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    METHOD OF PATTERNING A DEVICE
    1.
    发明申请
    METHOD OF PATTERNING A DEVICE 有权
    方法设计方法

    公开(公告)号：US20150331325A1

    公开(公告)日：2015-11-19

    申请号：US14808194

    申请日：2015-07-24

    申请人： ORTHOGONAL, INC.

    发明人： John Andrew DEFRANCO ,  Francis HOULIHAN ,  Charles Warren WRIGHT ,  Diane Carol FREEMAN ,  Frank Xavier BYRNE ,  Douglas Robert ROBELLO ,  Sandra RUBSAM ,  Terrence Robert O'TOOLE

    IPC分类号： G03F7/42 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

    CPC分类号： G03F7/42 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/20 ,  G03F7/325 ,  G03F7/426 ,  G03F7/427

    摘要： A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.

    摘要翻译： 在有机器件衬底上形成光敏聚合物层并暴露于图案化辐射。 感光聚合物层包括至少包含具有酸催化的溶解性变化反应性基团的第一重复单元的光聚合物，其中光聚合物的总氟含量小于30重量％。 将图案曝光的光聚合物与显影剂如显影液接触以除去未曝光的光聚合物，从而形成显影结构，其具有覆盖基材的曝光的光聚合物的第一图案和对应于未曝光的光聚合物的互补的未覆盖的基材图案 。 显影剂包含至少50体积％的氢氟醚显影溶剂。

    METHOD OF PATTERNING A DEVICE
    2.
    发明申请
    METHOD OF PATTERNING A DEVICE 有权
    方法设计方法

    公开(公告)号：US20140248565A1

    公开(公告)日：2014-09-04

    申请号：US14274816

    申请日：2014-05-12

    申请人： ORTHOGONAL, INC.

    发明人： John Andrew DEFRANCO ,  Francis HOULIHAN ,  Charles Warren WRIGHT ,  Diane Carol FREEMAN ,  Frank Xavier BYRNE ,  Douglas Robert ROBELLO ,  Sandra RUBSAM ,  Terrence Robert O'TOOLE

    IPC分类号： G03F7/42

    CPC分类号： G03F7/42 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/16 ,  G03F7/20 ,  G03F7/325 ,  G03F7/426 ,  G03F7/427

    摘要： A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.

    摘要翻译： 在有机器件衬底上形成光敏聚合物层并暴露于图案化辐射。 感光聚合物层包括至少包含具有酸催化的溶解性变化反应性基团的第一重复单元的光聚合物，其中光聚合物的总氟含量小于30重量％。 将图案曝光的光聚合物与显影剂如显影液接触以除去未曝光的光聚合物，从而形成显影结构，其具有覆盖基材的曝光的光聚合物的第一图案和对应于未曝光的光聚合物的互补的未覆盖的基材图案 。 显影剂包含至少50体积％的氢氟醚显影溶剂。

    CROSS-LINKABLE FLUORINATED PHOTOPOLYMER
    4.
    发明申请
    CROSS-LINKABLE FLUORINATED PHOTOPOLYMER 有权
    交联荧光光刻胶

    公开(公告)号：US20160349614A1

    公开(公告)日：2016-12-01

    申请号：US15117032

    申请日：2015-02-04

    申请人： ORTHOGONAL, INC.

    发明人： Charles Warren WRIGHT ,  Douglas Robert ROBELLO ,  John Andrew DEFRANCO ,  Diane Carol FREEMAN ,  Frank Xavier BYRNE

    IPC分类号： G03F7/038 ,  G03F7/004

    CPC分类号： G03F7/0388 ,  C08F220/34 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/038 ,  G03F7/0758 ,  G03F7/20 ,  G03F7/30 ,  G03F7/40 ,  H01L21/0274

    摘要： A photosensitive composition is disclosed including a fluorinated photo cross-linkable polymer provided in a fluorinated solvent such as a hydrofluoroether. The photo cross-linkable polymer includes a first repeating unit having a fluorine-containing group but not a cinnamate group, and a second repeating unit having a fluorine-containing cinnamate group. The polymer has a total fluorine content in a range of 30 to 60% by weight. The composition can be used to form patterned barrier or dielectric structures over substrates and devices such as organic electronic devices.

    摘要翻译： 公开了一种光敏组合物，其包括在诸如氢氟醚之类的氟化溶剂中提供的氟化可光交联聚合物。 可光交联聚合物包括具有含氟基但不是肉桂酸酯基的第一重复单元和具有含氟肉桂酸酯基的第二重复单元。 聚合物的总氟含量为30〜60重量％。 组合物可以用于在诸如有机电子器件的衬底和器件上形成图案化的阻挡层或电介质结构。