公告)日：1997-11-04

申请号：US331367

申请日：1994-10-27

申请人： Nobuyuki Zumoto ,  Teruo Miyamoto ,  Toshinori Yagi ,  Masaaki Tanaka

发明人： Nobuyuki Zumoto ,  Teruo Miyamoto ,  Toshinori Yagi ,  Masaaki Tanaka

IPC分类号： B23K26/04 ,  B23K26/06 ,  B23K26/073 ,  B23K26/08 ,  G02B6/26 ,  G02B6/42 ,  G02B26/08 ,  G03F7/20 ,  G02B9/00

CPC分类号： B23K26/0608 ,  B23K26/032 ,  B23K26/06 ,  B23K26/0604 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0652 ,  B23K26/066 ,  B23K26/0665 ,  G02B26/0816 ,  G02B26/0875 ,  G02B6/262 ,  G02B6/4206 ,  G02B6/4296 ,  G03F7/2006

摘要： An optical transmission system permitting any desired machining to be done by radiating to an object to be irradiated a laser beam having an optimum intensity distribution in the direction of its optical axis or in a plane perpendicular to the optical axis, comprising a laser oscillator 1, an optical fiber 3 for propagating the laser beam emitted from the laser oscillator 1 by a predetermined distance, a condenser lens 2 for converging the laser beam from the laser oscillator 1 into the optical fiber 3, a first lens 6 for forming images with aberration from the laser beam emerging from the optical fiber 3, a mask 7 disposed in a position having a predetermined light intensity distribution out of the positions of the images formed by the first lens 6, and a second lens 4 for forming the image passing through the mask 7 onto an object 5 to be irradiated.

摘要翻译： 一种光传输系统，其允许通过向被照射的物体照射具有在其光轴方向上的最佳强度分布或垂直于光轴的平面中的激光束来进行所需的加工，包括激光振荡器1， 用于将从激光振荡器1发射的激光束传播预定距离的光纤3，用于将来自激光振荡器1的激光束会聚到光纤3中​​的聚光透镜2，用于形成具有像差的图像的第一透镜6 从光纤3出射的激光束，设置在由第一透镜6形成的图像的位置之外具有预定的光强度分布的位置的掩模7和用于形成通过掩模的图像的第二透镜4 7到待照射的物体5上。

公开(公告)号：US5815221A

公开(公告)日：1998-09-29

申请号：US565249

申请日：1995-11-30

申请人： Masanori Kojima ,  Ko Nishino ,  Yasuhito Myoi ,  Masaaki Tanaka ,  Teruo Miyamoto ,  Fumio Suzuki ,  Fumio Itoh ,  Yoshisuke Otsuru

发明人： Masanori Kojima ,  Ko Nishino ,  Yasuhito Myoi ,  Masaaki Tanaka ,  Teruo Miyamoto ,  Fumio Suzuki ,  Fumio Itoh ,  Yoshisuke Otsuru

IPC分类号： G02F1/13 ,  G02B27/28 ,  G02F1/1335 ,  G02F1/13357 ,  G02F1/1347 ,  H04N9/31

CPC分类号： H04N9/3188 ,  H04N9/3105 ,  G02F1/133536 ,  G02F1/13362 ,  G02F2001/13355

摘要： A polarizing beam splitter extracts orthogonally polarized light beams from natural light and distributes those to liquid crystal panels, which modulate polarization states of those polarized light beams in accordance with a luminance signal and chrominance signals of video signals, respectively. The modulated light beams are combined by the same polarizing beam splitter, and the combined light is enlarged and projected onto a screen by a projection lens, to reproduce a projected image.

摘要翻译： 偏振光束分离器从自然光中提取正交偏振光束，并将其分配到液晶面板，液晶面板分别根据视频信号的亮度信号和色度信号调制偏振光束的偏振状态。 调制光束由相同的偏振分束器组合，并且组合的光被投影透镜放大并投影到屏幕上，以再现投影图像。

公开(公告)号：US5864374A

公开(公告)日：1999-01-26

申请号：US625004

申请日：1996-03-29

申请人： Toshio Ito ,  Yoshisuke Ohtsuru ,  Hisao Koizumi ,  Takio Okuda ,  Yasuhito Myoi ,  Toshimasa Tomoda ,  Masaaki Tanaka ,  Teruo Miyamoto ,  Toyomi Ohshige ,  Toshiyuki Yoneda ,  Fumio Suzuki ,  Kou Nishino ,  Kazuaki Matoba ,  Masanori Kojima ,  Hiroshi Kawamura ,  Kenji Kimura ,  Kenji Samejima ,  Naoki Kawamoto ,  Miki Fukada ,  Haruhiko Nagai ,  Kenji Maeno

