公开(公告)号：US20210157238A1

公开(公告)日：2021-05-27

申请号：US17100752

申请日：2020-11-20

Applicant: Orbotech Ltd.

Inventor： Gil Bernstein Toker ,  Sharona Cohen ,  Zvi Kotler

IPC: G03F7/16 ,  G03F7/004 ,  G03F7/033

Abstract: A method for manufacturing, the method includes coupling a sample to a mount, and immersing at least part of the sample in a photosensitive liquid having an upper surface defining an interface between the photosensitive liquid and a surrounding environment. At least a polymer layer that is coupled to at least a section of the sample is formed by: setting a thickness of the polymer layer by controlling a position of the sample relative to the upper surface, and illuminating at least the upper surface so as to polymerize the photosensitive liquid to form the polymer layer.

公开(公告)号：US12042984B2

公开(公告)日：2024-07-23

申请号：US16338498

申请日：2017-10-31

Applicant: ORBOTECH LTD.

Inventor： Zvi Kotler ,  Gil Bernstein Toker ,  Marc Altman

IPC: B29C64/00 ,  B29C64/10 ,  B29C64/147 ,  B29C64/176 ,  B29C64/182 ,  B29C64/20 ,  B29C64/205 ,  B29C64/218 ,  B29C64/223 ,  B29C64/227 ,  B29C64/245 ,  B29C64/25 ,  B29C64/255 ,  B29C64/268 ,  B29C64/295 ,  B29C64/30 ,  B29C64/307 ,  B29C64/40 ,  B29C67/00 ,  B33Y40/00 ,  B33Y40/10 ,  B33Y40/20 ,  B33Y50/00 ,  B33Y70/00 ,  B33Y80/00 ,  B33Y99/00 ,  B22F10/22 ,  B22F12/63 ,  B33Y10/00 ,  B33Y30/00

CPC classification number: B29C64/147 ,  B29C64/00 ,  B29C64/10 ,  B29C64/176 ,  B29C64/182 ,  B29C64/20 ,  B29C64/205 ,  B29C64/218 ,  B29C64/223 ,  B29C64/227 ,  B29C64/245 ,  B29C64/25 ,  B29C64/255 ,  B29C64/268 ,  B29C64/295 ,  B29C64/30 ,  B29C64/307 ,  B29C64/40 ,  B29C67/00 ,  B33Y40/00 ,  B33Y40/10 ,  B33Y40/20 ,  B33Y50/00 ,  B33Y70/00 ,  B33Y80/00 ,  B33Y99/00 ,  B22F10/22 ,  B22F12/63 ,  B22F2999/00 ,  B33Y10/00 ,  B33Y30/00 ,  Y02P10/25 ,  B22F2999/00 ,  B22F10/20 ,  B22F3/115

Abstract: A method for manufacturing includes applying patterned electromagnetic energy to each of a sequence of layers of a dry film comprising a photosensitive material so as to create in the photosensitive material in each of the layers a respective two-dimensional (2D) pattern corresponding to a slice of a predefined three-dimensional (3D) structure. The layers in the sequence in which the respective 2D pattern has been created are laminated together to produce a multi-layer stack. The multi-layer stack is developed so as to remove the photosensitive material in which the 2D pattern has not been created, thereby forming the 3D structure.

公开(公告)号：US20190263054A1

公开(公告)日：2019-08-29

申请号：US16338498

申请日：2017-10-31

Applicant: ORBOTECH LTD.

Inventor： Zvi Kotler ,  Gil Bernstein Toker ,  Marc Altman

IPC: B29C64/147 ,  B29C64/218 ,  B29C64/223 ,  B29C64/295 ,  B29C64/268

Abstract: A method for manufacturing includes applying patterned electromagnetic energy to each of a sequence of layers of a dry film comprising a photosensitive material so as to create in the photosensitive material in each of the layers a respective two-dimensional (2D) pattern corresponding to a slice of a predefined three-dimensional (3D) structure. The layers in the sequence in which the respective 2D pattern has been created are laminated together to produce a multi-layer stack. The multi-layer stack is developed so as to remove the photosensitive material in which the 2D pattern has not been created, thereby forming the 3D structure.