System and Method To Optimize Extreme Ultraviolet Light Generation
    1.
    发明申请
    System and Method To Optimize Extreme Ultraviolet Light Generation 有权
    优化极紫外光的系统和方法

    公开(公告)号:US20130320244A1

    公开(公告)日:2013-12-05

    申请号:US13549261

    申请日:2012-07-13

    IPC分类号: G01J3/10

    CPC分类号: G03F7/70033 H05G2/005

    摘要: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized.

    摘要翻译: 来自激光产生的等离子体(LPP)极紫外光(EUV)系统的能量输出基于激光束可以如何将目标材料上的焦点维持在多少,以产生发光的等离子体而变化。 本文所述的系统和方法通过使用闭环梯度过程来实时跟踪和微调光学元件的定位来确定激光束如何聚焦在目标材料上来优化EUV光生成。 当实现驱动激光器在液滴位置上的实时对准时,优化了EUV生成。

    System and method to optimize extreme ultraviolet light generation
    2.
    发明授权
    System and method to optimize extreme ultraviolet light generation 有权
    优化极紫外光发生的系统和方法

    公开(公告)号:US08598552B1

    公开(公告)日:2013-12-03

    申请号:US13549261

    申请日:2012-07-13

    IPC分类号: H05G2/00 H01L21/027 G03F7/20

    CPC分类号: G03F7/70033 H05G2/005

    摘要: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized.

    摘要翻译: 来自激光产生的等离子体(LPP)极紫外光(EUV)系统的能量输出基于激光束可以如何将目标材料上的焦点维持在多少,以产生发光的等离子体而变化。 本文所述的系统和方法通过使用闭环梯度过程来实时跟踪和微调光学元件的定位来确定激光束如何聚焦在目标材料上来优化EUV光生成。 当实现驱动激光器在液滴位置上的实时对准时,优化了EUV生成。

    System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production
    3.
    发明授权
    System and method to adaptively pre-compensate for target material push-out to optimize extreme ultraviolet light production 有权
    系统和方法适应性地预补偿目标材料推出,以优化极紫外光生产

    公开(公告)号:US09238243B2

    公开(公告)日:2016-01-19

    申请号:US13631645

    申请日:2012-09-28

    IPC分类号: H05G2/00 B05B17/00

    摘要: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot. Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.

    摘要翻译: 来自激光产生的等离子体(LPP)极紫外光(EUV)系统的能量输出基于激光束聚焦在目标材料的液滴上以在主要焦点产生等离子体的程度而变化。 在爆发射击过程中,在主焦点处保持液滴是困难的,因为来自前面的液滴的所产生的等离子体将后续的液滴推出主焦点。 将液滴重新对准主要焦点的当前液滴到液滴的反馈控制相对较慢。 本文所述的系统和方法通过将液滴引导到偏离主要焦点的目标位置来自适应地预补偿液滴推出,使得当液滴被照射时,液滴被激光束推动到主要焦点 点产生等离子体。 随着时间的推移,EUV系统学会保持液滴位置的实时对准,从而在主焦点内始终产生等离子体。

    System and Method to Adaptively Pre-Compensate for Target Material Push-Out to Optimize Extreme Ultraviolet Light Production
    4.
    发明申请
    System and Method to Adaptively Pre-Compensate for Target Material Push-Out to Optimize Extreme Ultraviolet Light Production 有权
    适应性预补偿目标材料推出以优化极紫外光生产的系统和方法

    公开(公告)号:US20140091239A1

    公开(公告)日:2014-04-03

    申请号:US13631645

    申请日:2012-09-28

    IPC分类号: G01J3/10

    摘要: Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam is focused on droplets of target material to generate plasma at a primary focal spot. Maintaining droplets at the primary focal spot during burst firing is difficult because generated plasma from preceding droplets push succeeding droplets out of the primary focal spot Current droplet-to-droplet feedback control to re-align droplets to the primary focal spot is relatively slow. The system and method described herein adaptively pre-compensate for droplet push-out by directing droplets to a target position that is offset from the primary focal spot such that when a droplet is lased, the droplet is pushed by the laser beam into the primary focal spot to generate plasma. Over time, the EUV system learns to maintain real-time alignment of droplet position so plasma is generated consistently within the primary focal spot.

    摘要翻译: 来自激光产生的等离子体(LPP)极紫外光(EUV)系统的能量输出基于激光束聚焦在目标材料的液滴上以在主要焦点产生等离子体的程度而变化。 在爆发发射期间,在主要焦点处保持液滴是困难的,因为来自前一个液滴的产生的等离子体将后续的液滴推出主要焦点。电流液滴到液滴反馈控制将液滴重新对准主要焦点是相对较慢的。 本文所述的系统和方法通过将液滴引导到偏离主要焦点的目标位置来自适应地预补偿液滴推出,使得当液滴被照射时,液滴被激光束推动到主要焦点 点产生等离子体。 随着时间的推移,EUV系统学会保持液滴位置的实时对准,从而在主焦点内始终产生等离子体。

    ALIGNMENT OF LIGHT SOURCE FOCUS
    5.
    发明申请
    ALIGNMENT OF LIGHT SOURCE FOCUS 有权
    光源对焦

    公开(公告)号:US20120019826A1

    公开(公告)日:2012-01-26

    申请号:US12841728

    申请日:2010-07-22

    IPC分类号: G01B11/26

    摘要: An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.