发明人： Toshio Ito ,  Yoshisuke Ohtsuru ,  Hisao Koizumi ,  Takio Okuda ,  Yasuhito Myoi ,  Toshimasa Tomoda ,  Masaaki Tanaka ,  Teruo Miyamoto ,  Toyomi Ohshige ,  Toshiyuki Yoneda ,  Fumio Suzuki ,  Kou Nishino ,  Kazuaki Matoba ,  Masanori Kojima ,  Hiroshi Kawamura ,  Kenji Kimura ,  Kenji Samejima ,  Naoki Kawamoto ,  Miki Fukada ,  Haruhiko Nagai ,  Kenji Maeno

IPC分类号： G03B33/12 ,  G02F1/13 ,  G02F1/1335 ,  G02F1/13357 ,  G03B21/00 ,  G03B21/14 ,  H04N9/31 ,  H04N5/74

CPC分类号： H04N9/3105

摘要： A dichroic mirror for reflecting red light for optical separating and a dichroic mirror for reflecting red light for optical synthesizing are installed on the same plane in an image generating apparatus of the present invention. In addition, a dichroic mirror for reflecting blue light for optical separating and a dichroic mirror for reflecting blue light for optical synthesizing are installed on the same plane. Accordingly, a compact configuration can be realized. Since a main reflecting mirror is a rotating elliptic mirror and a lamp is located on a focus or around the focus, a lighting equipment which irradiates conic luminous flux can be realized.

摘要翻译： 用于反射用于光学分离的红光的分色镜和用于反射用于光学合成的红光的分色镜安装在本发明的图像生成装置的同一平面上。 此外，用于反射用于光学分离的蓝色光的分色镜和用于反射用于光学合成的蓝色光的分色镜安装在同一平面上。 因此，可以实现紧凑的结构。 由于主反射镜是旋转的椭圆镜，并且灯位于焦点或焦点周围，所以可以实现照射圆锥光束的照明设备。

公开(公告)号：US5253040A

公开(公告)日：1993-10-12

申请号：US788235

申请日：1991-11-05

申请人： Kazuya Kamon ,  Yasuhito Myoi ,  Teruo Miyamoto ,  Yoshie Noguchi ,  Masaaki Tanaka

发明人： Kazuya Kamon ,  Yasuhito Myoi ,  Teruo Miyamoto ,  Yoshie Noguchi ,  Masaaki Tanaka

IPC分类号： G03F7/20 ,  G01B11/00

CPC分类号： G03F7/70091 ,  G03F7/70108 ,  G03F7/70191 ,  G03F7/70241

摘要： A projection aligner includes a light source, a condenser lens system for directing light from the light source onto a mask on which a circuit pattern is formed, a projecting lens system for collecting on the surface of a wafer the light transmitted through the mask, and an aperture member disposed between the light source and the condenser lens system. The aperture member includes a transmitting zone for transmitting light from the light source and a phase shift member for producing a predetermined phase difference between light transmitted through the transmitting zone and light transmitted through a region surrounding the transmitting zone.

摘要翻译： 投影对准器包括光源，聚光透镜系统，用于将来自光源的光引导到形成有电路图案的掩模上;投影透镜系统，用于在透镜通过掩模的光线上收集光的表面，以及 设置在光源和聚光透镜系统之间的光圈部件。 光圈构件包括用于透射来自光源的光的透射区域和用于产生透过透射区域的光与透射通过透射区域周围的区域的光之间的预定相位差的相移构件。

公开(公告)号：US5144362A

公开(公告)日：1992-09-01

申请号：US790446

申请日：1991-11-12

申请人： Kazuya Kamon ,  Yasuhito Myoi ,  Teruo Miyamoto ,  Yoshie Noguchi ,  Masaaki Tanaka

发明人： Kazuya Kamon ,  Yasuhito Myoi ,  Teruo Miyamoto ,  Yoshie Noguchi ,  Masaaki Tanaka

IPC分类号： G03F7/20

CPC分类号： G03F7/70108 ,  G03F7/70191 ,  G03F7/70241 ,  G03F7/70308 ,  G03F7/70333

摘要： A projection aligner includes a light source, a condenser lens system for directing light from the light source onto a mask on which a circuit pattern is formed, a projecting lens system for collecting on the surface of a wafer the light transmitted through the mask, and a pupillary member disposed on a pupillary surface of the projecting lens system. The pupillary member includes at least one transmitting zone for transmitting the light transmitted through the mask including a phase shift member for producing a predetermined phase shift in light transmitted through part of the transmitting zone.

摘要翻译： 投影对准器包括光源，聚光透镜系统，用于将来自光源的光引导到形成有电路图案的掩模上;投影透镜系统，用于在透镜通过掩模的光线上收集光的表面，以及 设置在投影透镜系统的瞳孔表面上的瞳孔构件。 瞳孔构件包括至少一个用于透射通过掩模的光的透射区，包括相移构件，用于在通过透射区的一部分透射的光中产生预定的相移。

公开(公告)号：US5264898A

公开(公告)日：1993-11-23

申请号：US936646

申请日：1992-08-28

申请人： Kazuya Kamon ,  Teruo Miyamoto ,  Yasuhito Myoi

发明人： Kazuya Kamon ,  Teruo Miyamoto ,  Yasuhito Myoi

IPC分类号： G03F7/20 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70091 ,  G03F7/701

摘要： A projection exposure apparatus for use in LSI production comprises a light source, a light condensing optical system through which light from the light source is condensed and applied to a mask carrying a circuit pattern, a projection lens system which projects the light transmitted through the mask onto the surface of a wafer, and an aperture member which is interposed between the light source and the light condensing optical system. The aperture member has a light transmission region for transmitting the light from the light source and a light-interrupting member disposed to extend across the light transmission region. The shape or configuration of the light-interrupting member is determined in accordance with the geometry of the circuit pattern formed on the mask.

