METHOD FOR MANUFACTURING PIEZOELECTRIC THIN-FILM ELEMENT

    公开(公告)号:US20180226939A1

    公开(公告)日:2018-08-09

    申请号:US15750821

    申请日:2016-07-25

    IPC分类号: H03H3/04 H03H9/13 H03H9/17

    摘要: To improve the Q value of a piezoelectric thin-film element in a state in which unnecessary vibration is suppressed, an acoustic reflection film (104) is affixed to a first electrode (102), a piezoelectric single-crystal substrate (101) is thinned by polishing from the other surface (101b) of the piezoelectric single-crystal substrate (101), such that the first electrode (102) and piezoelectric thin film (105) are piled on the piezoelectric single-crystal substrate (101). In this polishing, a pressure (polishing pressure) to the surface (101b) during polishing in an electrode formation region where the first electrode (102) is formed differs from that in a non-electrode formation region around the electrode formation region. Consequently, the electrode formation region of the piezoelectric thin film (105), where the first electrode (102) is formed, is made thinner than the non-electrode formation region around the electrode formation region.