公开(公告)号：US09653193B2

公开(公告)日：2017-05-16

申请号：US14124197

申请日：2012-04-17

申请人： Juergen Windrich ,  Tim Matthias Hosenfeldt ,  Helmut Schillinger

发明人： Juergen Windrich ,  Tim Matthias Hosenfeldt ,  Helmut Schillinger

IPC分类号： B05D3/00 ,  H01B3/42 ,  B05D5/08 ,  H01B3/44 ,  B05D3/06

CPC分类号： H01B3/427 ,  B05D3/06 ,  B05D5/08 ,  B05D5/083 ,  H01B3/445

摘要： A coating method for producing an electrically insulating coating on a bearing component, wherein, in a first step, a substance mixture comprising at least a) a silane and/or siloxane compound, b) a metal alcoholate, and c) PEEK and/or PTFE in the form of a dispersion is applied to the bearing component and, in a second step, is solidified on the component surface by means of a laser beam.

公开(公告)号：US06618421B2

公开(公告)日：2003-09-09

申请号：US09837035

申请日：2001-04-18

申请人： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

发明人： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

IPC分类号： H01S0322

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80

摘要： A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

公开(公告)号：US20140147598A1

公开(公告)日：2014-05-29

申请号：US14124197

申请日：2012-04-17

申请人： Juergen Windrich ,  Tim Matthias Hosenfeldt ,  Helmut Schillinger

发明人： Juergen Windrich ,  Tim Matthias Hosenfeldt ,  Helmut Schillinger

IPC分类号： H01B3/42 ,  H01B3/44

CPC分类号： H01B3/427 ,  B05D3/06 ,  B05D5/08 ,  B05D5/083 ,  H01B3/445

摘要： A coating method for producing an electrically insulating coating on a bearing component, wherein, in a first step, a substance mixture comprising at least a) a silane and/or siloxane compound, b) a metal alcoholate, and c) PEEK and/or PTFE in the form of a dispersion is applied to the bearing component and, in a second step, is solidified on the component surface by means of a laser beam.

摘要翻译： 一种用于在轴承部件上制造电绝缘涂层的涂覆方法，其中在第一步骤中，至少包含a）硅烷和/或硅氧烷化合物的物质混合物，b）金属醇化物，以及c）PEEK和/或 将分散体形式的PTFE施加到轴承部件，并且在第二步骤中，通过激光束在部件表面上固化。

公开(公告)号：US07149234B2

公开(公告)日：2006-12-12

申请号：US10650578

申请日：2003-08-27

申请人： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

发明人： Palash P. Das ,  Jennan Yu ,  Stuart L. Anderson ,  Helmut Schillinger ,  Tobias Pflanz ,  Claus Strowitzki ,  Claudia A. Hartmann ,  Stephan Geiger ,  Brett D. Smith ,  William N. Partlo

IPC分类号： H01S3/22

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70333 ,  G03F7/70483 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0404 ,  H01S3/041 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/134 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/225 ,  H03K3/57 ,  H03K17/80

摘要： A high repetition rate, compact, modular gas discharge, ultraviolet laser. The laser is useful as a light source for very rapid inspections of wafers in an integrated circuit fabrication process. It is also useful for reticle writing at very rapid rates. A preferred embodiment operates at pulse repetition rates of 1000 to 4000 Hz and is designed for round-the-clock production line operation. This preferred embodiment comprises a pulse control unit which controls the timing of pulses to an accuracy of less than 4 nanoseconds. Preferred embodiments of this gas discharge laser can be configured to operate with a KrF gas mixture, an ArF gas mixture or an F2 gas mixture, each with an approximate buffer gas, producing 248 nm, 197 nm or 157 nm ultraviolet light pulses.

摘要翻译： 高重复率，紧凑型，模块化气体放电，紫外线激光。 激光器可用作用于在集成电路制造工艺中非常快速地检查晶片的光源。 它也以非常快的速度对掩模版书写有用。 优选实施例以1000至4000Hz的脉冲重复率工作，并被设计用于全天候的生产线操作。 该优选实施例包括脉冲控制单元，其将脉冲的定时控制到小于4纳秒的精度。 该气体放电激光器的优选实施例可被配置为与KrF气体混合物，ArF气体混合物或F 2气体混合物一起操作，每个气体混合物具有近似的缓冲气体，产生248nm，197nm或 157 nm紫外光脉冲。