METHOD AND DEVICE FOR IMPROVED ALIGNMENT OF A HIGH BRIGHTNESS CHARGED PARTICLE GUN
    2.
    发明申请
    METHOD AND DEVICE FOR IMPROVED ALIGNMENT OF A HIGH BRIGHTNESS CHARGED PARTICLE GUN 有权
    用于改善高亮度充电颗粒枪对准的方法和装置

    公开(公告)号:US20100108904A1

    公开(公告)日:2010-05-06

    申请号:US12264848

    申请日:2008-11-04

    申请人: PAVEL ADAMEC

    发明人: PAVEL ADAMEC

    IPC分类号: H01J3/14

    CPC分类号: H01J37/1471 H01J2237/1501

    摘要: A charged particle gun alignment assembly for emitting a charged particle beam along an optical axis of a charged particle beam device is described. The charged particle gun alignment assembly is configured to compensate for misalignment of the charged particle beam and includes a charged particle source having an emitter with a virtual source defining a virtual source plane substantially perpendicular to the optical axis; a condenser lens for imaging the virtual source; a final beam limiting aperture adapted for shaping the charged particle beam; and a double stage deflection assembly positioned between the condenser lens and the final beam limiting aperture, wherein the working distance of the condenser lens is 15 mm or less.

    摘要翻译: 描述了一种用于沿带电粒子束装置的光轴发射带电粒子束的带电粒子枪对准组件。 带电粒子枪对准组件被配置为补偿带电粒子束的未对准,并且包括具有发射器的带电粒子源,发射器具有限定基本上垂直于光轴的虚拟源平面的虚拟源; 用于对虚拟源成像的聚光透镜; 用于对带电粒子束进行成形的最终光束限制孔; 以及位于聚光透镜和最终光束限制孔之间的双级偏转组件,其中聚光透镜的工作距离为15mm或更小。

    CHARGED PARTICLE BEAM DEVICE AND METHOD FOR INSPECTING SPECIMEN
    3.
    发明申请
    CHARGED PARTICLE BEAM DEVICE AND METHOD FOR INSPECTING SPECIMEN 有权
    充电颗粒光束装置和检测样品的方法

    公开(公告)号:US20080048116A1

    公开(公告)日:2008-02-28

    申请号:US11781794

    申请日:2007-07-23

    IPC分类号: G01N23/00

    摘要: A charged particle beam device is provided. The device includes a primary objective lens for focusing a primary charged particle beam, the primary objective lens defining an optical axis, a specimen stage defining a specimen location area, a deflection unit for deflecting the primary charged particle beam between the primary objective lens and the specimen location area, towards a beam path for impingement on the specimen, wherein the deflection unit is movable with respect to the optical axis.

    摘要翻译: 提供带电粒子束装置。 该装置包括用于聚焦初级带电粒子束的主物镜,限定光轴的主物镜,限定样本位置区域的样本台,用于使主要物镜和第一物镜之间的初级带电粒子束偏转的偏转单元 样本定位区域,朝向用于冲击样本的光束路径,其中偏转单元可相对于光轴移动。

    ASYMMETRIC ANNULAR DETECTOR
    4.
    发明申请
    ASYMMETRIC ANNULAR DETECTOR 有权
    不对称环形探测器

    公开(公告)号:US20080061244A1

    公开(公告)日:2008-03-13

    申请号:US11849768

    申请日:2007-09-04

    申请人: PAVEL ADAMEC

    发明人: PAVEL ADAMEC

    IPC分类号: G01T1/20

    CPC分类号: H01J37/244 H01J2237/2443

    摘要: An assembly for a detection unit for an optical device is described. The assembly includes a scintillator adapted to received secondary particles and, in response, generate photons, wherein the scintillator includes an opening for trespassing of a primary beam through the scintillator. The scintillator including the opening is asymmetrical with regard to one axis.

    摘要翻译: 描述了用于光学装置的检测单元的组件。 该组件包括适于接收的二次粒子的闪烁体,并且作为响应产生光子,其中闪烁体包括用于侵入通过闪烁体的初级束的开口。 包括开口的闪烁体相对于一个轴线是不对称的。

    CONTINUOUSLY CLEANING OF THE EMISSION SURFACE OF A COLD FIELD EMISSION GUN USING UV OR LASER BEAMS
    5.
    发明申请
    CONTINUOUSLY CLEANING OF THE EMISSION SURFACE OF A COLD FIELD EMISSION GUN USING UV OR LASER BEAMS 审中-公开
    连续清洗使用紫外线或激光束的冷场排放枪的排放表面

    公开(公告)号:US20070001574A1

    公开(公告)日:2007-01-04

    申请号:US11426544

    申请日:2006-06-26

    IPC分类号: H01J1/02

    摘要: A field emitter arrangement is provided, said field emitter arrangement comprising a field emitter tip having an emitting surface, and at least one light source adapted to illuminate the emitting surface of the field emitter tip. Furthermore, a method of cleaning an emitting surface of a field emitter tip is provided, the method comprising the steps of: providing a field emitter tip having an emitting surface and a light source and illuminating the emitting surface of the field emitter tip with the light source.

    摘要翻译: 提供场发射器布置,所述场发射器布置包括具有发射表面的场发射器尖端,以及适于照射场发射器尖端的发射表面的至少一个光源。 此外,提供了一种清洁场发射器尖端的发射表面的方法,该方法包括以下步骤:提供具有发射表面和光源的场发射器尖端,并用光照射场发射器尖端的发射表面 资源。