摘要翻译： 用于LSI生产的投影曝光装置包括一个光源，一个聚光系统，通过该聚光光学系统来自光源的光会聚并施加到一个承载电路图形的掩模上;一个投影透镜系统， 在晶片的表面上，以及插入在光源和聚光光学系统之间的开口部件。 光圈构件具有用于透射来自光源的光的透光区域和设置成延伸穿过光透射区域的遮光构件。 遮光构件的形状或构造根据形成在掩模上的电路图案的几何形状来确定。

公开(公告)号：US06709112B2

公开(公告)日：2004-03-23

申请号：US10268762

申请日：2002-10-11

申请人： Teruo Miyamoto ,  Hideharu Tanaka ,  Mitsuhiro Kawaguchi ,  Tatsuro Hirose ,  Toshimitsu Iwai ,  Tomohiro Bessho

发明人： Teruo Miyamoto ,  Hideharu Tanaka ,  Mitsuhiro Kawaguchi ,  Tatsuro Hirose ,  Toshimitsu Iwai ,  Tomohiro Bessho

IPC分类号： G03B2118

CPC分类号： G03B21/16

摘要： It is an object to obtain a light source device and a projection type display device in which a fragment can be completely enclosed therein even if a discharge lamp bursts during lighting. During normal lighting of a discharge lamp (1), an internal space of a light source device (10) and an external space are spatially connected to each other through a vent hole (43) formed on a cutoff valve mechanism (45) and a vent hole (100) formed on a concave reflecting mirror (4). Cooling air is introduced and discharged between the internal space and the external space so that the discharge lamp (1) is cooled down. When the discharge lamp (1) bursts during lighting for some reason, a very strong impulsive pressure wave is generated in a moment of the burst. The pressure wave presses a movable valve (41) provided in the cutoff valve mechanism (45) through the vent hole (100). By the pressing carried out with the pressure wave, the movable valve (41) is pushed up in a direction of an arrow (K1), thereby closing the vent hole (43).

摘要翻译： 本发明的目的是获得一种光源装置和投影型显示装置，其中即使放电灯在照明期间突然发生，片段也可以被完全封闭。 在放电灯（1）的正常点亮期间，光源装置（10）和外部空间的内部空间通过形成在截止阀机构（45）上的通气孔（43）和 形成在凹面反射镜（4）上的排气孔（100）。 冷却空气在内部空间和外部空间之间被引入和排出，使得放电灯（1）被冷却。 当放电灯（1）由于某些原因在照明期间爆裂时，在突发的瞬间产生非常强的脉冲压力波。 压力波通过通气孔（100）按压设置在截止阀机构（45）中的可动阀（41）。 通过用压力波进行的压力，可动阀（41）沿箭头（K1）的方向被推上，从而关闭通气孔（43）。

公开(公告)号：US5311249A

公开(公告)日：1994-05-10

申请号：US14855

申请日：1993-02-08

申请人： Kazuya Kamon ,  Teruo Miyamoto

发明人： Kazuya Kamon ,  Teruo Miyamoto

IPC分类号： G03F7/20 ,  G03B27/72 ,  G03B27/42

CPC分类号： G03F7/701

摘要： A projection exposure apparatus includes a light source, a condenser lens for illuminating an illumination light emanating from the light source onto a mask on which a circuit pattern has been formed, a projection lens for condensing the illumination light which has passed through the mask onto a surface of a wafer, and an aperture member disposed between the light source and the condenser lens and having both a transmission area for shaping the light emanating from the light source and a light blocking area formed at a central portion of the transmission area. An outer diameter of the transmission area of the aperture member is set such that a ratio .sigma. of an outer diameter of an effective light source to a diameter of a pupil of the projection lens is 0.6.+-.0.3, while a light blocking rate of the light blocking area is set to 60.+-.35%.

摘要翻译： 投影曝光装置包括光源，用于将从光源发出的照明光照射到其上形成有电路图案的掩模上的聚光透镜，用于将已经通过掩模的照明光聚焦到投影透镜上的投影透镜 晶片表面和设置在光源和聚光透镜之间的孔部件，并且具有用于使从光源发出的光成形的透射区域和形成在透射区域的中心部分处的遮光区域。 孔径构件的透射区域的外径被设定为使得有效光源的外径与投影透镜的光瞳直径的比率σ为0.6 +/- 0.3，而遮光率 遮光面积设定为60 +/- 35％。