公开(公告)号：US07149234B2

公开(公告)日：2006-12-12

申请号：US10650578

申请日：2003-08-27

申请人： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

发明人： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

IPC分类号： H01S3/22

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80

摘要： A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

摘要翻译： 高重复率，紧凑型，模块化气体放电，紫外线激光。 激光器可用作用于在集成电路制造工艺中非常快速地检查晶片的光源。 它也以非常快的速度对掩模版书写有用。 优选实施例以1000至4000Hz的脉冲重复率工作，并被设计用于全天候的生产线操作。 该优选实施例包括脉冲控制单元，其将脉冲的定时控制到小于4纳秒的精度。 该气体放电激光器的优选实施例可被配置为与KrF气体混合物，ArF气体混合物或F 2气体混合物一起操作，每个气体混合物具有近似的缓冲气体，产生248nm，197nm或 157 nm紫外光脉冲。

公开(公告)号：US06618421B2

公开(公告)日：2003-09-09

申请号：US09837035

申请日：2001-04-18

申请人： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

发明人： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

IPC分类号： H01S0322

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80

摘要： A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

公开(公告)号：US06798814B2

公开(公告)日：2004-09-28

申请号：US10205567

申请日：2002-07-25

申请人： Stephan Geiger ,  Claus Strowitzki ,  Tobias Pflanz ,  Ansgar Matern ,  Thomas Petracek ,  Martin Kappels ,  Andreas Goertler

发明人： Stephan Geiger ,  Claus Strowitzki ,  Tobias Pflanz ,  Ansgar Matern ,  Thomas Petracek ,  Martin Kappels ,  Andreas Goertler

IPC分类号： H01S322

CPC分类号： G03F7/70025 ,  H01S3/0346 ,  H01S3/036

摘要： The invention relates to a gas discharge laser including a discharge tube (1), in which a gas is present and which has at least one aperture (19) through which a laser beam emerges or at which a laser beam is reflected. For withdrawing a partial amount of the gas contained in the discharge tube (1), at least one gas withdrawal point (9) is present, from which the withdrawn gas is supplied to a sintered filter (11) for being cleaned. The cleaned gas may be led in via at least one gas inlet point (27) in the zone of the aperture (19). The invention further relates to a method of operating a gas discharge laser, and the use of a sintered filter for cleaning gas withdrawn from a discharge tube (1) of a gas discharge laser.

摘要翻译： 本发明涉及一种气体放电激光器，其包括放电管（1），其中存在气体，并且具有至少一个孔（19），激光束通过该孔径或激光束被反射。 为了排出包含在排出管（1）中的气体的一部分量，存在至少一个气体取出点（9），将排出的气体从其中供给到用于清洁的烧结过滤器（11）。 清洁的气体可以经由孔（19）的区域中的至少一个气体入口点（27）被引入。 本发明还涉及一种操作气体放电激光器的方法，以及使用烧结过滤器来清洗从气体放电激光器的放电管（1）中取出的气体。