公开(公告)号：US20160254115A1

公开(公告)日：2016-09-01

申请号：US15133480

申请日：2016-04-20

申请人： PLANSEE SE

发明人： JOHANN EITER ,  JUERGEN SCHATTE ,  WOLFGANG GLATZ ,  WOLFRAM KNABL ,  GERHARD LEICHTFRIED ,  STEFAN SCHOENAUER

IPC分类号： H01J35/10

CPC分类号： H01J35/108 ,  H01J2235/081 ,  H01J2235/085

摘要： A rotary X-ray anode has a support body and a focal track formed on the support body. The support body and the focal track are produced as a composite by powder metallurgy. The support body is formed from molybdenum or a molybdenum-based alloy and the focal track is formed from tungsten or a tungsten-based alloy. Here, in the conclusively heat-treated rotary X-ray anode, at least one portion of the focal track is located in a non-recrystallized and/or in a partially recrystallized structure.

摘要翻译： 旋转X射线阳极具有形成在支撑体上的支撑体和焦点轨迹。 支撑体和焦轨通过粉末冶金制成复合材料。 支撑体由钼或钼基合金形成，焦点轨道由钨或钨基合金形成。 这里，在最终热处理的旋转X射线阳极中，焦点轨道的至少一部分位于未再结晶和/或部分重结晶的结构中。

公开(公告)号：US20170260622A1

公开(公告)日：2017-09-14

申请号：US15504997

申请日：2015-08-10

申请人： PLANSEE SE

发明人： HARALD KOESTENBAUER ,  JUDITH KOESTENBAUER ,  GERHARD LEICHTFRIED ,  JOERG WINKLER ,  MOO SUNG HWANG ,  MARTIN KATHREIN ,  ELISABETH EIDENBERGER

IPC分类号： C23C14/34 ,  C22C27/04 ,  H01B1/02 ,  C22C1/04

CPC分类号： C23C14/3414 ,  C22C1/045 ,  C22C27/04 ,  C23C24/04 ,  H01B1/023 ,  H01L23/53223 ,  H01L23/53238 ,  H01L23/53252

摘要： A metallization for a thin-film component includes at least one layer composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a metallization includes providing at least one sputtering target, depositing at least one layer of an Mo-based alloy containing Al and Ti and usual impurities, and structuring the metallization by using at least one photolithographic process and at least one subsequent etching step. A sputtering target is composed of an Mo-based alloy containing Al and Ti and usual impurities. A process for producing a sputtering target composed of an Mo-based alloy includes providing a powder mixture containing Mo and also Al and Ti and cold gas spraying (CGS) of the powder mixture onto a suitable support material.

公开(公告)号：US20170189962A1

公开(公告)日：2017-07-06

申请号：US15324877

申请日：2015-06-30

申请人： PLANSEE SE

发明人： HEINRICH KESTLER ,  GERHARD LEICHTFRIED ,  MICHAEL O'SULLIVAN ,  BERNHARD TABERNIG

IPC分类号： B22F3/105 ,  B22F1/00 ,  B22F3/24 ,  B22F9/30 ,  B33Y70/00 ,  B23K15/00 ,  B23K26/00 ,  B23K26/342 ,  B33Y10/00 ,  B22F1/02 ,  B22F3/10

CPC分类号： B22F3/1055 ,  B22F1/0003 ,  B22F1/0011 ,  B22F1/025 ,  B22F3/1035 ,  B22F3/24 ,  B22F9/30 ,  B22F2003/248 ,  B22F2301/15 ,  B22F2301/20 ,  B22F2998/10 ,  B23K15/0086 ,  B23K15/0093 ,  B23K26/0006 ,  B23K26/342 ,  B23K2103/08 ,  B33Y10/00 ,  B33Y70/00 ,  C22C1/045 ,  C22C27/04 ,  Y02P10/295 ,  B22F9/20

摘要： A method of producing a component from refractory metal or a refractory metal alloy having a refractory metal content >50 at %. The process includes the steps of providing a powder formed of particles and solidifying the powder under the action of a laser beam or electron beam. The powder has a particle size d50 as measured laser-optically of >10 μm and an average surface area as measured by the BET method of >0.08 m2/g.

