摘要:
Provided is a vehicle that elevates a working beam installed between a pair of booms with a working beam elevating unit and can ensure the area of a load receiving surface where a load is loaded. The working beam elevating unit is received in a working beam and one end of a chain is fixed to a boom. Therefore, the working beam is moved up/down by loosening and retracting the chain. Therefore, as the working beam elevating unit is installed at the working beam, it is not necessary to ensure a space for installing the working beam on a vehicle body. Therefore, it is correspondingly possible to enlarge the space (area of the load receiving surface) on the vehicle for loading a load.
摘要:
There is provided a vehicle which can stably load or unload a long heavy load and lower a height of a working space necessary for loading or unloading the weight body. The loading/unloading apparatus suspends and maintains a load in a working beam installed between a pair of booms and rotates the pair of booms toward the left or right direction of a vehicle body, such that the load is unloaded from the vehicle body in a construction field or loaded from the construction field onto the vehicle body. Thus, the height of the working space necessary when the load is loaded or unloaded can be reduced as compared with a crane structure for loading and unloading the load by the fluctuation of a boom.
摘要:
When the load factor of a loading/unloading apparatus reaches a second reference value that is smaller in load factor than the first reference value, the operation speed of the loading/unloading apparatus becomes a reduction state. It is possible to make load vibration difficult to be generated in a load. Further, fine adjustment of the manipulation becomes easy, such that it is possible to prevent the load factor from reaching the first reference value due to careless manipulation of the operator. Even if the load factor reaches the first reference value, the operation speed of the loading/unloading apparatus has been reduced, such that it is possible to prevent load vibration of the load W when stopping.
摘要:
The present invention provides an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, and a method of using it for etching a multilayer thin film containing a copper layer and a titanium layer, that is, an etching liquid for a multilayer thin film containing a copper layer and a titanium layer, which comprises (A) hydrogen peroxide, (B) nitric acid, (C) a fluoride ion source, (D) an azole, (E) a quaternary ammonium hydroxide and (F) a hydrogen peroxide stabilizer and has a pH of from 1.5 to 2.5, and a etching method of using it.
摘要:
A control rod includes a tie-rod, a handle mounted to an upper end portion of the tie-rod, either a connector plate or a fall velocity limiter mounted to a lower end portion of the tie-rod, sheaths having a U-shaped cross-section, welded intermittently to the tie-rod at a plurality of locations in the axial direction of the tie-rod, and having an upper end welded to the handle and a lower end welded to either the connector plate or the fall velocity limiter, and a neutron absorbing member disposed inside each of the sheaths. An upper end of a weld portion located at uppermost position in an axial direction of the tie-rod among a plurality of weld portions between the tie-rod and the sheath is disposed at a position within a range between 0.8 and 13% of total axial length Ls of the sheath below an upper end of the sheath.
摘要:
In a thin film transistor, a gate insulating film having a first insulating film and a second insulating film is formed on a gate electrode, and a semiconductor layer including ZnO etc. is formed on the second insulating film. The first insulating film is formed by using SiNx having a high insulating characteristic, and the second insulating film is formed by using an oxide (for example, SiO2). This structure improves a crystalline characteristic of the semiconductor layer that constitutes an interface in combination with the second insulating film, and decreases a defective level of the interface between the semiconductor layer and the second insulating film. Further, the second insulating film is constituted of the oxide, so that it is possible to restrain a material for the second insulating film from depriving oxygen of the semiconductor layer. This keeps a crystalline characteristic of the semiconductor layer under a preferable condition in the vicinity of the interface between the second insulating film and the semiconductor layer. As a result, it is possible to realize a thin film transistor such that: a leak current level at an OFF area is low, and the mobility is high, and a switching characteristic is preferable. Thus, in the thin film transistor having a transparent semiconductor film, a TFT characteristic is improved.
