公开(公告)号：US09696623B2

公开(公告)日：2017-07-04

申请号：US15097050

申请日：2016-04-12

申请人： PROMERUS, LLC ,  SUMITOMO BAKELITE CO., LTD

发明人： Brian Knapp ,  Cheryl Burns ,  Edmund Elce ,  Keitaro Seto ,  Hiromichi Sugiyama ,  Makoto Horii ,  Kazuyoshi Fujita

IPC分类号： H01L21/027 ,  H01L21/311 ,  H01L23/00 ,  H01L25/00 ,  H01L25/065 ,  G03F7/075 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023

CPC分类号： G03F7/0751 ,  G03F7/0046 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/20 ,  H01L21/0274 ,  H01L21/31138 ,  H01L24/27 ,  H01L24/29 ,  H01L24/83 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/83191 ,  H01L2224/83203 ,  H01L2224/83385 ,  H01L2224/85375 ,  H01L2224/8592 ,  H01L2224/92247 ,  H01L2225/0651 ,  H01L2225/06562 ,  H01L2924/00014 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

摘要： The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are capable of controlling the adhesiveness by radiation.

公开(公告)号：US09341949B2

公开(公告)日：2016-05-17

申请号：US14261922

申请日：2014-04-25

申请人： PROMERUS, LLC ,  SUMITOMO BAKELITE CO., LTD

发明人： Brian Knapp ,  Cheryl Burns ,  Edmund Elce ,  Keitaro Seto ,  Hiromichi Sugiyama ,  Makoto Horii ,  Kazuyoshi Fujita

IPC分类号： G03F7/022 ,  G03F7/20 ,  G03F7/075 ,  G03F7/004 ,  G03F7/023

CPC分类号： G03F7/0757 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0226 ,  G03F7/0233 ,  G03F7/0751 ,  G03F7/20 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/92247 ,  H01L2225/06562 ,  H01L2924/15311 ,  H01L2924/00014 ,  H01L2924/00

摘要： The present invention relates to photosensitive compositions containing polynorbornene (PNB) polymers and certain additives that are useful for forming microelectronic and/or optoelectronic devices and assemblies thereof, and more specifically to compositions encompassing PNBs and certain hindered phenols as additives which are resistant to thermo-oxidative chain degradation.

摘要翻译： 本发明涉及含有聚降冰片烯（PNB）聚合物和某些可用于形成微电子和/或光电器件及其组件的添加剂的光敏组合物，更具体地涉及包含PNB和某些受阻酚的组合物， 氧化链降解。