公开(公告)号：US20170183780A1

公开(公告)日：2017-06-29

申请号：US15323351

申请日：2015-06-30

申请人： PLANSEE SE

发明人： MICHAEL O'SULLIVAN ,  MARTIN KATHREIN ,  GERHARD LEICHTFRIED ,  THOMAS HOSP ,  BERNHARD LANG ,  DIETMAR SPRENGER

IPC分类号： C23C24/04 ,  B05B7/16 ,  B05B7/22 ,  B05B7/00

CPC分类号： C23C24/04 ,  B05B7/0025 ,  B05B7/0075 ,  B05B7/14 ,  B05B7/16 ,  B05B7/1626 ,  B05B7/228 ,  H05H2001/3484

摘要： A process for producing a layer or a body built up of layers. A process gas which has a pressure of >10 bar is accelerated in a convergent-divergent nozzle and a coating material which is formed by particles and is composed of Mo, W, an Mo-based alloy or a W-based alloy is injected into the process gas. The particles are at least partly present as aggregates and/or agglomerates. It is possible to produce dense layers and components in this way. We also describe layers and components having a microstructure with cold-deformed grains having a high aspect ratio.

公开(公告)号：US20200276639A1

公开(公告)日：2020-09-03

申请号：US16649770

申请日：2018-09-24

申请人： PLANSEE SE

发明人： GERHARD LEICHTFRIED ,  BERNHARD TABERNIG

IPC分类号： B22F3/105 ,  B22F1/00 ,  B33Y10/00 ,  B33Y70/00

摘要： A component includes a multiplicity of individual powder particles of Mo, a Mo-based alloy, W or a W-based alloy that have been fused together to give a solid structure by a high-energy beam via an additive manufacturing method. The component has an oxygen content of not more than 0.1 at %. An additive manufacturing method includes producing the powder via the melt phase and providing a carbon content in the region of not less than 0.15 at %. The components are crack-free and have high grain boundary strength.

公开(公告)号：US20150354055A1

公开(公告)日：2015-12-10

申请号：US14764007

申请日：2014-01-29

申请人： PLANSEE SE

发明人： CHRISTIAN LINKE ,  JIEHUA LI ,  PETER SCHUMACHER ,  WOLFRAM KNABL ,  GERHARD LEICHTFRIED

IPC分类号： C23C14/34 ,  B22F3/12 ,  B22F9/08 ,  H01L31/18 ,  B22F1/00 ,  C22C30/02 ,  C22C24/00 ,  H01J37/34 ,  B22F3/02 ,  B22F9/04

CPC分类号： C23C14/3414 ,  B22F1/00 ,  B22F3/02 ,  B22F3/12 ,  B22F3/15 ,  B22F9/04 ,  B22F9/082 ,  B22F2003/1051 ,  B22F2998/10 ,  C22C1/0425 ,  C22C1/0491 ,  C22C9/00 ,  C22C24/00 ,  C22C28/00 ,  C22C30/02 ,  H01J37/3426 ,  H01L31/18 ,  B22F3/10 ,  B22F3/20 ,  B22F3/18 ,  B22F3/17

摘要： A sputtering target is composed of an alloy consisting of 5 to 70 at % of at least one element from the group of (Ga, In) and 0.1 to 15 at % of Na, the remainder being Cu and typical impurities. The sputtering target includes at least one intermetallic Na-containing phase.

摘要翻译： 溅射靶由5〜70at％的由（Ga，In）组成的至少一种元素和0.1〜15at％的Na组成的合金构成，余量为Cu和典型的杂质。 溅射靶包括至少一种金属间含Na的相。