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    Laser thin film poly-silicon annealing optical system
    8.
    发明授权
    Laser thin film poly-silicon annealing optical system 有权
    激光薄膜多晶硅退火光学系统

    公开(公告)号：US07884303B2

    公开(公告)日：2011-02-08

    申请号：US11201877

    申请日：2005-08-11

    申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： B23K26/00

    CPC分类号： B23K26/0732 ,  B23K26/0622 ,  B23K26/0738 ,  C30B1/023 ,  C30B13/24 ,  H01L21/02686 ,  H01L21/2026

    摘要： A high, energy, high repetition rate workpiece surface heating apparatus is disclosed which comprise a XeF laser producing a laser output light pulse beam, an optical system narrowing the laser output light pulse beam in the short axis of the laser output light pulse beam and expanding the laser output light pulse beam to form in a long axis of the beam a workpiece covering extent of the long axis, the optical system focuses the laser output light pulse beam at a field stop with a magnification sufficient to maintain an intensity profile that has sufficiently steep sidewalls to allow the field stop to maintain a sufficiently steep beam profile at the workpiece.

    摘要翻译： 公开了一种高能量，高重复率的工件表面加热装置，其包括产生激光输出光脉冲光束的XeF激光器，使激光输出光脉冲光束在短轴上使激光输出光脉冲光束变窄的光学系统，并且扩展 激光输出光脉冲光束在光束的长轴上形成工件覆盖长轴的范围，光学系统将激光输出光脉冲光束在场停止处以足以保持足够的强度分布的倍率 陡峭的侧壁允许现场停止在工件处保持足够陡峭的梁轮廓。

    Laser thin film poly-silicon annealing system
    9.
    发明授权
    Laser thin film poly-silicon annealing system 有权
    激光薄膜多晶硅退火系统

    公开(公告)号：US07061959B2

    公开(公告)日：2006-06-13

    申请号：US10884547

    申请日：2004-07-01

    申请人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    发明人： William N. Partlo ,  Palash P. Das ,  Russell Hudyma ,  Michael Thomas

    IPC分类号： H01S3/22

    CPC分类号： H01S3/0818 ,  B23K26/042 ,  B23K26/0622 ,  B23K26/0738 ,  B23K26/705 ,  H01L21/02532 ,  H01L21/02675 ,  H01S3/225 ,  H01S3/2255 ,  H01S3/2308 ,  H01S3/2366

    摘要： A gas discharge laser crystallization apparatus and method for performing a transformation of a crystal makeup or orientation in a film on a workpiece is disclosed, which may comprise a master oscillator power amplifier MOPA or power oscillator power amplifier configured XeF laser system producing a laser output light pulse beam at a high repetition rate and high power with a pulse to pulse dose control; an optical system producing an elongated thin pulsed working beam from the laser output light pulse beam. The apparatus may further comprise the laser system is configured as a POPA laser system and further comprising: relay optics operative to direct a first output laser light pulse beam from a first laser PO unit into a second laser PA unit; and, a timing and control module timing the creation of a gas discharge in the first and second laser units within plus or minus 3 ns, to produce the a second laser output light pulse beam as an amplification of the first laser output light pulse beam. The system may comprise divergence control in the oscillator laser unit. Divergence control may comprise an unstable resonator arrangement. The system may further comprise a beam pointing control mechanism intermediate the laser and the workpiece and a beam position control mechanism intermediate the laser and the workpiece. Beam parameter metrology may provide active feedback control to the beam pointing mechanism and active feedback control to the beam position control mechanism.

    摘要翻译： 公开了一种气体放电激光结晶装置和方法，用于在工件上的膜中进行晶体补偿或取向的变换，其可以包括主振荡器功率放大器MOPA或功率振荡器功率放大器，配置XeF激光系统，产生激光输出光 脉冲束以高重复率和高功率脉冲到脉冲剂量控制; 从激光输出光脉冲光束产生细长脉冲工作光束的光学系统。 该装置还可以包括激光系统被配置为POPA激光系统，并且还包括：可操作地将来自第一激光PO单元的第一输出激光束脉冲光束引导到第二激光器PA单元中的中继光学器件; 并且定时和控制模块定时在正或负3ns内在第一和第二激光单元中产生气体放电，以产生第二激光输出光脉冲束作为第一激光输出光脉冲光束的放大。 该系统可以包括振荡器激光单元中的发散控制。 发散控制可以包括不稳定的谐振器装置。 该系统还可以包括在激光和工件之间的光束指向控制机构和在激光和工件之间的光束位置控制机构。 光束参数测量可以向光束指向机构提供主动反馈控制，并向光束位置控制机构提供主动反馈控制。