摘要:
To provide an ultrasonic cleaning device (1) that ensures stable operation of a vibrating element for generating ultrasonic without a complex structure and distribution of a great quantity of a cleaning liquid and (2) that is capable of cleaning upper and lower surfaces of a cleaning target easily, an ultrasonic cleaning section of the device is provided with an upper cleaning-liquid-supply nozzle and a lower cleaning-liquid-supply nozzle for projection of ultrasonic. The upper cleaning-liquid-supply nozzle supplies an upper surface cleaning liquid to an upper surface of a glass substrate. The lower cleaning-liquid-supply nozzle supplies the lower surface cleaning liquid to a lower surface of the substrate in a form of shower to which ultrasonic has been projected. A vibrating element for generating ultrasonic to be projected to the lower surface cleaning liquid is provided in a cleaning liquid distribution path that extends from an upstream side to a downstream side in a direction in a range of a horizontal direction to an upward direction.
摘要:
After adjusting an exhaust gas temperature at an exit of a heat recovery unit (11) of an exhaust gas treating apparatus to not more than a dew point temperature of sulfur trioxide (SO3), a heavy metal adsorbent is supplied from a heavy metal adsorbent supply unit (16) disposed in an exhaust gas at an entrance of a precipitator (4) or an intermediate position within the precipitator (4), and the exhaust gas containing the heavy metal adsorbent is supplied into the precipitator (4). Preferably at this stage, the heavy metal adsorbent is supplied into the exhaust gas at the entrance of the precipitator (4) 0.1 seconds after the exhaust gas temperature at the exit of the heat recovery unit (11) has been adjusted to not more than the dew point temperature of SO3. Further preferably, in order to prevent acid corrosion of equipment, the heavy metal adsorbent is supplied after spraying an alkali into the exhaust gas at the entrance or exit of the heat recovery unit (11) and adjusting the exhaust gas temperature at the exit of the heat recovery unit to not more than the dew point temperature of SO3. Accordingly, even when coal with a high sulfur content is used as fuel, heavy metals in the exhaust gas can be removed effectively.
摘要:
A control rod has four blades, each of which has a rectangular cross section in a plane perpendicular to an axis of the control rod, disposed so as to form a cross-shaped cross section in the plane perpendicular to the axis. The blades include a plurality of aligned square tubes having a square cross section in a plane perpendicular to the axis and including a neutron absorber filling hole filled with neutron absorber, frame plates disposed parallel to the aligned square tubes in a direction perpendicular to a width direction of the blade, and on one side end and another side end of the blade in the width direction, respectively, and cover plates disposed along the width direction and sandwiching the aligned square tubes. Each blade has the aligned square tubes, the frame plates and the cover plates joined together as a single-piece construction by Hot Isostatic Pressing diffusion bonding.
摘要:
The following devices are successively disposed in the following order from an upstream side to a downstream side in an exhaust gas duct of a combustion apparatus: an air preheater, preheating combustion air for use in an exhaust gas treating apparatus; a heat recovery unit, recovering exhaust gas heat at an exit of the air preheater; a precipitator, collecting soot/dust contained in an exhaust gas at an exit of the heat recovery unit; a wet flue gas desulfurizer, removing sulfur oxides contained in the exhaust gas at the exit of the precipitator; and a reheater, heating the exhaust gas at the exit of the wet flue gas desulfurizer. Each of the heat recovery unit and the reheater has a heat exchanger tube, and a circulation line is disposed to connect the heat exchanger tubes. A sulfur trioxide (SO3) removing agent is supplied to the upstream side of the heat recovery unit, and the temperature of the exhaust gas at the exit of the heat recovery unit is adjusted to not more than a dew point of sulfur trioxide. As the sulfur trioxide removing agent, use is preferably made of at least one among a sulfur trioxide adsorbent, a sulfur trioxide reducing agent, and a sulfur trioxide neutralizing agent. Thus, even when coal with a high sulfur content is used as fuel, heavy metals contained in the exhaust gas can be removed effectively from the exhaust gas.