    摘要翻译: 一种极紫外光系统包括:转向系统,其将沿着传播方向传播的放大的光束转向并聚焦在远紫外光室内的目标位置附近的焦平面;检测系统,包括至少一个检测器,其被定位成检测图像 从室内的目标材料的至少一部分反射的激光束,反射激光束的路径中的目标位置和检测系统之间的波前修正系统以及控制器。 波前修改系统被配置为根据沿传播方向的目标焦平面位置来修改反射激光束的波前。 控制器包括用于基于所检测的反射激光束的图像来调整放大的光束相对于目标材料的焦平面的位置的逻辑。

    Alignment of light source focus
    6.
    发明授权
    Alignment of light source focus 有权
    对准光源焦点

    公开(公告)号:US08648999B2

    公开(公告)日:2014-02-11

    申请号:US12841728

    申请日:2010-07-22

    IPC分类号: G01J3/00

    摘要: An extreme ultraviolet light system includes a steering system that steers and focuses an amplified light beam traveling along a propagation direction to a focal plane near a target location within an extreme ultraviolet light chamber, a detection system including at least one detector positioned to detect an image of a laser beam reflected from at least a portion of a target material within the chamber, a wavefront modification system in the path of the reflected laser beam and between the target location and the detection system, and a controller. The wavefront modification system is configured to modify the wavefront of the reflected laser beam as a function of a target focal plane position along the propagation direction. The controller includes logic for adjusting a location of the focal plane of the amplified light beam relative to the target material based on the detected image of the reflected laser beam.

    摘要翻译: 一种极紫外光系统包括:转向系统,其将沿着传播方向传播的放大的光束转向并聚焦在远紫外光室内的目标位置附近的焦平面;检测系统,包括至少一个检测器,其被定位成检测图像 从室内的目标材料的至少一部分反射的激光束,反射激光束的路径中的目标位置和检测系统之间的波前修正系统以及控制器。 波前修改系统被配置为根据沿传播方向的目标焦平面位置来修改反射激光束的波前。 控制器包括用于基于所检测的反射激光束的图像来调整放大的光束相对于目标材料的焦平面的位置的逻辑。

    Volumetric grafts for treatment of fistulae and related methods and systems
    7.
    发明授权
    Volumetric grafts for treatment of fistulae and related methods and systems 有权
    用于治疗瘘的体积移植物及相关方法和系统

    公开(公告)号:US09226736B2

    公开(公告)日:2016-01-05

    申请号:US12793030

    申请日:2010-06-03

    IPC分类号: A61B17/08 A61B17/00 A61M27/00

    摘要: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.

    摘要翻译: 描述了可用于治疗瘘的装置,方法和系统,并且在某些实施例中,具有延伸进入消化道的开口的那些,诸如肛门直肠瘘。 说明性地,可以通过将体积结构置于瘘的主要开口内来治疗肛门直肠瘘。 在某些实施方案中,体积构造可以包括经加工以形成基本上单体的卷状可重塑材料。 有益的这种可重塑材料可以包括胶原细胞外基质材料,如小肠粘膜下层。

    VOLUMETRIC GRAFTS FOR TREATMENT OF FISTULAE AND RELATED METHODS AND SYSTEMS
    10.
    发明申请
    VOLUMETRIC GRAFTS FOR TREATMENT OF FISTULAE AND RELATED METHODS AND SYSTEMS 有权
    用于处理模型的体积和相关方法和系统

    公开(公告)号:US20120191216A1

    公开(公告)日:2012-07-26

    申请号:US13437169

    申请日:2012-04-02

    IPC分类号: A61F2/02

    摘要: Described are devices, methods, and systems useful in the treatment of fistulae, and in certain embodiments those having openings extending into the alimentary canal, such as anorectal fistulae. Illustratively, an anorectal fistula can be treated by placing a volumetric construct within the primary opening of the fistula. In certain embodiments, the volumetric construct can include a rolled remodelable material processed to form a substantially unitary body. Advantageous such remodelable materials can include collagenous extracellular matrix materials, such as small intestine submucosa.

    摘要翻译: 描述了可用于治疗瘘的装置,方法和系统,并且在某些实施例中,具有延伸进入消化道的开口的那些,诸如肛门直肠瘘。 说明性地,可以通过将体积结构置于瘘的主要开口内来治疗肛门直肠瘘。 在某些实施方案中,体积构造可以包括经加工以形成基本上单体的卷状可重塑材料。 有益的这种可重塑材料可以包括胶原细胞外基质材料,如小肠粘膜下层。