公开(公告)号：US20150382476A1

公开(公告)日：2015-12-31

申请号：US14766749

申请日：2014-02-18

申请人： ORBOTECH LTD.

发明人： Michael Zenou ,  Marc Altman ,  Claudio Rottman ,  Zvi Kotler

IPC分类号： H05K3/12 ,  H05K3/22

CPC分类号： H05K3/12 ,  G03F7/039 ,  G03F7/40 ,  H05K1/097 ,  H05K3/02 ,  H05K3/027 ,  H05K3/1283 ,  H05K3/1291 ,  H05K3/227 ,  H05K2201/0257 ,  H05K2201/2054 ,  H05K2203/0514 ,  H05K2203/107 ,  H05K2203/108 ,  H05K2203/111 ,  H05K2203/1131 ,  H05K2203/1194 ,  H05K2203/1476 ,  H05K2203/1484

摘要： A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern (42) is fixed in the matrix by directing an energy beam to impinge on the coated substrate so as to fix the pattern in the matrix without fully sintering the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.

摘要翻译： 一种制造方法包括用在衬底上含有要图案化的材料的基体（28）涂覆衬底（22）。 通过将能量束引导到涂覆的基底上以将图案固定在基体中而不完全烧结图案，将图案（42）固定在矩阵中。 除去残留在固定图案外的基板上的基体，在除去基体之后，将图案中的材料烧结。

公开(公告)号：US12042984B2

公开(公告)日：2024-07-23

申请号：US16338498

申请日：2017-10-31

申请人： ORBOTECH LTD.

发明人： Zvi Kotler ,  Gil Bernstein Toker ,  Marc Altman

IPC分类号： B29C64/00 ,  B29C64/10 ,  B29C64/147 ,  B29C64/176 ,  B29C64/182 ,  B29C64/20 ,  B29C64/205 ,  B29C64/218 ,  B29C64/223 ,  B29C64/227 ,  B29C64/245 ,  B29C64/25 ,  B29C64/255 ,  B29C64/268 ,  B29C64/295 ,  B29C64/30 ,  B29C64/307 ,  B29C64/40 ,  B29C67/00 ,  B33Y40/00 ,  B33Y40/10 ,  B33Y40/20 ,  B33Y50/00 ,  B33Y70/00 ,  B33Y80/00 ,  B33Y99/00 ,  B22F10/22 ,  B22F12/63 ,  B33Y10/00 ,  B33Y30/00

CPC分类号： B29C64/147 ,  B29C64/00 ,  B29C64/10 ,  B29C64/176 ,  B29C64/182 ,  B29C64/20 ,  B29C64/205 ,  B29C64/218 ,  B29C64/223 ,  B29C64/227 ,  B29C64/245 ,  B29C64/25 ,  B29C64/255 ,  B29C64/268 ,  B29C64/295 ,  B29C64/30 ,  B29C64/307 ,  B29C64/40 ,  B29C67/00 ,  B33Y40/00 ,  B33Y40/10 ,  B33Y40/20 ,  B33Y50/00 ,  B33Y70/00 ,  B33Y80/00 ,  B33Y99/00 ,  B22F10/22 ,  B22F12/63 ,  B22F2999/00 ,  B33Y10/00 ,  B33Y30/00 ,  Y02P10/25 ,  B22F2999/00 ,  B22F10/20 ,  B22F3/115

摘要： A method for manufacturing includes applying patterned electromagnetic energy to each of a sequence of layers of a dry film comprising a photosensitive material so as to create in the photosensitive material in each of the layers a respective two-dimensional (2D) pattern corresponding to a slice of a predefined three-dimensional (3D) structure. The layers in the sequence in which the respective 2D pattern has been created are laminated together to produce a multi-layer stack. The multi-layer stack is developed so as to remove the photosensitive material in which the 2D pattern has not been created, thereby forming the 3D structure.

公开(公告)号：US10015887B2

公开(公告)日：2018-07-03

申请号：US14766749

申请日：2014-02-18

申请人： ORBOTECH LTD.

发明人： Michael Zenou ,  Marc Altman ,  Claudio Rottman ,  Zvi Kotler

IPC分类号： H05K3/12 ,  G03F7/40 ,  H05K3/02 ,  G03F7/039 ,  H05K3/22 ,  H05K1/09

CPC分类号： H05K3/12 ,  G03F7/039 ,  G03F7/40 ,  H05K1/097 ,  H05K3/02 ,  H05K3/027 ,  H05K3/1283 ,  H05K3/1291 ,  H05K3/227 ,  H05K2201/0257 ,  H05K2201/2054 ,  H05K2203/0514 ,  H05K2203/107 ,  H05K2203/108 ,  H05K2203/111 ,  H05K2203/1131 ,  H05K2203/1194 ,  H05K2203/1476 ,  H05K2203/1484

摘要： A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern (42) is fixed in the matrix by directing an energy beam to impinge on the coated substrate so as to fix the pattern in the matrix without fully sintering the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.

公开(公告)号：US20220024223A1

公开(公告)日：2022-01-27

申请号：US17427372

申请日：2020-05-04

申请人： Orbotech Ltd.

发明人： Marc Altman ,  Zvi Kotler ,  Itay Peled ,  Oleg Ermak ,  Sharona Cohen

IPC分类号： B41J2/455 ,  H05K3/12 ,  H05K3/02 ,  B41J2/47

摘要： Printing apparatus includes a donor supply assembly, which positions a transparent donor substrate having opposing first and second surfaces and a donor film formed on the second surface so that the donor film is in proximity to a target area on an acceptor substrate. An optical assembly directs one or more beams of laser radiation to pass through the first surface of the donor substrate and impinge on the donor film so as to induce ejection of material from the donor film onto the acceptor substrate. Means are provided to mitigate or compensate for the variation in reflection of the laser radiation across an area of the donor substrate, so as to equalize a flux of the laser radiation that is absorbed in the donor film across the area of the donor substrate.

公开(公告)号：US20190263054A1

公开(公告)日：2019-08-29

申请号：US16338498

申请日：2017-10-31

申请人： ORBOTECH LTD.

发明人： Zvi Kotler ,  Gil Bernstein Toker ,  Marc Altman

IPC分类号： B29C64/147 ,  B29C64/218 ,  B29C64/223 ,  B29C64/295 ,  B29C64/268

摘要： A method for manufacturing includes applying patterned electromagnetic energy to each of a sequence of layers of a dry film comprising a photosensitive material so as to create in the photosensitive material in each of the layers a respective two-dimensional (2D) pattern corresponding to a slice of a predefined three-dimensional (3D) structure. The layers in the sequence in which the respective 2D pattern has been created are laminated together to produce a multi-layer stack. The multi-layer stack is developed so as to remove the photosensitive material in which the 2D pattern has not been created, thereby forming the 3D structure.